JPH04154144A - Substrate carrying-in and taking-out mechanism - Google Patents
Substrate carrying-in and taking-out mechanismInfo
- Publication number
- JPH04154144A JPH04154144A JP27981290A JP27981290A JPH04154144A JP H04154144 A JPH04154144 A JP H04154144A JP 27981290 A JP27981290 A JP 27981290A JP 27981290 A JP27981290 A JP 27981290A JP H04154144 A JPH04154144 A JP H04154144A
- Authority
- JP
- Japan
- Prior art keywords
- cassette
- substrate
- wafer
- substrates
- board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 82
- 230000007246 mechanism Effects 0.000 title claims abstract description 47
- 238000001514 detection method Methods 0.000 claims abstract description 27
- 238000000034 method Methods 0.000 abstract description 2
- 230000001174 ascending effect Effects 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 27
- 238000010586 diagram Methods 0.000 description 8
- 239000000428 dust Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【発明の詳細な説明】
〔概要〕
本発明は、ウェハプロセスにおいて、シリコンウェハ等
の基板を複数枚、水平に収納するカセットの基板入出機
構に関し。DETAILED DESCRIPTION OF THE INVENTION [Summary] The present invention relates to a substrate loading/unloading mechanism for a cassette that horizontally stores a plurality of substrates such as silicon wafers in a wafer process.
カセットから基板を基板保持具により取り出す場合、カ
セット内の基板に対して取り出し待機状態の時に、基板
保持具が常に同じ平行度にあるように調整し、カセット
内の基板の平行度のばらつきをなくシ、常に同じ状態で
基板を取り出せるように、また、カセットへ基板を収納
する場合、溝の平行度を基板と同じように調整して、常
に同じ状態で基板を収納できるようにすることを目的と
し。When taking out a substrate from a cassette using a substrate holder, adjust the substrate holder so that it is always parallel to the substrate in the cassette when it is in the waiting state for removal, to eliminate variations in the parallelism of the substrates in the cassette. The purpose is to be able to always take out the board in the same state, and when storing the board in the cassette, to adjust the parallelism of the groove to be the same as the board, so that the board can always be stored in the same state. year.
カセットの内壁に刻まれた複数の溝に、複数枚の基板を
一枚ずつ水平に収納し、該基板の入出に際して、該基板
を入出する面まで該カセットを上下に移動し、しかる後
、該基板をカセットより水平に出し入れする機構におい
て
該カセットを該溝のピッチ毎に上下に移動する上下機構
と、互いに、水平面上の平行な位置に保たれた少なくと
も3方向から基板レベルを検出する3個以上の基板検出
機構と、該基板検出機構がすべて基板を検出するまで、
該基板を収納するカセットの台を作動する傾斜機構と、
該基板を水平に保った後、該基板の入出を行う基板保持
具とを有するように構成する。A plurality of substrates are stored horizontally one by one in a plurality of grooves cut into the inner wall of the cassette, and when loading and unloading the substrates, the cassette is moved up and down to the surface where the substrates are loaded and unloaded, and then A vertical mechanism for horizontally loading and unloading substrates from a cassette, which moves the cassette up and down according to the pitch of the groove, and three sensors for detecting the substrate level from at least three directions kept parallel to each other on a horizontal plane. Until the above board detection mechanism and the board detection mechanism all detect the board,
a tilting mechanism that operates a cassette platform for storing the substrate;
The device is configured to include a substrate holder for moving the substrate in and out after keeping the substrate horizontal.
本発明は、カセットから基板を取り出す機構(以下基板
取出機構)、或いは、カセットへ基板を収納する機構(
以下基板収納機構)が確実に。The present invention provides a mechanism for taking out a substrate from a cassette (hereinafter referred to as a substrate taking out mechanism) or a mechanism for storing a substrate in a cassette (
The following board storage mechanism) is securely installed.
取り出し、収納を行うための機能に関する。Concerning functions for taking out and storing.
近年の半導体装置の高集積化、超微細化に伴う基板の大
口径化によって、半導体製造装置の自動化も格段に進み
、カセットから確実に基板を取り出し、それを基板の処
理装置に供給し、処理の終了した基板を処理装置からカ
セットに確実に収納するというように、基板の取り出し
、収納の確実性の要求が高まっている。In recent years, the automation of semiconductor manufacturing equipment has progressed significantly due to the increase in the diameter of substrates due to the high integration and ultra-fine design of semiconductor devices. There is an increasing demand for reliable removal and storage of substrates, such as the reliable storage of substrates from processing equipment into cassettes.
そのために、基板のカセ・ントの溝に対する位置決めを
正確に行う必要がある。For this purpose, it is necessary to accurately position the substrate with respect to the groove of the cassette.
従来のカセット上下機構では、基板の取り出しの時、基
板の入ったカセットをピッチセンサ等によりカセットの
溝のピッチ毎に降下させ、基板を基板検出センサにより
検出したら、カセットの降下を停止し、取り出し待機状
態となる。In the conventional cassette up/down mechanism, when taking out a board, the cassette containing the board is lowered at each groove pitch of the cassette using a pitch sensor, etc., and when the board is detected by the board detection sensor, the lowering of the cassette is stopped and the cassette is taken out. It will be in a standby state.
ところが、取り出し待機状態の基板の平行度は。However, the parallelism of the board while waiting to be taken out is...
基板の一部についての検出により、カセットの降下を停
止させるだけで、正確な位置決めが行われていない。Detection of a portion of the substrate only causes the cassette to stop lowering, but accurate positioning is not performed.
また、基板の収納の時についても、カセットをピッチセ
ンサ等により、カセットの溝のピッチ毎に上昇するだけ
で、カセットの溝の平行度は保証されていない。Furthermore, when storing the substrate, the cassette is simply raised at each pitch of the grooves of the cassette using a pitch sensor or the like, and the parallelism of the grooves of the cassette is not guaranteed.
従って、カセットから基板を取り出す場合に。 Therefore, when removing the board from the cassette.
同じカセット内の基板であっても、基板の状態によって
は、基板保持具が基板を保持できず、取り出しができな
かったり、取り出しができたとしてもカセットと基板の
接触により塵埃が発生するという問題があった。Even if the substrates are in the same cassette, depending on the condition of the substrate, the substrate holder may not be able to hold the substrate and it may not be possible to take it out, or even if it can be taken out, dust may be generated due to contact between the cassette and the substrate. was there.
また、カセットへ基板を収納する場合も同様の問題を生
じていた。Further, a similar problem occurs when a substrate is stored in a cassette.
本発明は、上記の問題点を鑑み、カセットから基板を取
り出す場合、カセット内の基板に対して取り出し待機状
態の時に、基板保持具が常に同じ平行度にあるように調
整し、カセット内の基板の平行度のばらつきをなくシ、
常に同じ状態で基板を取り出せるように、また、カセッ
トへ基板を収納する場合、溝の平行度を基板と同じよう
に調整して、常に同じ状態で基板を収納できるようにす
ることを目的として提供されるものである。In view of the above problems, the present invention adjusts the substrate holder so that it is always at the same parallelism with respect to the substrate in the cassette when it is in the waiting state for taking out the substrate in the cassette. Eliminate variations in parallelism,
Provided so that the board can always be taken out in the same state, and when storing the board in a cassette, the parallelism of the groove can be adjusted to match the board, so that the board can always be stored in the same state. It is something that will be done.
第1図は本発明の原理説明図である。 FIG. 1 is a diagram explaining the principle of the present invention.
図において、1は基板、2はカセット、3は溝。In the figure, 1 is a substrate, 2 is a cassette, and 3 is a groove.
4は上下機構、5は基板検出機構、6は台、7は傾斜機
構、8は基板保持具である。4 is a vertical mechanism, 5 is a substrate detection mechanism, 6 is a stand, 7 is a tilting mechanism, and 8 is a substrate holder.
本発明の特徴は、上記の問題点を解決するために、基板
検出機構を複数とし、全ての検出機構が基板を検出する
ように、基板を傾斜させる機構を設けて、基板の位置決
めを1枚づつ行うものである。In order to solve the above-mentioned problems, the present invention is characterized by providing a plurality of substrate detection mechanisms, and providing a mechanism for tilting the substrate so that all the detection mechanisms detect the substrate, thereby positioning a single substrate. It is done one by one.
即ち1本発明の目的は、第1図(b)に示すように、カ
セット2の内壁に刻まれた複数の溝3に。That is, one object of the present invention is to provide a plurality of grooves 3 carved in the inner wall of the cassette 2, as shown in FIG. 1(b).
複数枚の基板1を1枚ずつ水平に収納し、該基板1の入
出に際して、該基板1を入出する面まで該カセット2を
上下に移動し、しかる後、該基板lをカセット2より水
平に出し入れする機構において。A plurality of substrates 1 are stored horizontally one by one, and when loading and unloading the substrates 1, the cassette 2 is moved up and down to the surface where the substrates 1 are loaded and unloaded, and then the substrates 1 are horizontally moved from the cassette 2. In the mechanism for loading and unloading.
該カセット2を該溝3のピッチ毎に上下に移動する上下
機構4と。and a vertical mechanism 4 that moves the cassette 2 up and down at each pitch of the groove 3.
第1図(a)に示すように、互いに、水平面上の平行な
位置に保たれた少なくとも3方向から基板レベルを検出
する3個以上の基板検出機構5と第1図(b)に示すよ
うに、該基板検出機構5がすべて基板1を検出するまで
、該基板1を収納する該カセット2の台6を作動する傾
斜機構7と。As shown in FIG. 1(a), there are three or more board detection mechanisms 5 that detect the board level from at least three directions kept parallel to each other on a horizontal plane, and as shown in FIG. 1(b). and a tilting mechanism 7 that operates the platform 6 of the cassette 2 that stores the substrates 1 until the substrate detection mechanism 5 detects all the substrates 1.
第1図(a)に示すように、1枚毎に、該基板lを水平
に保った後、該基板1の入出を行う基板保持具8とを有
することにより達成される。As shown in FIG. 1(a), this is achieved by having a substrate holder 8 that holds each substrate 1 horizontally and then moves the substrate 1 in and out.
[作用]
本発明は、前回に示すように、カセット内の各基板の平
行度を、基板保持具の平行度と、溝単位で常に一定に補
正する機能を持つことにより、カセット内の基板と基板
保持具の平行度を、1枚毎に常に同じ状態に保つことが
できるため、基板検出機構と、基板保持具の位置を固定
しておけば。[Function] As shown in the previous section, the present invention has a function to always correct the parallelism of each substrate in the cassette to a constant value for each groove with the parallelism of the substrate holder. Since the parallelism of the substrate holder can always be kept the same for each substrate, it is possible to maintain the same parallelism for each substrate by fixing the positions of the substrate detection mechanism and the substrate holder.
カセットからの基板の取り出し、または、カセットへの
基板の収納が確実となって、基板入出具へ12板の装填
不具合やカセットと基板の接触による塵埃の発生もなく
なる。The removal of the board from the cassette or the storage of the board into the cassette becomes reliable, and there is no problem with loading the 12 boards into the board loading/unloading tool or generation of dust due to contact between the cassette and the board.
[実施例]
第2図は本発明の第1の実施例の構成図、第3図は本発
明の第2の実施例の構成図である。[Embodiment] FIG. 2 is a block diagram of a first embodiment of the present invention, and FIG. 3 is a block diagram of a second embodiment of the present invention.
図において、11はウェハ、12はカセット、13は溝
、14は上下機構215はウェハ検出センサ、16は台
、 17は傾斜機構、 18はウェハ保持具である。In the figure, 11 is a wafer, 12 is a cassette, 13 is a groove, 14 is a vertical mechanism 215, a wafer detection sensor, 16 is a stand, 17 is a tilting mechanism, and 18 is a wafer holder.
第2図は本発明の第1の実施例の構成図であり。FIG. 2 is a block diagram of the first embodiment of the present invention.
図に示すように、第1の実施例では、基板としてシリコ
ンのウェハ11を使用し、基板検出機構として、3個の
ウェハ検出センサ15A、15B、15Cを用いる。As shown in the figure, in the first embodiment, a silicon wafer 11 is used as the substrate, and three wafer detection sensors 15A, 15B, and 15C are used as the substrate detection mechanism.
この検出センサにはキーエンスのレーザ式光電スイッチ
LZ−151型を用いた。A Keyence laser photoelectric switch LZ-151 type was used as this detection sensor.
検出距離はスポット径がlll1m以内で40〜60+
u+。Detection distance is 40-60+ with spot diameter within 1m
u+.
最小検出体は0.01Φの銅素線である。The minimum detectable object is a copper wire of 0.01Φ.
このセンサ15の内、15Aは傾斜機構17Aにより台
16を傾斜させても、ウェハ11の検出を継続できる位
置に取り付ける。Of these sensors 15, 15A is mounted at a position where it can continue to detect the wafer 11 even when the table 16 is tilted by the tilting mechanism 17A.
ウェハ11の取り出しを開始した時、先ず、ウェハ検出
センサ15Aが、ウェハ11を検出する位置まで、上下
機構14のモーターを駆動して、カセット12を載せて
いる台16を降下させる。When starting to take out the wafer 11, first, the wafer detection sensor 15A drives the motor of the vertical mechanism 14 to lower the table 16 on which the cassette 12 is placed to the position where the wafer 11 is detected.
次に、ウェハ検出センサ15B、及び15Cをチエツク
し1両方のセンサ15が検出していたら、ウェハ11の
取り出しの待機状態に入る。Next, the wafer detection sensors 15B and 15C are checked, and if both sensors 15 are detected, a standby state for taking out the wafer 11 is entered.
一方、ウェハ検出センサ15B、15Cのどちらか一方
でも、ウェハを検出していない場合には1両方のセンサ
が検出するまで、傾斜機構17A、 17Bを作動させ
て1台16を左右、及び前後に傾斜させウェハ11が3
個のセンサと同一平面上に来るように、調整を繰り返す
。On the other hand, if either of the wafer detection sensors 15B, 15C does not detect a wafer, the tilting mechanisms 17A, 17B are operated to move the wafer 16 left and right and back and forth until both sensors detect the wafer. The wafer 11 is tilted 3
Repeat the adjustment so that it is on the same plane as each sensor.
そして、ウェハ11が完全にセンサ15と同一平面上に
調整されたら、ウェハ保持具18でウェハ11を吸着し
、′R送する。Then, when the wafer 11 is completely adjusted to be on the same plane as the sensor 15, the wafer 11 is attracted by the wafer holder 18 and transported by 'R'.
第3図は第2の実施例の構成図であり9図に示すように
、第1の実施例との違いは、第1の実施例のように、カ
セット毎2台16を傾斜させるか。FIG. 3 is a block diagram of the second embodiment, and as shown in FIG. 9, the difference from the first embodiment is that two cassettes 16 are tilted as in the first embodiment.
第2の実施例のように、カセット12内のウェハ11の
みを傾斜させて調整するかであり、基本的な動作は同じ
である。As in the second embodiment, only the wafers 11 in the cassette 12 are adjusted by tilting, but the basic operation is the same.
この場合、傾斜機構17C1及び17Dは上下機構14
とは独立しており、ウェハ検出センサ15と連動してい
る。In this case, the tilting mechanisms 17C1 and 17D are the vertical mechanisms 14
It is independent from the wafer detection sensor 15, and is linked to the wafer detection sensor 15.
〔発明の効果]
以上説明した様に1本発明によれば、カセット内の基板
の平行度、及び、溝の平行度を常に同じ状態に保つこと
ができるため、検出機構と、基板取出機構または基板収
納機構の位置を固定しておけば、カセットからの取り出
し、または、収納が確実となり、また、カセットと基板
の接触もなくなり2発塵も防止でき、半導体装置の歩留
り、スループットの向上にも寄与するところが大である
。[Effects of the Invention] As explained above, according to the present invention, the parallelism of the substrates in the cassette and the parallelism of the grooves can always be maintained in the same state, so that the detection mechanism, the substrate ejection mechanism, or By fixing the position of the substrate storage mechanism, removal from the cassette or storage is ensured, and there is no contact between the cassette and the substrate, preventing dust from being generated, which also helps improve the yield and throughput of semiconductor devices. This is a major contribution.
第1図は本発明の原理説明図。
第2図は本発明の第1の実施例の説明図。
第3図は本発明の第2の実施例の説明図。
である。
図において。
1は基板、 2はカセ・ント。
3は溝、 4は上下機構。
5は基板検出機構、 6は台。
7は傾斜機構、 8は基板保持具11はウェハ、
12はカセ・ント。
13は溝、14は上下機構。
15はウェハ検出センサ。
16は台、17は傾斜機構
18はウェハ保持具
木光帆の原理貌岨図
第1図FIG. 1 is a diagram explaining the principle of the present invention. FIG. 2 is an explanatory diagram of the first embodiment of the present invention. FIG. 3 is an explanatory diagram of a second embodiment of the present invention. It is. In fig. 1 is the board, 2 is the cassette. 3 is the groove, 4 is the vertical mechanism. 5 is a board detection mechanism, and 6 is a stand. 7 is a tilting mechanism; 8 is a substrate holder 11 for a wafer;
12 is Kase Nto. 13 is a groove, and 14 is a vertical mechanism. 15 is a wafer detection sensor. 16 is a stand, 17 is a tilting mechanism 18 is a wafer holder.
Claims (1)
複数枚の基板(1)を1枚ずつ水平に収納し、該基板(
1)の入出に際して、該基板(1)を入出する面まで該
カセット(2)を上下に移動し、しかる後、該基板(1
)をカセット(2)より水平に出し入れする機構におい
て、該カセット(2)を該溝(3)のピッチ毎に上下に
移動する上下機構(4)と、 互いに、水平面上の平行な位置に保たれた少なくとも3
方向から基板レベルを検出する3個以上の基板検出機構
(5)と、 該基板検出機構(5)がすべて基板(1)を検出するま
で、該基板(1)を収納する該カセット(2)の台(6
)を作動する傾斜機構(7)と、 1枚毎に、該基板(1)を水平に保った後、該基板(1
)の入出を行う基板保持具(8)とを有することを特徴
とする基板入出機構。[Claims] In a plurality of grooves (3) carved in the inner wall of the cassette (2),
A plurality of substrates (1) are stored horizontally one by one, and the substrates (1) are stored horizontally one by one.
When loading and unloading the substrate (1), move the cassette (2) up and down to the surface where the substrate (1) is loaded and unloaded, and then
) horizontally in and out of the cassette (2), the cassette (2) is moved up and down by the pitch of the groove (3), and the up-and-down mechanism (4) is maintained in a parallel position on a horizontal plane. At least 3 dripped
three or more substrate detection mechanisms (5) that detect the substrate level from the direction; and the cassette (2) that stores the substrate (1) until the substrate detection mechanisms (5) all detect the substrate (1). stand (6
) and a tilting mechanism (7) that operates the substrate (1) after keeping the substrate (1) horizontal one by one.
) A substrate loading/unloading mechanism characterized by having a substrate holder (8) for loading/unloading the board.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27981290A JPH04154144A (en) | 1990-10-18 | 1990-10-18 | Substrate carrying-in and taking-out mechanism |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27981290A JPH04154144A (en) | 1990-10-18 | 1990-10-18 | Substrate carrying-in and taking-out mechanism |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04154144A true JPH04154144A (en) | 1992-05-27 |
Family
ID=17616265
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP27981290A Pending JPH04154144A (en) | 1990-10-18 | 1990-10-18 | Substrate carrying-in and taking-out mechanism |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04154144A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0722492A (en) * | 1993-06-29 | 1995-01-24 | Fujikoshi Mach Corp | Wafer carrying device |
US5468112A (en) * | 1992-10-05 | 1995-11-21 | Tokyo Electron Limited | Wafer container and wafer aligning apparatus |
US5478195A (en) * | 1991-12-20 | 1995-12-26 | Hitachi, Ltd. | Process and apparatus for transferring an object and for processing semiconductor wafers |
US5964564A (en) * | 1996-07-15 | 1999-10-12 | B-W Controls, Inc. | Method and apparatus for detecting cross-slotted objects |
-
1990
- 1990-10-18 JP JP27981290A patent/JPH04154144A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5478195A (en) * | 1991-12-20 | 1995-12-26 | Hitachi, Ltd. | Process and apparatus for transferring an object and for processing semiconductor wafers |
US5468112A (en) * | 1992-10-05 | 1995-11-21 | Tokyo Electron Limited | Wafer container and wafer aligning apparatus |
JPH0722492A (en) * | 1993-06-29 | 1995-01-24 | Fujikoshi Mach Corp | Wafer carrying device |
JP2617867B2 (en) * | 1993-06-29 | 1997-06-04 | 不二越機械工業株式会社 | Wafer loading / unloading device |
US5964564A (en) * | 1996-07-15 | 1999-10-12 | B-W Controls, Inc. | Method and apparatus for detecting cross-slotted objects |
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