JPS62106641A - Wafer aligning unit - Google Patents

Wafer aligning unit

Info

Publication number
JPS62106641A
JPS62106641A JP24625585A JP24625585A JPS62106641A JP S62106641 A JPS62106641 A JP S62106641A JP 24625585 A JP24625585 A JP 24625585A JP 24625585 A JP24625585 A JP 24625585A JP S62106641 A JPS62106641 A JP S62106641A
Authority
JP
Japan
Prior art keywords
wafer
cassette
wafers
hand
aligning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24625585A
Other languages
Japanese (ja)
Other versions
JPH0611069B2 (en
Inventor
Shunzo Imai
今井 俊三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP24625585A priority Critical patent/JPH0611069B2/en
Publication of JPS62106641A publication Critical patent/JPS62106641A/en
Publication of JPH0611069B2 publication Critical patent/JPH0611069B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To lower probabilities for a wafer to be damaged by a method wherein a sensor capable of detecting if a wafer is out of a cassette insertion/ extraction opening is provided for the accomplishment of aligning only when a wafer is out of the opening. CONSTITUTION:A beam 18 emitted by a sensor 16 at the light-emitting side is received by a sensor 17 on the light-receiving side. A wafer 4 out of a wafer cassette 5 stops the beam 18. This causes a pusher 15 to go into operation, which in turn causes a mount 6, push-up platform 13, and eccentric cam 7 to go into motion for the rotation of the wafer cassette 5 around shaft support members 9 and 14. As the result, the wafer cassette 5 is inclined with its wafer insertion/extraction opening up. A motor drives the eccentric cam 7 and the wafer cassette 5 is thrown into a rocking motion for the alignment of wafers 4 in the wafer cassette 5. A spring 8 expands and contracts in response to the eccentric cam 7 in rotation, pushing a mount 6 against the eccentric cam 7. After the rocking, the wafer cassette 5 is allowed to return to its original attitude.

Description

【発明の詳細な説明】 [発明の属する分野1 本発明はウェハ整列装置に関し、詳しくは、IC,LS
I等の製造工程で用いられるウェハカセット(ウェハ収
納箱)からのウェハ挿IIQを直進型ハンドを用いて行
なうウェハ搬送装置において、ウェハカセット内でウェ
ハを整列させる装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field 1 of the Invention] The present invention relates to a wafer alignment device, and more particularly, to a wafer alignment device for IC, LS,
The present invention relates to a device for aligning wafers in a wafer cassette in a wafer transfer device using a linear hand to insert wafers IIQ from a wafer cassette (wafer storage box) used in a manufacturing process such as I.

[従来技術] 従来、半導体製造装置でのウェハの搬送においては、ウ
ェハ挿脱口側から直進型のハンドをIIT+入する方式
がよく用いられている。これは、直接、ウェハカセット
よりウェハをハンドに載せて取出ず方式である。この方
式によれば、ウエハカビツトの任意の部分からウェハを
取出しまた同じ位置に戻すことが可能となるので、すべ
てのカセットを供給および回収兼用のカセットとするこ
とができ、装置が小形化できるメリットがある。
[Prior Art] Conventionally, in the transportation of wafers in semiconductor manufacturing equipment, a method is often used in which a linear hand is inserted from the wafer insertion/ejection port side. This is a method in which the wafer is placed directly on the hand from the wafer cassette without being taken out. According to this method, it is possible to take out wafers from any part of the wafer cabinet and return them to the same position, so all cassettes can be used for both supply and collection, which has the advantage of making the equipment more compact. be.

第3図は、従来のウェハ搬送装置の概略構成を示す。同
図において、1は直進ハンド、2は直進ハンド1の駆動
部である。また、4はウェハ、5はウェハ4を収納する
ウェハカセット、6はウエハカセッ1〜5をUNする台
である。19はハンド1の移動方向を示す。
FIG. 3 shows a schematic configuration of a conventional wafer transfer device. In the figure, 1 is a straight hand, and 2 is a drive section of the straight hand 1. Further, 4 is a wafer, 5 is a wafer cassette for storing the wafer 4, and 6 is a stand for unloading the wafer cassettes 1 to 5. 19 indicates the moving direction of the hand 1.

ところで、このような直進型ハンドによる方式ではハン
ドに略具合よくウェハを載置する必要がある。もし・ウ
ェハカセットよりウェハが余り大きく飛び出していると
様々な不具合が生ずるからである。例えば、ウェハ挿脱
口でハンドがウェハ取出しのため上下(第3図矢印19
方向)したときウェハを破損する危険がある。また、ウ
ェハがハンド上にずれて載置され、次工程でチャックに
ウェハを搭載しようとしてもウェハがバキューム吸着溝
から離れてしまってうまく挿着できなかったり、静電容
量型のセンサでプリアライメントしようとするときはそ
の検知範囲からウェハ端面がはみ出してうまく検知でき
ない、またウェハを−Hつエバカセット内の所定位置に
整列させても、装置の振動等で再び飛び出すことがある
等の問題があった。
By the way, in such a method using a straight hand, it is necessary to place the wafer on the hand almost properly. This is because if the wafer protrudes too much from the wafer cassette, various problems will occur. For example, at the wafer insertion/ejection port, the hand moves up and down (arrow 19 in Figure 3) to take out the wafer.
direction), there is a risk of damaging the wafer. In addition, the wafer may be misplaced on the hand, and when attempting to mount the wafer on the chuck in the next process, the wafer may move away from the vacuum suction groove and cannot be properly inserted. When attempting to do so, the wafer end face protrudes from the detection range and cannot be detected properly.Also, even if the wafer is aligned at a predetermined position within the wafer case, it may pop out again due to equipment vibration, etc. there were.

そこで、ウェハ脱出動作に先立ってウェハを一旦整列さ
せる必要がある。このため、従来は必ず一回、手動等に
よりウェハカセットを挿脱口側を天にして傾倒せしめ、
しかる後ウエハカセツ1〜を揺動せしめウェハを整列し
ていた。この方法だとウェハに対して頻繁に振動を与え
ることとなり、その分ウェハ損傷の確率が高くなるとい
う欠点があった。
Therefore, it is necessary to once align the wafers prior to the wafer ejection operation. For this reason, conventionally, the wafer cassette had to be manually tilted once with the insertion/ejection port side facing upward.
Thereafter, the wafer cassettes 1 to 1 were swung to align the wafers. This method has the disadvantage that vibrations are frequently applied to the wafer, which increases the probability of damaging the wafer.

[発明の目的] 本発明は上述の従来形における問題点に鑑み、ウェハ挿
脱口のウェハ理想整列位置よりある一定m離れた位置に
ウェハの有無を検知するためのセンサを設け、ウェハが
検知されなかったときは整列動作を行なわず、ウェハが
有るとき即ちカセットからウェハが飛び出したときのみ
ウエハカセツ1〜を傾けてウェハを整列させるという構
想に基づき、ウェハがカセット挿脱口から飛び出したこ
とが原因となって発生するウェハの損傷を大幅に少なく
し、全体どじてウェハの1員傷の確率を小さくすること
を目的とする。
[Object of the Invention] In view of the above-mentioned problems with the conventional type, the present invention provides a sensor for detecting the presence or absence of a wafer at a certain distance from the ideal wafer alignment position of the wafer insertion/ejection opening, and detects the presence of the wafer. Based on the concept of aligning the wafers by tilting the wafer cassettes 1 to 1 only when there are wafers, that is, when the wafers have jumped out of the cassette, the wafers have jumped out of the cassette insertion/ejection opening. The purpose of this invention is to significantly reduce the damage to the wafer that occurs due to this, and to reduce the probability of single-member damage to the wafer as a whole.

[発明の慨要1 上記目的を達成するため、本発明のウェハ整列装置は、
ウェハカセットからのウェハ取出しをカセットのウェハ
挿脱口側のウェハと対抗する位置に直進型ハンドを設け
、該ハンドをカセット内にウェハに接触しないように挿
入し、その進入方向と直角方向にハンドを移動せしめ、
ハンド上にウェハを載置し、しかる後にハンドをカセッ
トのウェハ挿脱口側に脱出せしめてウェハを取出すウェ
ハ搬送装置において、ウェハ挿脱口側のウェハの理想整
列位置よりある一定量雛れた位置にウェハの有無を検知
できる検知手段を設けてウェハを脱出さじる動作に先立
ちウェハの有無を検知し、無しのときはそのまま、有り
のときはウェハを一旦整列させた後に、ハンドをウェハ
カセットに挿入してウェハを取出すことを特徴とする。
[Summary of the Invention 1 In order to achieve the above object, the wafer alignment device of the present invention has the following features:
A straight-advancing hand is provided at a position opposite to the wafer on the wafer insertion/ejection opening side of the cassette to take out the wafer from the wafer cassette, and the hand is inserted into the cassette so as not to touch the wafer, and the hand is moved in a direction perpendicular to the direction of entry. move,
In a wafer transport device in which a wafer is placed on a hand and then the hand is pulled out to the wafer insertion/ejection port side of a cassette to take out the wafer, the wafer is placed at a position a certain amount away from the ideal alignment position of the wafers on the wafer insertion/ejection port side. A detection means capable of detecting the presence or absence of a wafer is provided to detect the presence or absence of a wafer prior to the operation of ejecting the wafer.If there is no wafer, the hand is inserted into the wafer cassette.If there is no wafer, the hand is inserted into the wafer cassette. The wafer is then taken out.

[実施例の説明1 以下、図面を用いて本発明の詳細な説明する。[Description of Example 1 Hereinafter, the present invention will be explained in detail using the drawings.

第1,2図は本発明の一実施例に係るウェハ整列装置の
構成を示1゜なお、従来例と共通または対応する部分に
ついては同一の符番で示す。第1゜2図において、2は
直進ハンド1の駆動部でありまたウェハ4がカセット5
内のどの部分にあるか検知するための検知機構部でもあ
る。3は検知機構部2と同じくウェハ検知のためのミラ
ーである。
1 and 2 show the configuration of a wafer alignment apparatus according to an embodiment of the present invention.It should be noted that parts common or corresponding to those of the conventional example are designated by the same reference numerals. In FIG. 1.2, 2 is a drive unit for the linear hand 1, and the wafer 4 is placed in a cassette 5.
It is also a detection mechanism for detecting which part of the body it is in. Similarly to the detection mechanism section 2, 3 is a mirror for wafer detection.

また、ウェハカセット5を載置する台6はカセッ]〜5
と係合している。7は偏心カムであり不図示のモータに
よって回転されて載置台6に揺動運動を与える。8はス
プリングであり載置台6を偏心カム7に押しつけるため
のものである。10.12はスプリング8の引掛は部材
である。9は載置台6が傾くときの回転中心となる軸支
部材、同様に14は押し上げ台13が傾くときの回転中
心となる軸支部材である。11は本体部材であり軸支部
材9.14と係合している。15はブツシャであり、押
し上げ台13を押し上げる作用をする。16.17はセ
ンサであり、16が発光側、17は受光側である。18
は16より発せられた光ビームを示す。
Further, the table 6 on which the wafer cassette 5 is placed is a cassette]~5
is engaged with. Reference numeral 7 denotes an eccentric cam, which is rotated by a motor (not shown) to give swinging motion to the mounting table 6. A spring 8 is used to press the mounting table 6 against the eccentric cam 7. 10.12 is a member on which the spring 8 is hooked. Reference numeral 9 denotes a shaft support member that becomes the center of rotation when the mounting table 6 is tilted, and similarly, 14 represents a shaft support member that becomes the center of rotation when the push-up table 13 tilts. 11 is a main body member which engages with the shaft support member 9.14. Reference numeral 15 denotes a pusher, which functions to push up the push-up table 13. 16 and 17 are sensors, 16 is a light emitting side, and 17 is a light receiving side. 18
indicates a light beam emitted from 16.

以上の構成において、ウェハ整列の動作を第1゜2図を
参照して説明する。
In the above configuration, the operation of wafer alignment will be explained with reference to FIGS. 1-2.

まず、発光側センサ16からビーム18を発し受光側セ
ンサ17で受光する。ビーム18の位置は理想ウェハ位
置よりある一定量ノだけ離れた位置に設定する。
First, a beam 18 is emitted from the light-emitting sensor 16 and received by the light-receiving sensor 17 . The position of the beam 18 is set a certain amount away from the ideal wafer position.

もし、第2図に示す如くウェハ4がウェハカセット5か
ら飛び出しているとビーム18は遮られる。
If the wafer 4 protrudes from the wafer cassette 5 as shown in FIG. 2, the beam 18 will be blocked.

づ゛るとブツシャ15が働き、載置台6および押し上げ
台13、隔心カム7とともに軸支部材9,14を回転中
心としてウェハカセット5をウェハ挿脱口側を天にして
傾ける。しかる後、偏心カム7を不図示のモータによっ
て回転させてウェハカセットに揺動運動を与え、ウェハ
4をウェハカセット5内に確実に整列させる。スプリン
グ8は偏心カム7の回転に従って伸縮し、載置台6を偏
心カム7に押し付けている。揺動の後、再びウエハカセ
ツl〜5を起こす。
As a result, the pusher 15 operates, and the wafer cassette 5 is tilted with the mounting table 6, the push-up table 13, the spaced cam 7, and the shaft support members 9, 14 as rotation centers with the wafer insertion/ejection port facing upward. Thereafter, the eccentric cam 7 is rotated by a motor (not shown) to give a rocking motion to the wafer cassette, and the wafers 4 are reliably aligned in the wafer cassette 5. The spring 8 expands and contracts as the eccentric cam 7 rotates, and presses the mounting table 6 against the eccentric cam 7. After rocking, wafer cassettes 1 to 5 are raised again.

もしここで、第1図の如くウェハがビーム18を遮らな
(すれば、ウェハカセット5の(頃仙および1記動は行
なわれない。
If the wafer does not block the beam 18 as shown in FIG. 1, then no movement of the wafer cassette 5 is performed.

次に、直進ハンド1をウニバカゼット5に差し込む適性
位置、即ち取出す目標であるウェハ4に対して、ハンド
1を差し込むべき位置を検知する。
Next, the appropriate position for inserting the straight-moving hand 1 into the unibakazette 5, that is, the position at which the hand 1 should be inserted with respect to the wafer 4 that is the target to be taken out is detected.

これは検知機構部2にある不図示のレーザ源からレーザ
を発しミラー3に当てて、反射した不図示の光を不図示
のディテクタにて検知リ−ることにより行なう。検知後
ハンド1はカセット5内に進入し、第1図の紙面上方向
へと移ΦJlする。
This is done by emitting a laser from a laser source (not shown) in the detection mechanism section 2 and shining it on the mirror 3, and detecting the reflected light (not shown) by a detector (not shown). After the detection, the hand 1 enters the cassette 5 and moves upward in the paper plane of FIG.

ウェハ4がウェハカセット5内の不図示の棚部材からハ
ンド1の上に移ると不図示のバキューム検知機構によっ
てウェハ4がハンド1に確実に載置されたことが検知さ
れる。その後、ウェハ4はカセット外に搬出される。搬
出されたウェハは不図示の次工程へと移送される。
When the wafer 4 is moved from a shelf member (not shown) in the wafer cassette 5 to the top of the hand 1, a vacuum detection mechanism (not shown) detects that the wafer 4 is securely placed on the hand 1. Thereafter, the wafer 4 is carried out of the cassette. The unloaded wafer is transferred to the next process (not shown).

ウェハをカセット5に戻す場合は戻す前にウェハ検知を
行ないビームが遮られなければそのまま、また遮られれ
ば傾動および揺動運動を行なってウェハを整列させ、し
かる後ウェハをカセット5に戻す。
When returning the wafer to the cassette 5, the wafer is detected before being returned, and if the beam is not blocked, it remains as is, and if it is blocked, the wafer is aligned by tilting and swinging movements, and then the wafer is returned to the cassette 5.

なお、寸法〕はハンド1によってビーム18が遮られる
ことのないように設定しなければならない。
Note that the dimensions must be set so that the beam 18 is not blocked by the hand 1.

すなわち、ビーム18がハンド1の上下する位置に入り
込まないようにする必要がある。しかし、寸法jを余り
大きくするとその弁装置が大きくなるという欠点が生じ
る。また、反対に余り小さいと外部振動などでウェハが
ウェハカセット5より少し飛び出したのみで傾動および
揺動運動を頻繁に行なわねばならないという問題が生じ
る。従って、3〜5喘程度に選ぶとよい。
That is, it is necessary to prevent the beam 18 from entering the vertical position of the hand 1. However, if the dimension j is made too large, the valve device becomes large. On the other hand, if it is too small, a problem arises in that even if the wafer slightly protrudes from the wafer cassette 5 due to external vibration or the like, tilting and swinging movements must be performed frequently. Therefore, it is best to choose between 3 and 5 breaths.

本実施例ではウェハカセットを傾動さけたが、傾動させ
ないでハンドにウェハを押し込むための専用部材を設け
てもよい。しかし、その場合でもセンサは必要である。
Although the wafer cassette is not tilted in this embodiment, a special member may be provided for pushing the wafer into the hand without tilting the wafer cassette. However, a sensor is still required in that case.

また、本実施例では、センサとして透過型を用いたが、
これに限ることなく反射型のセンサ等を用いてもよい。
In addition, in this example, a transmission type was used as the sensor, but
The sensor is not limited to this, and a reflective sensor or the like may be used.

[発明の効果] 以上説明したように、本発明によれば、カセット挿脱口
からウェハが飛び出していることを検知するセンサを設
け、ウェハ飛び出しがあったときのみ整列動作を行なっ
ているので、ウェハを整列さけるための傾動および揺動
運動をウェハ挿脱毎に行なう必要がなくなり、ウェハ飛
び出しににるウェハの破損を大幅に少なくし、全体とし
てウェハの損傷の確率を小さくすることができる。
[Effects of the Invention] As explained above, according to the present invention, a sensor is provided to detect when a wafer is ejected from the cassette insertion/ejection opening, and the alignment operation is performed only when a wafer ejects. It is no longer necessary to perform tilting and rocking movements to avoid alignment each time a wafer is inserted or removed, and damage to the wafer due to the wafer being ejected can be greatly reduced, and the probability of damage to the wafer as a whole can be reduced.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明の一実施例に係るウェハ整列装置の構
成図、 第2図は、上記実施例においてウェハがウェハカセット
より少し飛び出してビームを遮った状態を示す図、 第3図は、従来の°ウェハ搬送装置の概略構成図である
。 1:直進ハンド、4:ウェハ、5:カセット、7:鵠心
カム、15:プッシャ、16:発光センサ、17:受光
センサ、18:ビーム。
FIG. 1 is a block diagram of a wafer alignment apparatus according to an embodiment of the present invention. FIG. 2 is a diagram showing a state in which the wafer slightly protrudes from the wafer cassette and blocks the beam in the above embodiment. , is a schematic configuration diagram of a conventional wafer transfer device. 1: straight hand, 4: wafer, 5: cassette, 7: centrifugal cam, 15: pusher, 16: light emitting sensor, 17: light receiving sensor, 18: beam.

Claims (1)

【特許請求の範囲】 1、ウェハカセット内のウエハを該カセットのウェハ挿
脱口に対して一直線に整列させる装置であって、該ウェ
ハカセット内に収納されたウェハの少なくとも1枚が該
カセットの挿脱口に対して所定量以上突出しているとき
検出信号を発生するウェハ位置検出手段と、該検出信号
に基づいて上記ウェハカセット内のウェハを一方向に付
勢するウェハ整列手段とを具備することを特徴とするウ
ェハ整列装置。 2、前記整列手段は、前記カセットを挿脱口側を天とし
て傾倒しその後該カセットを揺動するものである特許請
求の範囲第1項記載のウェハ整列装置。 3、前記整列手段は、前記カセットの挿脱口側からウェ
ハと対向する位置に設けたウェハ挿脱用の直進型ハンド
に、該ハンドを該カセット内に挿入したとき該カセット
内の所定位置からずれて収納されているウェハの外周に
当接して該ウェハを所定位置に押込む部材を設け、これ
により整列するものである特許請求の範囲第1項記載の
ウェハ整列装置。
[Scope of Claims] 1. A device for aligning wafers in a wafer cassette in a straight line with respect to a wafer insertion/ejection port of the cassette, wherein at least one of the wafers stored in the wafer cassette is inserted into the cassette. The wafer position detecting means generates a detection signal when the wafer protrudes beyond a predetermined amount with respect to the ejection port, and the wafer aligning means biases the wafer in the wafer cassette in one direction based on the detection signal. Features of wafer alignment equipment. 2. The wafer aligning device according to claim 1, wherein the aligning means tilts the cassette with the insertion/ejection port side facing upward, and then swings the cassette. 3. The alignment means is configured to prevent the hand from shifting from a predetermined position in the cassette when the hand is inserted into the cassette, and is placed in a position facing the wafer from the insertion/ejection opening side of the cassette. 2. The wafer aligning apparatus according to claim 1, wherein a member is provided to push the wafers into a predetermined position by coming into contact with the outer periphery of the wafers stored in the wafer, thereby aligning the wafers.
JP24625585A 1985-11-05 1985-11-05 Wafer aligner Expired - Lifetime JPH0611069B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24625585A JPH0611069B2 (en) 1985-11-05 1985-11-05 Wafer aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24625585A JPH0611069B2 (en) 1985-11-05 1985-11-05 Wafer aligner

Publications (2)

Publication Number Publication Date
JPS62106641A true JPS62106641A (en) 1987-05-18
JPH0611069B2 JPH0611069B2 (en) 1994-02-09

Family

ID=17145801

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24625585A Expired - Lifetime JPH0611069B2 (en) 1985-11-05 1985-11-05 Wafer aligner

Country Status (1)

Country Link
JP (1) JPH0611069B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5605428A (en) * 1993-03-05 1997-02-25 Jenoptik Gmbh Device for indexing magazine compartments and wafer-shaped objects in the compartments
EP0886302A2 (en) * 1997-06-17 1998-12-23 Philips Patentverwaltung GmbH Reactor with a protective device for handling wafers
US5964564A (en) * 1996-07-15 1999-10-12 B-W Controls, Inc. Method and apparatus for detecting cross-slotted objects
KR100788198B1 (en) 2006-07-03 2007-12-26 주식회사 에스에프에이 Apparatus for supplying printed circuit on fpd panel and cassette housing therefor
JP2008018340A (en) * 2006-07-13 2008-01-31 Trinc:Kk Apparatus for collecting floating material and apparatus for repelling floating material

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5605428A (en) * 1993-03-05 1997-02-25 Jenoptik Gmbh Device for indexing magazine compartments and wafer-shaped objects in the compartments
US5964564A (en) * 1996-07-15 1999-10-12 B-W Controls, Inc. Method and apparatus for detecting cross-slotted objects
EP0886302A2 (en) * 1997-06-17 1998-12-23 Philips Patentverwaltung GmbH Reactor with a protective device for handling wafers
EP0886302A3 (en) * 1997-06-17 2004-04-07 Philips Intellectual Property & Standards GmbH Reactor with a protective device for handling wafers
KR100788198B1 (en) 2006-07-03 2007-12-26 주식회사 에스에프에이 Apparatus for supplying printed circuit on fpd panel and cassette housing therefor
JP2008018340A (en) * 2006-07-13 2008-01-31 Trinc:Kk Apparatus for collecting floating material and apparatus for repelling floating material

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