JPS6211181U - - Google Patents
Info
- Publication number
- JPS6211181U JPS6211181U JP10152985U JP10152985U JPS6211181U JP S6211181 U JPS6211181 U JP S6211181U JP 10152985 U JP10152985 U JP 10152985U JP 10152985 U JP10152985 U JP 10152985U JP S6211181 U JPS6211181 U JP S6211181U
- Authority
- JP
- Japan
- Prior art keywords
- nozzle
- workpiece
- tip
- electrolytic
- porous layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000008151 electrolyte solution Substances 0.000 claims 1
- 238000003754 machining Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Weting (AREA)
Description
第１図は本考案の一実施例を示す断面図、第２
図は加工面の状態を示す図、第３図、第４図は他
の実施例を示す断面図、第５図は従来例を示す断
面図、第６図は従来例により加工した加工面を示
す断面図である。
５……加工物（シリコン基板）、７……マスク
、９……ノズル、１０……電解液、１２……電源
、２０……多孔質層。
Fig. 1 is a sectional view showing one embodiment of the present invention;
The figure shows the state of the machined surface, Figures 3 and 4 are cross-sectional views showing other embodiments, Figure 5 is a cross-sectional view of the conventional example, and Figure 6 shows the machined surface machined by the conventional example. FIG. 5... Workpiece (silicon substrate), 7... Mask, 9... Nozzle, 10... Electrolyte, 12... Power source, 20... Porous layer.
Claims (1)
を隔てて対向配置し、これら電極間に所定の電圧
を印加し、前記ノズルの先端から電解液を噴出さ
せて加工物の加工を行う電解加工装置において、
前記ノズルの先端または全体を多孔質層で構成し
たことを特徴とする電解加工装置。 Electrolytic machining in which the workpiece is used as an anode and the nozzle is used as a cathode, which are placed facing each other at a predetermined distance, and a predetermined voltage is applied between these electrodes, and an electrolytic solution is ejected from the tip of the nozzle to process the workpiece. In the device,
An electrolytic processing apparatus characterized in that the tip or the entire nozzle is made of a porous layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10152985U JPS6211181U (en) | 1985-07-03 | 1985-07-03 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10152985U JPS6211181U (en) | 1985-07-03 | 1985-07-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6211181U true JPS6211181U (en) | 1987-01-23 |
Family
ID=30972342
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10152985U Pending JPS6211181U (en) | 1985-07-03 | 1985-07-03 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6211181U (en) |
-
1985
- 1985-07-03 JP JP10152985U patent/JPS6211181U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6211181U (en) | ||
| JPS62184737U (en) | ||
| JPH01121919U (en) | ||
| WO1993011281A3 (en) | Electrochemical cell | |
| JPS6159669U (en) | ||
| JPS62152435U (en) | ||
| JPS58160263U (en) | GD-CVD equipment | |
| JPS6240829U (en) | ||
| JPS6153857U (en) | ||
| JPS6175928U (en) | ||
| JPS61199573U (en) | ||
| JPH0254229U (en) | ||
| JPS61138249U (en) | ||
| JPS61127920U (en) | ||
| JPS6448025U (en) | ||
| JPS6267455U (en) | ||
| JPS5834964U (en) | Roll plating device | |
| JPS61186170U (en) | ||
| JPS5966529U (en) | Electrode for electrical discharge machining | |
| JPH033730U (en) | ||
| JPS5982953U (en) | ion pump | |
| JPH0273734U (en) | ||
| JPH02114430U (en) | ||
| JPS62147338U (en) | ||
| JPS6364055U (en) |