JPS6198518A - Manufacture of mold - Google Patents

Manufacture of mold

Info

Publication number
JPS6198518A
JPS6198518A JP21995484A JP21995484A JPS6198518A JP S6198518 A JPS6198518 A JP S6198518A JP 21995484 A JP21995484 A JP 21995484A JP 21995484 A JP21995484 A JP 21995484A JP S6198518 A JPS6198518 A JP S6198518A
Authority
JP
Japan
Prior art keywords
substrate
substance
mold
gradient
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21995484A
Other languages
Japanese (ja)
Other versions
JPH0694137B2 (en
Inventor
Masayuki Tatewaki
館脇 政行
Osamu Futajima
二島 修
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP59219954A priority Critical patent/JPH0694137B2/en
Publication of JPS6198518A publication Critical patent/JPS6198518A/en
Publication of JPH0694137B2 publication Critical patent/JPH0694137B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To enable a mold to have a gradient of up to 1 deg., by providing a step on a substrate that will determine the gradient, applying a fluidible substance thereon that will be required to determine the gradient, and heat-treating them. CONSTITUTION:A step layer 2 of SiO2 or the like having a thickness corresponding to the required gradient is formed in place on a substrate 1 of silicon or the like. A substance 3 that can be fluidized by heat treatment is applied on the substrate 1 including the step layer 2 in an amount so that the substance 3 has a thickness (z). When they are heat-treated in an oven having a temperature of 1,100 deg.C, the substance 3 is softened and the part thereof that is located on the step layer 2 flows downward, resulting in a gentle slope 5 on the substrate 1. Finally, a film 4 of a metal such as copper, gold, or rhodium is applied on the substance 3 for example by vacuum deposition so as to improve the releasability of a molded item from the thus produced mold.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は光学素子の中で、特にプ2ステック成型による
マイクロレンズを作造する際の成型用金型あ製造方法に
関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for manufacturing a mold for producing an optical element, particularly a microlens by plastic stick molding.

〔従来の技術〕[Conventional technology]

プラスチックを材料としたマイクロレンズを製造する際
に使用する成型用金型の製造方法とし【は、様々なもの
が提案されており、その一つは機械加工によるものであ
り、他の一つは半導体プロセスかSJI 11−t−A
嘴炊で本A−このうち前者としてダイヤモンド針等で金
型となる金属板の表面を罫書いて作る方法がある。又後
者の第1の方法としてシリコン基板上に形成した5ho
z膜を階段状にエツチングし1その段部に樹脂を被せる
ことにより曲面を作る方法があり、後者の第2の方法と
して、テーパー・エッチ法によるものがある。この第2
の方法は同じくシリコン基板上のRhO2膜をエツチン
グ母材とし、その上に更にRhO2よりエツチング速度
が速い物質であるリンシリケートガラス(PSG)を被
着形成した状態でエツチングを行ない、テーパーを形成
する方法である。
Various methods have been proposed for manufacturing molds used to manufacture microlenses made of plastic, one of which is machining, and the other is Semiconductor process or SJI 11-t-A
Book A - Among these, the former method is to make lines by marking the surface of the metal plate that will become the mold with a diamond needle or the like. In addition, as the first method of the latter, 5ho formed on a silicon substrate
There is a method of creating a curved surface by etching the Z film in a stepwise manner and then covering the stepped portion with a resin.A second method of the latter is a method using a taper etching method. This second
In the same method, a RhO2 film on a silicon substrate is used as the etching base material, and phosphosilicate glass (PSG), which is a material with a faster etching rate than RhO2, is deposited on top of the RhO2 film, and then etching is performed to form a taper. It's a method.

〔発明゛が解決しようとする問題点〕[Problem that the invention attempts to solve]

以上述べた従来の方法には、様々な問題点がある。 The conventional methods described above have various problems.

先ず、機械加工による方法は、均削バイトの作製に手間
がかかることや、金型作製中に機械加工ムラ、いわゆる
送りピッチ・ムラが発生する欠点があること、加えて、
微細化に対して加工上に制約がある等問題が多い。
First, the machining method has the drawbacks that it takes time to prepare the grinding tool, and that machining irregularities, so-called feed pitch irregularities, occur during mold manufacturing.
There are many problems such as restrictions on processing for miniaturization.

後者の第1の方法である5AO2膜を階段状にエツチン
グして、樹脂膜を被せることにより製造する方法(例え
ば特願昭53−18.698号)は、樹脂で階段の角を
完全に被う必要があるため、粘度の高い樹脂が必要であ
る。しかし、粘度の高い樹脂は非常に取扱いにくいとい
う問題点がある。
The first method of the latter, in which the 5AO2 film is etched in a stepwise manner and then covered with a resin film (for example, Japanese Patent Application No. 18.698/1982), involves completely covering the corners of the steps with resin. Therefore, a resin with high viscosity is required. However, there is a problem in that resins with high viscosity are extremely difficult to handle.

後者の第2の方法である°テーパー・エッチ法は、エツ
チングが1回で済み、工程が短いという長所を有するが
、エツチング母材(例えば5=Q2)の上に被着形成す
る層の選定に際し【、エツチング母材と同じエッチャン
トでエツチングでき、かつ母材よりエツチング速度が速
いものでなければならないという条件がつく。このこと
により、エツチング母材上に被着形成する層としての材
料が大幅に限定されるだけでなく、母材に対して最高約
10倍しかエツチング比がとれない等の問題がある。
The second latter method, the taper etching method, has the advantage of requiring only one etching process and a short process, but it is difficult to select the layer to be deposited on the etching base material (for example, 5=Q2). In this case, the conditions are that it must be able to be etched with the same etchant as the base material and that the etching speed must be faster than that of the base material. This not only greatly limits the materials that can be used as a layer to be deposited on the etching base material, but also poses problems such as the etching ratio being only about 10 times the base material at most.

i    又、レンズを構成するプラスチックの一面を
水平面即ち基準面としたとき、他面は基準面に対して角
θをもつ【傾斜しているものであるが、上述した従来の
各方法では、この傾き即ち角0を1°以下にできないと
い5問題点がある。
i Also, when one side of the plastic that makes up the lens is taken as a horizontal plane, that is, a reference plane, the other side has an angle θ with respect to the reference plane [although it is inclined, in each of the conventional methods described above, There are five problems in that the inclination, that is, the angle 0, cannot be made less than 1 degree.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、基板上に傾斜の傾きを決定する段差をつけ、
その上に傾きを決定するに必要な量で、熱処理により流
動可能な物質を形赦し、この物質を熱処理することによ
り流動させ、傾斜を形成するものである。
The present invention provides steps that determine the inclination of the substrate,
A flowable material is further modified by heat treatment in an amount necessary to determine the slope, and the material is made to flow by heat treatment to form the slope.

〔作用〕[Effect]

本発明は、従来のいわゆるす70つ技術を応用したもの
であり、従って、基板上に形成する段差により、自由に
傾きが決定できる。さらに、傾き角の小さい成製用金製
を作ることができ、従来では不可能であった、頷き即ち
θが1°以下の成型用金型も製造可能となった。
The present invention is an application of the conventional so-called "S70 technology", and therefore, the inclination can be freely determined by the step formed on the substrate. Furthermore, it is now possible to manufacture a molding mold with a small inclination angle, and it has become possible to manufacture a molding mold with a nod, that is, θ of 1° or less, which was previously impossible.

〔実施例〕〔Example〕

以下、本発明による方法を、第2図に示す様な傾き即ち
0が0.86°の傾斜面を形成する方法について述べる
Hereinafter, the method according to the present invention will be described with reference to a method for forming an inclined surface having an inclination of 0.86° as shown in FIG.

先ず、第3図に示す様に、シリコン等よりなる基板(1
)上の所定の位置に、傾きの高さに相当する厚味5(5
=3Qμ風)を有する5=Oz等よりなる段層(2)を
形成する。この場合、段層(2)の横幅yを、12μ篤
に選び得る。
First, as shown in Fig. 3, a substrate (1
), the thickness 5 (5
A step layer (2) of 5=Oz, etc. having a wind of 3Qμ is formed. In this case, the width y of the step layer (2) can be selected to be 12μ.

次に第4図に示すように、段層(2)上を含んで基板(
1)上に、熱処理により流動可能な物質(3)を1、厚
味2に亘って被着形成する。この熱処理流動可能物質(
3)としてはリンシリケートガラス(PSG)を使用す
ることができ、とのPSGを使用する場合、上述した厚
味2は例えば20000Xに選ぶことができる。
Next, as shown in FIG. 4, the substrate (including the top of the step layer (2)
1) A substance (3) which can be flowed by heat treatment is deposited on the substrate to a thickness of 1 and 2. This heat-treated flowable material (
As for 3), phosphosilicate glass (PSG) can be used, and when PSG is used, the above-mentioned thickness 2 can be selected to be, for example, 20000X.

次にかかる熱処理流動可能物質(3)を被着した基板(
IJを1100℃の炉中で熱処理すると、物質(3)、
この場合PSGが軟化してその一部分が、段層(2)に
より形成された段差の低い方へ流れ出し、結局第5図に
示すよ゛うに全体としてなだらかな傾斜面(5)を得る
ことができる。これが目的とする角θを有する傾斜面で
ある。
Next, a substrate (
When IJ is heat treated in a furnace at 1100°C, substance (3),
In this case, the PSG softens and a part of it flows out to the lower part of the step formed by the step layer (2), and as a result, a gently sloped surface (5) can be obtained as a whole as shown in Fig. 5. . This is the inclined surface having the desired angle θ.

最後に第1図に示す様に、物質(3)上に、例えば真空
蒸着法により銅、金、又はロジュクムのよ5な金属膜(
4)を被着し、金型と成形品(グラスチックレンズ)と
の離型性を向上させる。
Finally, as shown in Figure 1, a metal film such as copper, gold, or rhojucum is deposited on the substance (3) by vacuum evaporation, for example.
4) to improve the releasability between the mold and the molded product (glass lens).

この方法により、第2図で示すように、平坦部でない部
分、即ち傾斜部の長さが20μ簿、そして−10,3 段差が0.3μ簿となるから、傾きは一一=0.86゜
となる。
By this method, as shown in Figure 2, the length of the non-flat part, that is, the sloped part, is 20 μm, and the difference in level is 0.3 μm, so the slope is 11 = 0.86. It becomes ゜.

勿論、段層(2)の高さ即ち厚味X、及び第4図に示す
工程における物質(2)の厚味2を適宜に選定すること
により、傾斜即ち角θを任意に選ぶことができること明
らかである。又、熱処理流動可能物質(3)としてはレ
ジンを使用することもできる。
Of course, by appropriately selecting the height or thickness X of the step layer (2) and the thickness 2 of the material (2) in the process shown in FIG. 4, the slope or angle θ can be arbitrarily selected. it is obvious. Further, a resin can also be used as the heat-treated flowable material (3).

〔発明の効果〕 本発明の最も大きな効果は、傾斜の傾き即ちθを1以下
にすることができることにある。しかも、その傾きは、
段層(2)の高さと物質(3)の膜厚とを変更させるこ
とにより、自由に変えることができる。
[Effects of the Invention] The greatest effect of the present invention is that the slope of the slope, that is, θ, can be made less than or equal to 1. Moreover, the slope is
It can be freely changed by changing the height of the stepped layer (2) and the thickness of the material (3).

さらに、従来技術と比ベニ程的にも簡単なものとなる特
徴を有する。
Furthermore, it has the feature of being much simpler than the prior art.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の方法によって製造された金型の断面図
、第2図は金型の寸法の一例を示す説明図、第3図〜第
5図は本発明による金型の製造法の一実施例を示す工程
図である。 (1)は基板、(2)は段層、(3)は熱処理流動可能
物質、(4)は金属膜である。 第2図 第5図 昭和60年 ダ月I日 特許庁長官  宇 賀 道 部   殿昭和59年 特
 許 願 第219954号3、補正をする者 事件との関係   特許出願人 住 所 東京部品用区北品用6丁目7@35号名称(2
18)ソニー株式会社 代表取締役 大 賀 典 雄 4、代理人 住 所 東京都新宿区西新宿1丁目8番1号置 03−
343−5821ft5  (新宿ビル)6、補正によ
り増加する発明の数 7、補正の対象    明細書の発明の詳細な説明の欄
、図面の簡単な説明の欄及び図面。 明細書中、第5頁1行r30#mJをro、3.umJ
と訂正する。 @ 同、第5頁末行〜第6頁1行「被着し、金型と・・
・向上させる。」とあるを次のように訂正する。 「被着する。プラスチックレン女を形成する場合は、こ
の金属膜(4)を電極として電気メッキを行ない、この
電気メツキ層が一定の厚味となったところで、これを金
属膜(4)より剥離して成型金型とする。 こ−でメッキを行って金型を得る理由は、プラスチック
成形を行う際に使用する金型は消耗品となるため、第1
図に示す構成品を原板とし、これをもとにして複数枚の
金型を得るようにしたものである。尚、金属膜(4)よ
り上記した電気メツキ層を剥離する工程は、ごく一般に
知られた技術をそのま\流用することができる。」、同
、第6頁10行「こともできる、」の次に改行して以下
のように加入する。 「尚、上述したように、第1図に示す構成品を原板とし
、その金属膜(4)上に更に電気メッキ屡を形成してこ
れが一定の厚味に達した後、この電気メツキ層を金属l
l1l(41より剥離させ、これを金型として使用する
場合も考えられる。しかし乍らこのようにして金属11
1(41より電気メツキ層を剥離させるとき、基材であ
るシリコン等よりなる基板(11が破損するおそれがあ
る。 これを回避するには、第6図に示すように、平坦な表面
(6)を有する台座(7)を設け、この表面(6)上に
接着剤(8)を介して第1図に示す原板を載置し、オー
プン等に入れて加熱し、接着剤(8)を硬化させること
により、上記した原板を台座(7)上に固定させるとよ
い、これによりいわゆる原板全体の厚味が大となり、基
板(1)を補強し、上述した電気メッキの金属膜(4)
よりの剥離に際してこれが破損するのを回避できる。J (4)同、第7頁2行「工程図である。」を「工程図、
第6図は、第1図に示す金型を更に補強した状態を示す
断面図である。」と訂正する。 (51vlJ面第面図6図紙のとおり補充する。 以上
Fig. 1 is a cross-sectional view of a mold manufactured by the method of the present invention, Fig. 2 is an explanatory diagram showing an example of the dimensions of the mold, and Figs. It is a process diagram showing one example. (1) is a substrate, (2) is a stepped layer, (3) is a heat-treated flowable material, and (4) is a metal film. Figure 2 Figure 5 Date of 1985 Mr. Uga Michibu, Commissioner of the Patent Office, Patent Application No. 219954 3, Relationship with the case of the person making the amendment Patent Applicant's Address: Tokyo Parts-Yo-ku Kita Item name 6-7 @35 name (2
18) Sony Corporation Representative Director Norio Ohga 4, Agent Address: 1-8-1 Nishi-Shinjuku, Shinjuku-ku, Tokyo 03-
343-5821ft5 (Shinjuku Building) 6, Number of inventions increased by amendment 7, Subject of amendment Column for detailed explanation of the invention in the specification, column for brief explanation of drawings, and drawings. In the specification, page 5, line 1 r30#mJ is ro, 3. umJ
I am corrected. @ Same, bottom line of page 5 to line 1 of page 6 “The deposit is applied to the mold...
·Improve. '' should be corrected as follows. When forming a plastic layer, electroplating is performed using this metal film (4) as an electrode, and when this electroplated layer has a certain thickness, it is removed from the metal film (4). It is peeled off and used as a molding mold.The reason why the mold is obtained by plating is that the mold used for plastic molding is a consumable item.
The component shown in the figure is used as a master plate, and a plurality of molds are made from this base plate. Incidentally, for the step of peeling off the electroplated layer described above from the metal film (4), a generally known technique can be used as is. '', page 6, line 10, ``It can also be done,'' followed by a new line and the following addition. ``As mentioned above, using the component shown in Figure 1 as an original plate, electroplating is further formed on the metal film (4) until it reaches a certain thickness, and then this electroplating layer is applied. metal l
It is also possible to peel off the metal 11 (41) and use it as a mold.
When peeling off the electroplated layer from 1 (41), there is a risk that the base material (11) made of silicon or the like may be damaged. To avoid this, as shown in FIG. ) is provided, and the original plate shown in Fig. 1 is placed on this surface (6) via an adhesive (8), placed in an open space, etc., heated, and the adhesive (8) is applied. It is preferable to fix the above-mentioned original plate on the pedestal (7) by curing it. This increases the thickness of the entire original plate, reinforces the substrate (1), and forms the electroplated metal film (4) as described above.
It is possible to avoid damage to this when peeling off the strands. J (4) Same, page 7, line 2, “It is a process drawing.”
FIG. 6 is a sectional view showing the mold shown in FIG. 1 in a further reinforced state. ” he corrected. (Replenish as shown in Figure 6 of page 51vlJ.

Claims (1)

【特許請求の範囲】[Claims] 基板上に段状の層を形成する工程と、熱処理により流動
可能な物質を前記基板と前記段状の層上に形成する工程
と、前記熱処理により流動可能な物質を熱処理すること
により流動させ基板上に曲面を形成する工程を有するこ
とを特徴とする成型用金型の製造法。
a step of forming a stepped layer on a substrate; a step of forming a material that can flow by heat treatment on the substrate and the step layer; A method for manufacturing a molding die, comprising the step of forming a curved surface on the top.
JP59219954A 1984-10-19 1984-10-19 Manufacturing method of original plate for optical element molding Expired - Fee Related JPH0694137B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59219954A JPH0694137B2 (en) 1984-10-19 1984-10-19 Manufacturing method of original plate for optical element molding

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59219954A JPH0694137B2 (en) 1984-10-19 1984-10-19 Manufacturing method of original plate for optical element molding

Publications (2)

Publication Number Publication Date
JPS6198518A true JPS6198518A (en) 1986-05-16
JPH0694137B2 JPH0694137B2 (en) 1994-11-24

Family

ID=16743639

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59219954A Expired - Fee Related JPH0694137B2 (en) 1984-10-19 1984-10-19 Manufacturing method of original plate for optical element molding

Country Status (1)

Country Link
JP (1) JPH0694137B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5439621A (en) * 1993-04-12 1995-08-08 Minnesota Mining And Manufacturing Company Method of making an array of variable focal length microlenses

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5628813A (en) * 1979-08-17 1981-03-23 Toppan Printing Co Ltd Embossing plate and manufacturing thereof

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5628813A (en) * 1979-08-17 1981-03-23 Toppan Printing Co Ltd Embossing plate and manufacturing thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5439621A (en) * 1993-04-12 1995-08-08 Minnesota Mining And Manufacturing Company Method of making an array of variable focal length microlenses

Also Published As

Publication number Publication date
JPH0694137B2 (en) 1994-11-24

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