JPS6212657B2 - - Google Patents

Info

Publication number
JPS6212657B2
JPS6212657B2 JP55011226A JP1122680A JPS6212657B2 JP S6212657 B2 JPS6212657 B2 JP S6212657B2 JP 55011226 A JP55011226 A JP 55011226A JP 1122680 A JP1122680 A JP 1122680A JP S6212657 B2 JPS6212657 B2 JP S6212657B2
Authority
JP
Japan
Prior art keywords
alignment
ray
wafer
mask
section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55011226A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56111225A (en
Inventor
Koichi Okada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO ERU ESU AI GIJUTSU KENKYU KUMIAI filed Critical CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority to JP1122680A priority Critical patent/JPS56111225A/ja
Publication of JPS56111225A publication Critical patent/JPS56111225A/ja
Publication of JPS6212657B2 publication Critical patent/JPS6212657B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP1122680A 1980-02-01 1980-02-01 X ray exposuring device Granted JPS56111225A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1122680A JPS56111225A (en) 1980-02-01 1980-02-01 X ray exposuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1122680A JPS56111225A (en) 1980-02-01 1980-02-01 X ray exposuring device

Publications (2)

Publication Number Publication Date
JPS56111225A JPS56111225A (en) 1981-09-02
JPS6212657B2 true JPS6212657B2 (enrdf_load_stackoverflow) 1987-03-19

Family

ID=11772035

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1122680A Granted JPS56111225A (en) 1980-02-01 1980-02-01 X ray exposuring device

Country Status (1)

Country Link
JP (1) JPS56111225A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63175859A (ja) * 1987-01-16 1988-07-20 Ushio Inc 液晶基板製作の露光方式
US4855792A (en) * 1988-05-13 1989-08-08 Mrs Technology, Inc. Optical alignment system for use in photolithography and having reduced reflectance errors

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51147264A (en) * 1975-06-13 1976-12-17 Fujitsu Ltd High-precision positioning system
DE2722958A1 (de) * 1977-05-20 1978-11-23 Siemens Ag Verfahren zur justierung einer halbleiterscheibe relativ zu einer bestrahlungsmaske bei der roentgenstrahl-fotolithografie

Also Published As

Publication number Publication date
JPS56111225A (en) 1981-09-02

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