JPS62114439U - - Google Patents
Info
- Publication number
- JPS62114439U JPS62114439U JP149886U JP149886U JPS62114439U JP S62114439 U JPS62114439 U JP S62114439U JP 149886 U JP149886 U JP 149886U JP 149886 U JP149886 U JP 149886U JP S62114439 U JPS62114439 U JP S62114439U
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- aperture
- rays
- mask
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 claims description 7
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- X-Ray Techniques (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986001498U JPH0322905Y2 (enrdf_load_stackoverflow) | 1986-01-08 | 1986-01-08 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986001498U JPH0322905Y2 (enrdf_load_stackoverflow) | 1986-01-08 | 1986-01-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62114439U true JPS62114439U (enrdf_load_stackoverflow) | 1987-07-21 |
JPH0322905Y2 JPH0322905Y2 (enrdf_load_stackoverflow) | 1991-05-20 |
Family
ID=30779459
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1986001498U Expired JPH0322905Y2 (enrdf_load_stackoverflow) | 1986-01-08 | 1986-01-08 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0322905Y2 (enrdf_load_stackoverflow) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62155516A (ja) * | 1985-12-27 | 1987-07-10 | Mitsubishi Electric Corp | X線露光装置 |
-
1986
- 1986-01-08 JP JP1986001498U patent/JPH0322905Y2/ja not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62155516A (ja) * | 1985-12-27 | 1987-07-10 | Mitsubishi Electric Corp | X線露光装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH0322905Y2 (enrdf_load_stackoverflow) | 1991-05-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0299951A3 (de) | Vorrichtung und Verfahren zur Inspektion einer Maske | |
JPS62114439U (enrdf_load_stackoverflow) | ||
JPS53132985A (en) | X-ray image pickup device | |
ATE99842T1 (de) | Laserstrahlerzeuger fuer eine roentgenstrahllithographie-vorrichtung. | |
JPH0288607U (enrdf_load_stackoverflow) | ||
JPS63197333A (ja) | パタ−ン形成方法及び装置 | |
FR2335036A1 (fr) | Appareil pour realiser un modele d'irradiation sur une preparation | |
JPS5438787A (en) | X-ray source apparatus | |
JPS5215267A (en) | Fine processing method | |
JPS6415604A (en) | Measuring apparatus for length by electron beam | |
JPS5234690A (en) | Method to obatain x-ray body axis tomogramic image | |
JPS5260686A (en) | X-ray photoelectronic analysis | |
JPH0391309U (enrdf_load_stackoverflow) | ||
JPH0474437U (enrdf_load_stackoverflow) | ||
JPS62100677U (enrdf_load_stackoverflow) | ||
JPS6028137Y2 (ja) | 電子ビ−ム露光装置 | |
JPH0392354U (enrdf_load_stackoverflow) | ||
JPS647619A (en) | X-ray aligner | |
JPH0447245U (enrdf_load_stackoverflow) | ||
JPH022999A (ja) | X線露光装置 | |
JPS5355984A (en) | Ion beam irradiating method and its device | |
JPH0488607U (enrdf_load_stackoverflow) | ||
JPS5279662A (en) | Electron beam exposure device | |
JPS51135322A (en) | Electron beam adjusting magneto of braun tube | |
JPS6212943U (enrdf_load_stackoverflow) |