JPS6214092B2 - - Google Patents
Info
- Publication number
- JPS6214092B2 JPS6214092B2 JP14136277A JP14136277A JPS6214092B2 JP S6214092 B2 JPS6214092 B2 JP S6214092B2 JP 14136277 A JP14136277 A JP 14136277A JP 14136277 A JP14136277 A JP 14136277A JP S6214092 B2 JPS6214092 B2 JP S6214092B2
- Authority
- JP
- Japan
- Prior art keywords
- coating liquid
- coating
- liquid
- substrate
- photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007788 liquid Substances 0.000 claims description 59
- 238000000576 coating method Methods 0.000 claims description 51
- 239000011248 coating agent Substances 0.000 claims description 45
- 239000000758 substrate Substances 0.000 claims description 39
- 239000000463 material Substances 0.000 claims description 14
- 230000007246 mechanism Effects 0.000 claims description 14
- 238000005192 partition Methods 0.000 claims description 12
- 238000004528 spin coating Methods 0.000 claims description 9
- 239000012528 membrane Substances 0.000 claims description 8
- 230000002093 peripheral effect Effects 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 description 59
- 238000000034 method Methods 0.000 description 17
- 239000007789 gas Substances 0.000 description 12
- 239000004065 semiconductor Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000007863 gel particle Substances 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14136277A JPS5473576A (en) | 1977-11-24 | 1977-11-24 | Spin coating method and spin coater |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14136277A JPS5473576A (en) | 1977-11-24 | 1977-11-24 | Spin coating method and spin coater |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5473576A JPS5473576A (en) | 1979-06-12 |
| JPS6214092B2 true JPS6214092B2 (US07709020-20100504-C00041.png) | 1987-03-31 |
Family
ID=15290206
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14136277A Granted JPS5473576A (en) | 1977-11-24 | 1977-11-24 | Spin coating method and spin coater |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5473576A (US07709020-20100504-C00041.png) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02123591U (US07709020-20100504-C00041.png) * | 1989-03-22 | 1990-10-11 | ||
| JPH0393598U (US07709020-20100504-C00041.png) * | 1990-01-16 | 1991-09-24 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59208832A (ja) * | 1983-05-13 | 1984-11-27 | Hitachi Tokyo Electronics Co Ltd | 塗布装置 |
| JPH0669019B2 (ja) * | 1984-03-12 | 1994-08-31 | 株式会社ニコン | 半導体製造装置 |
| US4590094A (en) * | 1984-10-29 | 1986-05-20 | International Business Machines Corporation | Inverted apply using bubble dispense |
| JP4513999B2 (ja) * | 2000-01-17 | 2010-07-28 | 株式会社Ｓｏｋｕｄｏ | 基板塗布装置 |
| CN109675744A (zh) * | 2017-09-29 | 2019-04-26 | 临海市劳尔机械有限公司 | 一种镜片镀膜喷涂机 |
-
1977
- 1977-11-24 JP JP14136277A patent/JPS5473576A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02123591U (US07709020-20100504-C00041.png) * | 1989-03-22 | 1990-10-11 | ||
| JPH0393598U (US07709020-20100504-C00041.png) * | 1990-01-16 | 1991-09-24 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5473576A (en) | 1979-06-12 |
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