JPS6197832U - - Google Patents
Info
- Publication number
- JPS6197832U JPS6197832U JP18233484U JP18233484U JPS6197832U JP S6197832 U JPS6197832 U JP S6197832U JP 18233484 U JP18233484 U JP 18233484U JP 18233484 U JP18233484 U JP 18233484U JP S6197832 U JPS6197832 U JP S6197832U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- wafer holder
- core tube
- suspension member
- longitudinal dimension
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 235000012431 wafers Nutrition 0.000 claims 8
- 239000000725 suspension Substances 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000007796 conventional method Methods 0.000 description 1
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
第１図ａ，ｂ，ｃはこの考案の一実施例を示す
縦断面図。第２図及び第３図はそれぞれこの考案
の他の実施例を示す縦断面図。第４図ａ，ｂ，ｃ
は従来の技術を示す縦断面図。
２：炉芯管、２ａ：開口、３：ヒータ、４：腕
、５：連結棒、７：ボート、８：ウエハ、９，９
−１：保護管、９ａ：開口、Ａ，Ｂ，Ｂ−１：蓋
。
FIGS. 1a, b, and c are longitudinal cross-sectional views showing an embodiment of this invention. FIGS. 2 and 3 are longitudinal sectional views showing other embodiments of this invention, respectively. Figure 4 a, b, c
is a vertical cross-sectional view showing a conventional technique. 2: Furnace core tube, 2a: Opening, 3: Heater, 4: Arm, 5: Connecting rod, 7: Boat, 8: Wafer, 9,9
-1: Protection tube, 9a: Opening, A, B, B-1: Lid.
Claims (1)
材に、ウエハが装填されるウエハ保持具を取付け
て、ウエハを炉芯管内に搬入するようにした縦型
ウエハ熱処理装置において、炉芯管の内径より小
なる外径とウエハ保持具の外径より大なる内径と
ウエハ保持具の長手寸法より大なる長手寸法とを
有しかつ下面が開口する底付筒体を、ウエハ保持
具を包囲するように懸垂部材に装着したことを特
徴とする縦型ウエハ熱処理装置。 In a vertical wafer heat treatment apparatus, a wafer holder for loading wafers is attached to a vertically movable suspension member placed above the furnace core tube, and the wafer is carried into the furnace core tube. A bottomed cylindrical body having an outer diameter smaller than the inner diameter, an inner diameter larger than the outer diameter of the wafer holder, and a longitudinal dimension larger than the longitudinal dimension of the wafer holder and having an open bottom surface surrounds the wafer holder. A vertical wafer heat processing apparatus characterized in that it is mounted on a suspension member as shown in FIG.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18233484U JPS6197832U (en) | 1984-12-03 | 1984-12-03 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18233484U JPS6197832U (en) | 1984-12-03 | 1984-12-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6197832U true JPS6197832U (en) | 1986-06-23 |
Family
ID=30739871
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18233484U Pending JPS6197832U (en) | 1984-12-03 | 1984-12-03 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6197832U (en) |
-
1984
- 1984-12-03 JP JP18233484U patent/JPS6197832U/ja active Pending