JPS62103944A - 静電偏向板 - Google Patents

静電偏向板

Info

Publication number
JPS62103944A
JPS62103944A JP61219906A JP21990686A JPS62103944A JP S62103944 A JPS62103944 A JP S62103944A JP 61219906 A JP61219906 A JP 61219906A JP 21990686 A JP21990686 A JP 21990686A JP S62103944 A JPS62103944 A JP S62103944A
Authority
JP
Japan
Prior art keywords
deflection
conductive
electrostatic deflection
deflection plate
conductive region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61219906A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0577140B2 (enExample
Inventor
ダグラス・グラハム・カラム
ジヨージ・ジヨセフ・ギユフレ
チモシー・ロビンソン・グローヴス
ヴエルナー・ステイツケル
マリス・アンドリス・スチユーランス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS62103944A publication Critical patent/JPS62103944A/ja
Publication of JPH0577140B2 publication Critical patent/JPH0577140B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1477—Scanning means electrostatic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/07—Ink jet characterised by jet control
    • B41J2/075—Ink jet characterised by jet control for many-valued deflection
    • B41J2/08—Ink jet characterised by jet control for many-valued deflection charge-control type
    • B41J2/085—Charge means, e.g. electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements common to two or more basic types of discharge tubes or lamps
    • H01J3/26—Arrangements for deflecting ray or beam
    • H01J3/28—Arrangements for deflecting ray or beam along one straight line or along two perpendicular straight lines
    • H01J3/30—Arrangements for deflecting ray or beam along one straight line or along two perpendicular straight lines by electric fields only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
JP61219906A 1985-10-30 1986-09-19 静電偏向板 Granted JPS62103944A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/793,046 US4737644A (en) 1985-10-30 1985-10-30 Conductive coated semiconductor electrostatic deflection plates
US793046 1991-11-15

Publications (2)

Publication Number Publication Date
JPS62103944A true JPS62103944A (ja) 1987-05-14
JPH0577140B2 JPH0577140B2 (enExample) 1993-10-26

Family

ID=25158931

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61219906A Granted JPS62103944A (ja) 1985-10-30 1986-09-19 静電偏向板

Country Status (5)

Country Link
US (1) US4737644A (enExample)
EP (1) EP0229873B1 (enExample)
JP (1) JPS62103944A (enExample)
CA (1) CA1270895A (enExample)
DE (1) DE3662827D1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006108119A (ja) * 2000-12-01 2006-04-20 Toshiba Corp 電子ビーム照射装置
JP2009117393A (ja) * 2003-06-13 2009-05-28 Axcelis Technologies Inc イオン注入システムのための磁気／静電式ハイブリッド偏向器およびイオンビームの偏向方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0585854B1 (en) * 1992-08-31 1998-11-11 Canon Kabushiki Kaisha Ink jet head manufacturing method using ion machining and ink jet head manufactured thereby
US5363124A (en) * 1993-01-26 1994-11-08 Videojet Systems International, Inc. Printhead for ink jet printers
JP2001189265A (ja) * 2000-01-05 2001-07-10 Advantest Corp マスク、半導体素子製造方法、電子ビーム露光装置、荷電ビーム処理装置において用いられる部材
US6953938B2 (en) * 2002-10-03 2005-10-11 Canon Kabushiki Kaisha Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus
JP4956993B2 (ja) * 2005-12-26 2012-06-20 富士ゼロックス株式会社 記録媒体検知システム

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB929909A (en) * 1961-05-24 1963-06-26 Mi O Valve Co Ltd Improvements in or relating to cathode ray tubes
GB1039263A (en) * 1962-12-12 1966-08-17 M O Valve Co Ltd Improvements in or relating to cathode ray tubes
US4047184A (en) * 1976-01-28 1977-09-06 International Business Machines Corporation Charge electrode array and combination for ink jet printing and method of manufacture
FR2360993A1 (fr) * 1976-08-03 1978-03-03 Lignes Telegraph Telephon Perfectionnement aux procedes de fabrication de diodes schottky a barriere or-silicium
US4309460A (en) * 1977-11-11 1982-01-05 Bell Telephone Laboratories, Incorporated Process for producing gold films
JPS6013078B2 (ja) * 1978-09-05 1985-04-04 日本特殊陶業株式会社 金メツキされた電子部品及びその製法
JPS5550560A (en) * 1978-10-09 1980-04-12 Iwatsu Electric Co Ltd Operating method of scanning conversion storage tube
US4338612A (en) * 1979-10-11 1982-07-06 Ricoh Co., Ltd. Multiple deflection plate device for liquid jet printer or the like
US4310569A (en) * 1980-03-10 1982-01-12 Trw Inc. Method of adhesion of passivation layer to gold metalization regions in a semiconductor device
DD158726A3 (de) * 1980-07-01 1983-02-02 Georg Kuschel Elektrostatisches ablenksystem
DE3035240A1 (de) * 1980-09-18 1982-04-29 Philips Patentverwaltung Gmbh, 2000 Hamburg Rotierende blende fuer ein pyroelektrisches vidikon
US4494004A (en) * 1980-11-28 1985-01-15 International Business Machines Corporation Electron beam system
JPS59207545A (ja) * 1983-05-12 1984-11-24 Sony Corp 撮像管
US4661709A (en) * 1985-06-28 1987-04-28 Control Data Corporation Modular all-electrostatic electron-optical column and assembly of said columns into an array and method of manufacture

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006108119A (ja) * 2000-12-01 2006-04-20 Toshiba Corp 電子ビーム照射装置
JP2009117393A (ja) * 2003-06-13 2009-05-28 Axcelis Technologies Inc イオン注入システムのための磁気／静電式ハイブリッド偏向器およびイオンビームの偏向方法

Also Published As

Publication number Publication date
EP0229873B1 (en) 1989-04-12
EP0229873A1 (en) 1987-07-29
CA1270895A (en) 1990-06-26
US4737644A (en) 1988-04-12
JPH0577140B2 (enExample) 1993-10-26
DE3662827D1 (en) 1989-05-18

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