JPS62136089A - Semiconductor laser device - Google Patents

Semiconductor laser device

Info

Publication number
JPS62136089A
JPS62136089A JP27717685A JP27717685A JPS62136089A JP S62136089 A JPS62136089 A JP S62136089A JP 27717685 A JP27717685 A JP 27717685A JP 27717685 A JP27717685 A JP 27717685A JP S62136089 A JPS62136089 A JP S62136089A
Authority
JP
Japan
Prior art keywords
substrate
semiconductor laser
layer
end surface
upward direction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27717685A
Other languages
Japanese (ja)
Inventor
Masanori Hirose
広瀬 正則
Takashi Sugino
隆 杉野
Akio Yoshikawa
昭男 吉川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP27717685A priority Critical patent/JPS62136089A/en
Publication of JPS62136089A publication Critical patent/JPS62136089A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To take out a laser beam output to the upward direction nearly vertical to the main surface of a substrate by a method wherein one end surface is inclined so as to make its surface face the surface of a substrate while omitting a cup layer and an ohmic electrode near an end surface. CONSTITUTION:An N-type AlyGa1-yAs cladding layer 2, an AlxGa1-xAs active layer 3, a P-type AlyGa1-yAs cladding layer 4 and a P-type GaAs cap layer 5 are successively laminated on an N<+> type GaAs substrate and ohmic electrodes 6 and 7 are provided. The semiconductor laser is forward-biased and an oscillation is induced. At that time, although a gain is not obtained near the end surface of the side where the cap layer 5 and the ohmic electrode 6 are removed, the boundary plane between the cladding layer 4 and the air serves as mirror of the laser resonator and a light is deflected to a vertical upward direction by the surface inclined about 45 deg. to the substrate surface. With this constitution, the laser beam output can be emitted to the upward direction vertical to the main surface of the substrate.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、各種の情報伝送や情報処理に使用される半導
体レーザ装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a semiconductor laser device used for various information transmission and information processing.

従来の技術 従来、半導体レーザとそれを駆動する電子回路をモノリ
シックに集積した0EICにおいて、半導体レーザは、
レーザ光全外部に取り出すために、必ず基板の端に近接
した場所に位置している。
Conventional technology Conventionally, in an 0EIC that monolithically integrates a semiconductor laser and an electronic circuit to drive it, the semiconductor laser is
In order to extract the entire laser beam to the outside, it must be located close to the edge of the substrate.

以下、図面全参照しながら、上述し之ような従来の半導
体レーザ装置について説明する。
Hereinafter, the conventional semiconductor laser device as described above will be explained with reference to all the drawings.

第2図a 、bu、従来の○EICに用いられている半
導体レーザを示すものである。第2図a、bにおいて、
9 fi GaAs基板、10ばGaAs/AnGaA
s半導体レーザ、11は半導体レーザケ堅動する電子回
路、8は出射レーザ光である。
FIG. 2a, bu shows a semiconductor laser used in a conventional EIC. In Figure 2 a and b,
9 fi GaAs substrate, 10 fi GaAs/AnGaA
s semiconductor laser, 11 is an electronic circuit that operates the semiconductor laser, and 8 is an emitted laser beam.

第2図aの○EICでは、半導体レーザのキャビティは
、へき開によって形成されている。同図すでは、半導体
レーザのキャピテイは、一端面はエツチングにより、も
う一方の端面はへき開により形成されている。このよう
な0EICにおいて、レーザ光は、基板の端から取り出
される。
In the EIC shown in FIG. 2a, the cavity of the semiconductor laser is formed by cleavage. In the figure, the cavity of the semiconductor laser is formed by etching one end face and by cleaving the other end face. In such an 0EIC, laser light is extracted from the edge of the substrate.

発明が解決しようとする問題点 しかしながら、上記のような構成では、レーザ光が水平
方向に出射するため、レーザ光全外部に取り出すために
、半導体レーザの少なくとも一端面が基板の端に位置す
るように○EICi設計しなければならないという欠点
を有しており、設計の自由度が大きく制限されていた。
Problems to be Solved by the Invention However, in the above configuration, since the laser beam is emitted in the horizontal direction, at least one end surface of the semiconductor laser is located at the edge of the substrate in order to extract the laser beam to the outside. This has the disadvantage that ○EICi design must be carried out, which greatly limits the degree of freedom in design.

本発明は上記欠点に鑑み、0EIC基板上の中央部にで
も位置させることのできる半導体レーザ装置ケ提供する
ものである。
In view of the above drawbacks, the present invention provides a semiconductor laser device that can be placed even in the center of an 0EIC substrate.

問題点?解決するための手段 上記問題点ケ解決するために、本発明の半導体レーザ装
置は、一端面が基板に対してこの端面の表面が基板の表
面に向くように傾斜ケ有し、さらにこの端面近傍のキャ
ップ層とその上側のオーミック電極が欠除している。
problem? Means for Solving In order to solve the above-mentioned problems, the semiconductor laser device of the present invention has one end surface inclined with respect to the substrate so that the surface of this end surface faces the surface of the substrate, and furthermore, the semiconductor laser device of the present invention has The cap layer and the ohmic electrode above it are missing.

作用 この構成により、半導体レーザの内部で発生したレーザ
光は傾斜ケ有する端面で直角にまげられ、L字型の共振
器を形成する。その結果、レーザ光出力は基板主面に対
し、所定の角度に出射することとなる。
Effect: With this configuration, the laser light generated inside the semiconductor laser is bent at right angles by the inclined end face, forming an L-shaped resonator. As a result, the laser light output is emitted at a predetermined angle with respect to the main surface of the substrate.

実施例 以下、本発明の一実施例について図面ケ参照しながら説
明する。
EXAMPLE Hereinafter, an example of the present invention will be described with reference to the drawings.

第1図は、本発明の第一の実施例における半導体レーザ
装置の断面?示すものである。
FIG. 1 shows a cross section of a semiconductor laser device according to a first embodiment of the present invention. It shows.

第1図において、1はn”−GaAs 基板、2はn−
AnyGal−、As  クラッド層、3はAn エG
a 1− 、As活性層1x<y)、4はp−AJ2ア
Ga1−アAS  クラッド層、5 fi p−GaA
sキャップ層、6,7はオーミック電極、8は出射レー
ザ光である。
In Figure 1, 1 is an n''-GaAs substrate, 2 is an n-GaAs substrate, and 2 is an n-GaAs substrate.
AnyGal-, As cladding layer, 3 is An
a1-, As active layer 1x<y), 4 p-AJ2AGa1-AAS cladding layer, 5 fi p-GaA
s cap layer, 6 and 7 are ohmic electrodes, and 8 is an emitted laser beam.

以上のように構成された半導体レーザ装置について、以
下その動作ケ説明する。
The operation of the semiconductor laser device configured as described above will be explained below.

まず、半導体レーザを頭方向にバイアスし、発振に至ら
しめる。その際、キャップ層とオーミソノド層4と空気
中との界面がレーザ共振器のミラーとして作用する。そ
の結果、レーザ光出力は基板主面に対し、垂直上方に出
射することとなる。
First, the semiconductor laser is biased toward the head, causing it to oscillate. At this time, the interface between the cap layer, the ohmic layer 4, and the air acts as a mirror of the laser resonator. As a result, the laser light output is emitted perpendicularly above the main surface of the substrate.

なお、この実施例では、GaAs /Aj2GaAs系
の材料ケ例としたが、I nP / I nGaAs 
P系等の材料でもよい。
In this example, GaAs/Aj2GaAs material is used as an example, but InP/I nGaAs
It may be made of P-based material or the like.

さらに、本実施例では、n型基板を例としたが、p型、
あるいは31基板でもよい。
Furthermore, in this embodiment, an n-type substrate was used as an example, but p-type,
Alternatively, a 31 board may be used.

また、傾斜?つけた端面にAu等?コーティングして反
射率?上げることも可能である。
Also, the slope? Au etc. on the attached end face? Coating and reflectance? It is also possible to raise it.

発明の効果 以上のように本発明は、ダブルへテロ構造半導体レーザ
の一端面に、基板主面に対しm傾斜をもたせ、さらにこ
の端面近傍のキャップ層とその上部の電極を取り去るこ
とにより、基板主面に対し、はぼ垂直上方にレーザ光出
力全敗り出すことができ、その実用的効果は犬なるもの
がある0
Effects of the Invention As described above, the present invention provides one end surface of a double heterostructure semiconductor laser with an m inclination with respect to the main surface of the substrate, and further removes the cap layer near this end surface and the electrode on the upper surface of the substrate. The entire laser beam output can be emitted almost perpendicularly above the main surface, and its practical effects are impressive.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の実施例の半導体レーザ装置断1 ・−
・−n−GaAs基板、2 ・−・・−n −Aj2y
Ga、 −yA層層、3 ・−・−・AxxGal−、
As活性層、4・・・・・・p−MPl−yA層、6・
・・・・p−GaAs層、6.7・・・・・オーミック
電極、8・・・・・出射レーザ光、9・・・・・・G 
aA s基板、1゜・・・・・・半導体レーザ、11・
・・・・・電子回路。 代理人の氏名 弁理士 中 尾 敏 男 はが1名!−
−−だ−GαAsGa As基板 n−Aly Ga1−>ArXl3−−− 
Ait Ga1−y−As ?8a314−−− P−
AjLyGαt−V As層5−−− P−GaAs層 第 1 図              6−−−オー
ミツク電治7−−−オーミツクを径 8−・出財レープ光
FIG. 1 shows a cross section of a semiconductor laser device according to an embodiment of the present invention.
・-n-GaAs substrate, 2 ・-...-n -Aj2y
Ga, -yA layer, 3...AxxGal-,
As active layer, 4...p-MPl-yA layer, 6.
... p-GaAs layer, 6.7 ... ohmic electrode, 8 ... output laser beam, 9 ... G
aA s substrate, 1°... Semiconductor laser, 11.
...Electronic circuit. Name of agent: Patent attorney Toshio Nakao 1 person! −
--da-GαAsGa As substrate n-Aly Ga1->ArXl3---
Ait Ga1-y-As? 8a314---P-
AjLyGαt-V As layer 5 --- P-GaAs layer 1st Figure 6 --- Ohmic Denji 7 --- Ohmic diameter 8 --- Investment Lep light

Claims (1)

【特許請求の範囲】[Claims] 一端面が基板に対し前記一端面の表面が前記基板の表面
に向うように傾斜を有するとともに、前記一端面の近傍
のキャップ層とその上部のオーミック電極が欠除してい
ることを特徴とする半導体レーザ装置。
The one end surface is inclined with respect to the substrate so that the surface of the one end surface is directed toward the surface of the substrate, and the cap layer near the one end surface and the ohmic electrode above the cap layer are omitted. Semiconductor laser equipment.
JP27717685A 1985-12-10 1985-12-10 Semiconductor laser device Pending JPS62136089A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27717685A JPS62136089A (en) 1985-12-10 1985-12-10 Semiconductor laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27717685A JPS62136089A (en) 1985-12-10 1985-12-10 Semiconductor laser device

Publications (1)

Publication Number Publication Date
JPS62136089A true JPS62136089A (en) 1987-06-19

Family

ID=17579865

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27717685A Pending JPS62136089A (en) 1985-12-10 1985-12-10 Semiconductor laser device

Country Status (1)

Country Link
JP (1) JPS62136089A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6487225B2 (en) 1998-02-04 2002-11-26 Mitsui Chemicals Inc. Surface-emitting laser device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6487225B2 (en) 1998-02-04 2002-11-26 Mitsui Chemicals Inc. Surface-emitting laser device

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