JPS61291965A - Superhigh-vacuum chamber - Google Patents

Superhigh-vacuum chamber

Info

Publication number
JPS61291965A
JPS61291965A JP13349985A JP13349985A JPS61291965A JP S61291965 A JPS61291965 A JP S61291965A JP 13349985 A JP13349985 A JP 13349985A JP 13349985 A JP13349985 A JP 13349985A JP S61291965 A JPS61291965 A JP S61291965A
Authority
JP
Japan
Prior art keywords
chamber
superhigh
internal
external
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13349985A
Other languages
Japanese (ja)
Inventor
Yoshinobu Ono
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13349985A priority Critical patent/JPS61291965A/en
Publication of JPS61291965A publication Critical patent/JPS61291965A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To reduce heat loss and to lower the necessary mechanical strength of an internal chamber by putting the internal chamber provided with heaters on the outside in an external chamber to form a double structure.
CONSTITUTION: This superhigh-vacuum chamber has a double structure consisting of an external chamber 5 and an internal chamber 8 put in the chamber 5. Exhaust systems such as a rotary oil pump 11 and a diffusion oil pump 13 are connected to the external and internal chambers 5, 8, respectively. The internal chamber 8 is provided with heaters 15 on the outside.
COPYRIGHT: (C)1986,JPO&Japio
JP13349985A 1985-06-18 1985-06-18 Superhigh-vacuum chamber Pending JPS61291965A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13349985A JPS61291965A (en) 1985-06-18 1985-06-18 Superhigh-vacuum chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13349985A JPS61291965A (en) 1985-06-18 1985-06-18 Superhigh-vacuum chamber

Publications (1)

Publication Number Publication Date
JPS61291965A true JPS61291965A (en) 1986-12-22

Family

ID=15106199

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13349985A Pending JPS61291965A (en) 1985-06-18 1985-06-18 Superhigh-vacuum chamber

Country Status (1)

Country Link
JP (1) JPS61291965A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH027421A (en) * 1987-10-15 1990-01-11 Solems Sa Device for manufacturing thin layer, particularly, thin layer for electronic and/or opto-electronic device by plasma deposition, and operating method therefor
JP2005347582A (en) * 2004-06-04 2005-12-15 Nikon Corp Vacuum container, exposure device, and inspection device
JP2007146292A (en) * 2002-04-01 2007-06-14 Ans Inc Vapor deposition method for vapor-phase organic matter, and vapor deposition system for vapor-phase organic matter utilizing the same
KR100961007B1 (en) 2007-01-31 2010-05-31 도쿄엘렉트론가부시키가이샤 Substrate processing apparatus
US7948603B2 (en) 2003-08-27 2011-05-24 Nikon Corporation Vacuum device, operation method for vacuum device, exposure system, and operation method for exposure system
KR101093667B1 (en) * 2010-09-20 2011-12-15 (주)에스엔텍 Large vacuum chamber

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH027421A (en) * 1987-10-15 1990-01-11 Solems Sa Device for manufacturing thin layer, particularly, thin layer for electronic and/or opto-electronic device by plasma deposition, and operating method therefor
JP2007146292A (en) * 2002-04-01 2007-06-14 Ans Inc Vapor deposition method for vapor-phase organic matter, and vapor deposition system for vapor-phase organic matter utilizing the same
US7948603B2 (en) 2003-08-27 2011-05-24 Nikon Corporation Vacuum device, operation method for vacuum device, exposure system, and operation method for exposure system
JP2005347582A (en) * 2004-06-04 2005-12-15 Nikon Corp Vacuum container, exposure device, and inspection device
JP4547997B2 (en) * 2004-06-04 2010-09-22 株式会社ニコン Vacuum container, exposure apparatus, and inspection apparatus
KR100961007B1 (en) 2007-01-31 2010-05-31 도쿄엘렉트론가부시키가이샤 Substrate processing apparatus
US8349085B2 (en) 2007-01-31 2013-01-08 Tokyo Electron Limited Substrate processing apparatus
KR101093667B1 (en) * 2010-09-20 2011-12-15 (주)에스엔텍 Large vacuum chamber

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