JPS62110229A - Fluorescent screen forming method for fluorescent character display tube - Google Patents

Fluorescent screen forming method for fluorescent character display tube

Info

Publication number
JPS62110229A
JPS62110229A JP25035385A JP25035385A JPS62110229A JP S62110229 A JPS62110229 A JP S62110229A JP 25035385 A JP25035385 A JP 25035385A JP 25035385 A JP25035385 A JP 25035385A JP S62110229 A JPS62110229 A JP S62110229A
Authority
JP
Japan
Prior art keywords
phosphor
substrate
fluorescent
resist
display tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25035385A
Other languages
Japanese (ja)
Inventor
Takashi Shibakuchi
芝口 孝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP25035385A priority Critical patent/JPS62110229A/en
Publication of JPS62110229A publication Critical patent/JPS62110229A/en
Pending legal-status Critical Current

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  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)

Abstract

PURPOSE:To make a phosphor formable on a positive electrode in high density and high accuracy, by putting a substrate, being set in an electrolyte containing the phosphor and forming fluorescent screen on a surface of the positive electrode by means of an electrophoretic process, into a high temperature oven, and removing a resist. CONSTITUTION:After a photo-resist agent 20 is applied onto a substrate 1 where a thick film insulating layer 6 is formed, a groove of opening width (h) corresponding to a sub-scanning direction size in which a phosphor 4 is to be formed is removed by means of a photo-etching process. The substrate 1 covered with the phot-resist agent 20 except the opening width (h) is put into an electrolyte containing the phosphor, while the specified electric filed is impressed on a positive electrode 2 and its counter electrode, and the phosphor 4 is stuck to an exposed anode part by means of a electrophoretic process. Next, when the substrate 1 is put into a high temperature oven and burned, the resist film 20 is removed by evaporation. With this constitution, the phosphor 4 is accurately formed in a dotlike form.

Description

【発明の詳細な説明】 (技術分野) 本発明は螢光表示管の螢光面形成方法に関し、より詳細
には光プリンタやデジタル複写機、ファクシミリ、ワー
ドプロセッサなど各種の記録装置用光源に適用しつる螢
光表示管の螢光面形成方法に関するものである。
Detailed Description of the Invention (Technical Field) The present invention relates to a method for forming a fluorescent surface of a fluorescent display tube, and more specifically, it is applicable to light sources for various recording devices such as optical printers, digital copying machines, facsimile machines, and word processors. The present invention relates to a method for forming a fluorescent surface of a vine fluorescent display tube.

(従来技術) 長尺の基板上に微小間隔をおき、この基板の長手方向に
そって多数の微小な短冊状の陽極電極を配列し、各陽極
電極の表面に螢光体面を形成してなる螢光表示管の螢光
面形成方法において、キャラクタ文字表示用では螢光体
を陽11 fft tl上に形成する手段として、従来
は、厚膜印刷法を採用していた。
(Prior art) A large number of minute strip-shaped anode electrodes are arranged along the longitudinal direction of the substrate at minute intervals on a long substrate, and a phosphor surface is formed on the surface of each anode electrode. In a method for forming a fluorescent surface of a fluorescent display tube, a thick film printing method has conventionally been adopted as a means for forming a fluorescent material on a positive 11 fft tl for displaying characters.

しかし、この方法だと、螢光体サイズを微小にコントロ
ールすることは難しく、所望のサイズが高精度で得にく
いとの問題がある。
However, with this method, it is difficult to minutely control the size of the phosphor, and there is a problem that it is difficult to obtain the desired size with high precision.

又、キャラクタ文子以外で、さらに高精度に螢光体を陽
極電極上に形成する場合の手段として。
Also, other than the character Fumiko, it can be used as a means for forming a phosphor on an anode electrode with even higher precision.

螢光体上のフォトレジストを塗布し、フォトレジストを
露光現像することにより螢光体を整形する所謂、フォト
エツチング法が採用されている。しかし、このフ第1・
エツチング法により螢光体面を形成すると、フォトレジ
ストと螢光体材料或いは呪像岐と螢光体材料が混ざり、
螢光体の発光性を劣化させてしまうという問題がある。
A so-called photoetching method is employed in which a photoresist is coated on a phosphor, and the phosphor is shaped by exposing and developing the photoresist. However, this first
When a phosphor surface is formed by an etching method, the photoresist and the phosphor material or the cursed image and the phosphor material are mixed.
There is a problem in that the luminescent properties of the phosphor deteriorate.

(目  的) 従って1本発明の目的は、発光特性を劣化させることな
く、螢光体を陽+l1AW&極上に高密度でかつ高精度
に形成することのできる螢光表示管の螢光面形成方法を
提倶することにある。
(Objective) Accordingly, one object of the present invention is to provide a method for forming a fluorescent surface of a fluorescent display tube, which allows the formation of phosphors in positive +l1 AW & extremely high density and with high precision without deteriorating the light emitting characteristics. The goal is to offer the following.

(構  成) 本発明は上記目的を達成させるため、螢光表示管の螢光
面を形成するに際し、基板上に陽極電極を形成した後、
これらの上に厚膜絶縁層を形成してからレジスト膜をつ
くり、フォトエツチング法により陰陽電極表面に螢光体
14着領域を確保した後、上記基板を螢光体含有の電解
液中におき、電気泳動法により陽+[極表面に螢光面を
形成し。
(Structure) In order to achieve the above object, the present invention provides a method for forming a fluorescent surface of a fluorescent display tube after forming an anode electrode on a substrate.
A thick insulating layer is formed on these, a resist film is made, and a region for attaching the phosphor 14 is secured on the surface of the negative and anode electrodes by photoetching, and then the substrate is placed in an electrolytic solution containing a phosphor. , a fluorescent surface is formed on the positive polar surface by electrophoresis.

この基板を高温炉に入れてレジストを除去する工程を経
ることを特徴としたものである。
This method is characterized in that the substrate is placed in a high-temperature furnace and the resist is removed.

以下、本発明の一実施例に基づいて具体的に説明する。Hereinafter, a detailed explanation will be given based on one embodiment of the present invention.

本発明に係る螢光表示管の断面を示した第2図において
、符号1は例えばガラスからなる基板を示し1紙面を貫
く方向(主走査方向)に′長尺の材料として構成されて
いる。
In FIG. 2, which shows a cross section of a fluorescent display tube according to the present invention, reference numeral 1 designates a substrate made of glass, for example, and is constructed as an elongated material in the direction passing through the page (main scanning direction).

この基板1上に多数の陽極電極2が主走査方向(第3図
中の左右方向)に配列されている。各陽極電極2はアル
ミニウムの真空蒸着膜で形成され、リード端子が交互に
反対方向に引き出されている。
A large number of anode electrodes 2 are arranged on this substrate 1 in the main scanning direction (horizontal direction in FIG. 3). Each anode electrode 2 is formed of a vacuum-deposited aluminum film, and lead terminals are alternately drawn out in opposite directions.

符号4は、陽極電極上に形成された螢光体を示し、その
表面が螢光面であり1本実施例ではZnO又はZnを電
気泳動法により陽極上に付着したものである。
Reference numeral 4 indicates a phosphor formed on the anode electrode, the surface of which is a phosphorescent surface, and in this embodiment, ZnO or Zn is deposited on the anode by electrophoresis.

符号6は厚膜絶縁層を示し、ガラス材を厚膜印刷で基板
l上に形成したものである。そして、厚膜絶縁層6上に
は、螢光体ドツトの上部のみがスリット状に開口し、他
はメツシュ状、例えば第4図に示す如く六角形のメツシ
ュが形成された制御電極7が設けられている8 この制御電極7の上方には、ワイヤ状の陰極フィラメン
1へ8が張設されている。
Reference numeral 6 indicates a thick film insulating layer, which is formed of glass material on the substrate l by thick film printing. A control electrode 7 is provided on the thick film insulating layer 6, in which only the upper part of the phosphor dot has a slit-like opening, and the rest has a mesh-like shape, for example, a hexagonal mesh as shown in FIG. Above the control electrode 7, a wire-shaped cathode filament 1 is stretched.

以上の諸部利は、フェースガラス9で覆われていて内部
は真空状態に保持されている。なお、このフェースガラ
ス9の上面裏側には帯電防止用の透明なネサ電極IOが
形成されている。
The above-mentioned parts are covered with a face glass 9, and the inside is kept in a vacuum state. Note that a transparent NESA electrode IO for antistatic purposes is formed on the back side of the upper surface of the face glass 9.

第3図は、このような螢光表示管の平面図を示しており
、符号IIはl13極フイラメントの固定部材。
FIG. 3 shows a plan view of such a fluorescent display tube, and reference numeral II designates a fixing member for the 11 triode filament.

符号12は陰田フィラメントを張設するためのばね板を
それぞれ示す。
Reference numeral 12 indicates a spring plate for tensioning the Kageda filament.

このような螢光表示管において、陽極ff!極2上に螢
光体4による螢光面を形成する手順は次の通りである。
In such a fluorescent display tube, the anode ff! The procedure for forming a fluorescent surface by the fluorescent material 4 on the pole 2 is as follows.

(1)、陽極電極及び厚膜絶縁層の形成(第5図参照)
(1) Formation of anode electrode and thick insulating layer (see Figure 5)
.

先ず、基+1i1にアルミニウムを真空蒸着して−iな
アルミニウム膜を形成し、フォトエツチング法により、
<シ歯状の陽+4i it 極2を作製する。そして、
この上に厚膜印刷法により、厚膜絶縁層6をガラス月を
用いて形成する。この厚膜絶縁層6は第5図に示した様
に螢光体形成領域を含む溝状の開1コ幅11部分を除い
て形成される。
First, aluminum was vacuum-deposited on the base +1i1 to form a -i aluminum film, and by photoetching,
<Create tooth-shaped positive +4i it pole 2. and,
A thick film insulating layer 6 is formed thereon using a glass plate by a thick film printing method. As shown in FIG. 5, this thick film insulating layer 6 is formed except for the groove-shaped opening 11 width portion including the phosphor formation region.

(2)、螢光体形成領域の形成(第1図、第5図参照)
(2) Formation of phosphor formation area (see Figures 1 and 5)
.

厚膜絶縁層6の形成された基@1上にフォトレジスト剤
20を塗布した後、螢光体4が形成されるべき副走査方
向サイズに対応した開口幅りの溝をフォトエツチング法
により除去する。このとき、各開口幅は、H> hなる
関係を満足するものとする。例えば、H=200μmと
すれば、h=50μmである。この寸法は、螢光表示管
を光プリンター装置に用いるとき、螢光体ドラ1−サイ
ズが主走査方向(長手方向)、副走査方向ともほぼ等し
い寸法の方が解像力の点から望ましく、ドツト密度30
0(ドツト/インチ)とすると、主走査方向の陽極ピッ
チが87μm、陽極電極幅が5Q7+m、電極間隔37
μmとなることからでてきたものである。
After coating the photoresist agent 20 on the base @1 on which the thick film insulating layer 6 is formed, a groove with an opening width corresponding to the size in the sub-scanning direction in which the phosphor 4 is to be formed is removed by photoetching. do. At this time, it is assumed that each opening width satisfies the relationship H>h. For example, if H=200 μm, then h=50 μm. When using a fluorescent display tube in an optical printer, it is desirable for this size to be approximately the same size in both the main scanning direction (longitudinal direction) and the sub-scanning direction from the viewpoint of resolution, and dot density. 30
If it is 0 (dots/inch), the anode pitch in the main scanning direction is 87 μm, the anode electrode width is 5Q7+m, and the electrode spacing is 37
This comes from the fact that it is μm.

(3)、螢光体の形成(第4図、第5図参照)。(3) Formation of phosphor (see Figures 4 and 5).

こうして開口幅り以外をフォトレジスト剤20で覆われ
た基板1を、螢光体を含有する電解液の中に入れて、陽
極?!1極2及び対向電極に所定の電界を印加して螢光
体4を電気泳動法により。
The substrate 1, which is thus covered with the photoresist agent 20 except for the opening width, is placed in an electrolytic solution containing a phosphor, and the anode? ! A predetermined electric field is applied to one electrode 2 and a counter electrode, and the phosphor 4 is electrophoresed.

露出した陽極部(50μm×50μm)に付着させる。It is attached to the exposed anode part (50 μm x 50 μm).

(4)、レジスト剤の除去 こうして、螢光体4が付着されたならば1次に、レジス
ト膜20を除去するため、この基板1を高温炉(〜50
0℃)に入れて1時間程焼成する。
(4) Removal of resist agent Once the phosphor 4 has been attached, the first step is to remove the resist film 20 by placing the substrate 1 in a high-temperature oven (~50 mL).
0℃) and bake for about 1 hour.

すると、レジストv20が蒸発して除去される。Then, the resist v20 is evaporated and removed.

以上の手順を通じて螢光体4がドツト状に形成され、各
表面による螢光面が形成される。
Through the above procedure, the phosphor 4 is formed into a dot shape, and each surface forms a phosphorescent surface.

この実施例では、と記手順の(2)においてレジスト膜
のフォトエツチング時に開口幅りにてスリット状にエツ
チングしたが、他の方法として、最終的に形成されるべ
き螢光体4の寸法に対応して陽+L[極2上に例えば5
0μm×50μmの正方形開口でエツチングすることも
できる。この寸法によると、陽極電極の露出部が螢光体
サイズに対応しているため、電気法lll法による螢光
体の付着を一層容易に行なうことができる。
In this example, in step (2), the resist film was etched into a slit shape with the width of the opening. Correspondingly positive + L [e.g. 5 on pole 2
Etching can also be performed with square openings of 0 μm x 50 μm. With this dimension, the exposed portion of the anode electrode corresponds to the size of the phosphor, so that the phosphor can be more easily attached by the electric method.

何れの実施例にしても、従来技術と異なり、螢光体4を
直接、レジスト剤や現像液等にさらすことかないため、
螢光体の特性劣化を防止することができる。
In any of the embodiments, unlike the prior art, the phosphor 4 is not directly exposed to resist agent, developer, etc.
Deterioration of the characteristics of the phosphor can be prevented.

又、螢光体4のサイズは、フォトレジストの整形により
正確に制御して形成されるため、螢光体サイズ(ドツト
サイズ)のばらつきが少なく、従って螢光表示管として
構成した場合に光量のばらつきも少ないとの利点も得る
。さらに、微小ドツトサイズの螢光体の形成も可能であ
り、例えば。
In addition, since the size of the phosphor 4 is precisely controlled and formed by shaping the photoresist, there is little variation in the phosphor size (dot size), and therefore, when configured as a fluorescent display tube, there is no variation in the amount of light. You also get benefits with less. Furthermore, the formation of fluorophores of minute dot size is also possible, e.g.

400(ドツト/インチ)もの、高密度を達成すること
ができる。
Densities as high as 400 dots/inch can be achieved.

こうしてレジスト剤が除去されたならば、厚膜絶縁N!
6に制御電極7及び陰極フィラメント8を設け、フェー
スガラス9を融着して真空封止すれば螢光表示管ができ
あがる。
Once the resist agent is removed in this way, the thick film insulation N!
6 is provided with a control electrode 7 and a cathode filament 8, and a face glass 9 is fused and vacuum sealed to complete a fluorescent display tube.

(効  果) 本発明によれば1発光特性を劣化させることなく、螢光
体を陽極屯田上に高密度でかつ高精度に形成することが
でき、好都合である。
(Effects) According to the present invention, the phosphor can be formed on the anode at high density and with high accuracy without deteriorating the light emission characteristics, which is advantageous.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係る螢光面形成工程における基板の断
面図、第2図は螢光表示管の断面図、第3図は螢光表示
管の平面図、第4図は制御電極の拡大正面図、第5図は
第1図に対応する平面図である。 ■・・・・基板、2・・・・陽極電極、6・・・・厚膜
絶縁層、20・・・・レジストIvA。 最り尺 乙 (1)明細書第3百第3行中の「発光性」を「発光手続
補正書 昭和61年1月9日 適
FIG. 1 is a sectional view of a substrate in the process of forming a fluorescent surface according to the present invention, FIG. 2 is a sectional view of a fluorescent display tube, FIG. 3 is a plan view of the fluorescent display tube, and FIG. 4 is a diagram of a control electrode. The enlarged front view, FIG. 5, is a plan view corresponding to FIG. 1. ■...Substrate, 2...Anode electrode, 6...Thick film insulating layer, 20...Resist IvA. (1) "Luminescence" in line 300, line 3 of the specification was changed to "Luminescence procedure amendment document effective January 9, 1986.

Claims (1)

【特許請求の範囲】 長尺の基板上に微小間隔をおき、この基板の長手方向に
そって多数の微小な短冊状の陽極電極を配列し、各陽極
電極の表面に螢光面を形成してなる螢光表示管の螢光面
形成方法において、 基板上に陽極電極を形成した後、これらの上に厚膜絶縁
層を形成してからレジスト膜をつくり、フォトエッチン
グ法により陽極電極表面に螢光体付着領域を確保した後
、上記レジスト膜を形成された基板を螢光体含有の電解
液中におき、電気泳動法により陽極電極表面に螢光面を
形成し、この基板を高温炉に入れてレジストを除去する
工程を経て製作されることを特徴とする螢光表示管の螢
光面形成方法。
[Claims] A large number of minute strip-shaped anode electrodes are arranged at minute intervals on a long substrate along the longitudinal direction of the substrate, and a fluorescent surface is formed on the surface of each anode electrode. In the method for forming a fluorescent surface of a fluorescent display tube, an anode electrode is formed on a substrate, a thick insulating layer is formed on top of the anode electrode, a resist film is formed, and the surface of the anode electrode is formed by photo-etching. After securing the phosphor attachment area, the substrate on which the resist film is formed is placed in a phosphor-containing electrolytic solution, a phosphor surface is formed on the anode electrode surface by electrophoresis, and the substrate is placed in a high temperature furnace. 1. A method for forming a fluorescent surface of a fluorescent display tube, characterized in that the fluorescent display tube is manufactured through a step of placing the resist in the tube and removing the resist.
JP25035385A 1985-11-08 1985-11-08 Fluorescent screen forming method for fluorescent character display tube Pending JPS62110229A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25035385A JPS62110229A (en) 1985-11-08 1985-11-08 Fluorescent screen forming method for fluorescent character display tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25035385A JPS62110229A (en) 1985-11-08 1985-11-08 Fluorescent screen forming method for fluorescent character display tube

Publications (1)

Publication Number Publication Date
JPS62110229A true JPS62110229A (en) 1987-05-21

Family

ID=17206654

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25035385A Pending JPS62110229A (en) 1985-11-08 1985-11-08 Fluorescent screen forming method for fluorescent character display tube

Country Status (1)

Country Link
JP (1) JPS62110229A (en)

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