JPS6199673A - スパツタ装置 - Google Patents

スパツタ装置

Info

Publication number
JPS6199673A
JPS6199673A JP21577984A JP21577984A JPS6199673A JP S6199673 A JPS6199673 A JP S6199673A JP 21577984 A JP21577984 A JP 21577984A JP 21577984 A JP21577984 A JP 21577984A JP S6199673 A JPS6199673 A JP S6199673A
Authority
JP
Japan
Prior art keywords
target
magnet
sputtering
film thickness
thickness distribution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21577984A
Other languages
English (en)
Japanese (ja)
Other versions
JPS642189B2 (enrdf_load_stackoverflow
Inventor
Shozo Satoyama
里山　正蔵
Reiji Nishikawa
西川　羚二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Tokuda Seisakusho Co Ltd
Original Assignee
Toshiba Corp
Tokuda Seisakusho Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokuda Seisakusho Co Ltd filed Critical Toshiba Corp
Priority to JP21577984A priority Critical patent/JPS6199673A/ja
Publication of JPS6199673A publication Critical patent/JPS6199673A/ja
Publication of JPS642189B2 publication Critical patent/JPS642189B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP21577984A 1984-10-15 1984-10-15 スパツタ装置 Granted JPS6199673A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21577984A JPS6199673A (ja) 1984-10-15 1984-10-15 スパツタ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21577984A JPS6199673A (ja) 1984-10-15 1984-10-15 スパツタ装置

Publications (2)

Publication Number Publication Date
JPS6199673A true JPS6199673A (ja) 1986-05-17
JPS642189B2 JPS642189B2 (enrdf_load_stackoverflow) 1989-01-13

Family

ID=16678088

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21577984A Granted JPS6199673A (ja) 1984-10-15 1984-10-15 スパツタ装置

Country Status (1)

Country Link
JP (1) JPS6199673A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63282263A (ja) * 1987-05-13 1988-11-18 Fuji Electric Co Ltd マグネトロンスパッタリング装置
WO1990013137A1 (en) * 1989-04-27 1990-11-01 Ionic Coatings Limited Sputtering apparatus
JP2001240964A (ja) * 1999-10-22 2001-09-04 Applied Materials Inc ２つの回転直径を有するスパッタマグネトロン

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5956580A (ja) * 1982-09-27 1984-04-02 Fujitsu Ltd スパツタリング方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5956580A (ja) * 1982-09-27 1984-04-02 Fujitsu Ltd スパツタリング方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63282263A (ja) * 1987-05-13 1988-11-18 Fuji Electric Co Ltd マグネトロンスパッタリング装置
WO1990013137A1 (en) * 1989-04-27 1990-11-01 Ionic Coatings Limited Sputtering apparatus
JP2001240964A (ja) * 1999-10-22 2001-09-04 Applied Materials Inc ２つの回転直径を有するスパッタマグネトロン

Also Published As

Publication number Publication date
JPS642189B2 (enrdf_load_stackoverflow) 1989-01-13

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