JPS62139987A - Vacuum device - Google Patents

Abstract

PURPOSE:To enable a cryopump to be maintained at extremely low temperature so that a high vacuum atmosphere chamber can be evacuated up to the high degree of vacuum even in high temperature condition by providing a heat screen plate on a buffle section of the cryopump installed in the connection of said chamber. CONSTITUTION:In the connection of a cryopump 5 and a chamber 7 are installed a water cooled buffle 8 and a cryobuffle 6 in front and rear. And said cryobuffle 6 is provided with a heat screen plate 10 opposed to the water cooled buffle 8. The front face of the heat screen plate 10 facing the water cooled buffle is mirror finished to reflect heat of radiation. Thus, the heat of radiation is reflected and absorbed by the heat screen plate 10 in addition to the cryobuffle 6 to restrain the temperature rise of 15K array 9 and permit the refrigeration up to an extremely low temperature with the cryopump 5. Thus, the chamber 7 can be evacuated to the high degree of vacuum even in a high temperature condition.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a vacuum device, and particularly to a device having a cryo pump.

[Conventional technology]

Conventionally, this type of vacuum apparatus, such as a metal coating deposition apparatus, requires heating to a high temperature and forming a metal coating in an atmosphere evacuated to a high vacuum.

FIG. 2 shows an example of a metal coating deposition apparatus. As shown in Figure 2, the pulp 2 is placed in a chamber 7 with a high temperature and high vacuum atmosphere.
A rotary pump 1 is connected through the pulp 3, and a cryo pump 5 is connected through the pulp 3. A holder 4 is installed on the ceiling of the chamber 7, and lamp heaters 11 to 14 are installed on the bottom of the chamber 7, facing each other vertically. Furthermore, a water-cooled baffle 8 and a cryobaffle 6 are installed in the front and rear at the connection portion of the cryo-pump 5 with the chamber 7. Also, 9 is an array on 15.

[Problem that the invention seeks to solve]

In order to heat the inside of the chamber 7 mentioned above to a high temperature and evacuate it to a high vacuum, it is necessary to always maintain the freezing capacity of the cryo pump at its maximum.

However, in FIG.
14 is blocked by the water-cooled baffle 8, but the radiant heat passes through the water-cooled baffle 8 and reaches the cryo pump 5. Therefore, the cryo pump 5 is affected by this radiant heat, and its performance is reduced, making it impossible to maintain a high vacuum inside the chamber 7.

Another way to prevent heat is to install the Talio pump 5 in an L-shape with respect to the chamber 7 as shown in Figure 3, but this reduces the conductance of the piping and increases the evacuation time, so this type of device is not suitable. I don't mind.

The present invention provides a vacuum device that maintains a high temperature and high vacuum atmosphere inside a chamber.

[Means for solving problems]

The present invention relates to a vacuum apparatus having a cryo-pump connected to a chamber in a high-temperature, high-vacuum atmosphere, characterized in that a heat shield plate is provided on the baffle part of the cryo-pump installed at the connection part with the chamber. It is.

〔Example〕

Hereinafter, one embodiment of the present invention will be described with reference to the drawings.

FIG. 1 shows an example of a badge processing type metal coating deposition apparatus. As shown in FIG. 1, a rotary pump 1 is connected to a chamber 7 in a high temperature, high vacuum atmosphere via a pulp 2, and a cryo pump 5 is also connected via a pulp 3. A holder 4 is installed on the ceiling inside the chaff'<-7, and lamp heaters 11 to 14 are installed on the bottom facing each other vertically. Also cryo
A water-cooled baffle 8 and a cryobaffle 6 are installed in front and rear of the connecting portion of the pump 5 and the chamber 7. Also, 9 is an array on 15. These configurations are the same as before.

The present invention includes a cryobaffle 6, a water cooling pan 7/L/8
A heat shield plate 10 is provided facing the.

Front side 10 facing water cooling baffle 8 of heat shielding plate 10
α has a mirror finish and is designed to reflect radiant heat.

In the examples, when forming a film on the material,
A material is placed in the holder 4 in the chamber 7, the rotary pump 1 is turned on, and the pulp 2 is opened. At that time, the pulp 3 is closed. The pulp 2 is closed after a certain pressure, and the pulp 3 is opened and evacuated to a certain pressure. Then, the lamp heaters 11 to 14 are turned on, and the inside of the chamber 7 is heated to a high temperature while being evacuated to a high vacuum. At that time, most of the heat from the lamp heater is blocked by the water-cooled baffle 8,
The radiant heat passes through the water-cooled baffle and reaches the cryo pump 5.

In addition to the cryobaffle 6, the present invention also includes a heat shield plate 10.
This reflects and absorbs radiant heat, suppresses the temperature rise of the array 9 at 15, and enables the cryo pump 5 to freeze it to an extremely low temperature.

〔Effect of the invention〕

As explained above, according to the present invention, the cryo pump maintains an extremely low temperature, thereby making it possible to evacuate the chamber to a high vacuum even in a high temperature state.

[Brief explanation of drawings]

FIG. 1 is a block diagram of a vacuum apparatus having a cryo pump according to an embodiment of the present invention, and FIGS. 2 and 3 are block diagrams showing a conventional example. l...Rotary pump 2...Pulp 3°
°“Pulp 4...Holder 5...Cryo pump 6...Cryobaffle. 7...Chamber 8...Water cooling baffle 9°
-15K array 10...1 heat shield plate 1
4...Lamp heater

Claims (1)

[Claims] (1) A vacuum device having a cryo-pump connected to a chamber in a high-temperature, high-vacuum atmosphere, characterized in that a heating plate is provided in the buttful part of the cryo-pump installed at the connection with the chamber. Device.