JPS6188549A - Semiconductor integrated circuit with detecting circuit for life of battery - Google Patents
Semiconductor integrated circuit with detecting circuit for life of batteryInfo
- Publication number
- JPS6188549A JPS6188549A JP59209471A JP20947184A JPS6188549A JP S6188549 A JPS6188549 A JP S6188549A JP 59209471 A JP59209471 A JP 59209471A JP 20947184 A JP20947184 A JP 20947184A JP S6188549 A JPS6188549 A JP S6188549A
- Authority
- JP
- Japan
- Prior art keywords
- resistor
- mos
- resistance
- temperature
- detecting circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electromechanical Clocks (AREA)
- Measurement Of Current Or Voltage (AREA)
- Tests Of Electric Status Of Batteries (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
〔Lψ、4上の利用分野〕
本発明は、電池寿命検出回路(以下BIJu路と略す)
を内蔵する半導体集積回路(以下ICと略す)K関し、
特にBD回路の温度特性の改善に関するものである。[Detailed description of the invention] [Field of application on Lψ, 4] The present invention is a battery life detection circuit (hereinafter abbreviated as BIJu path).
Regarding semiconductor integrated circuit (hereinafter abbreviated as IC) K with built-in
In particular, it relates to improving the temperature characteristics of the BD circuit.
電子時計用ICなどに内蔵されるBD回路においては、
〜103抵抗と′4圧依存性のない抵抗との直列接続を
用いて、電池電圧の低下を検出する方式のものが公知で
ある。かかるBD回路の一例を第2図に示す。82図に
おいて、11は電圧依存性のない抵抗、12は1lil
U S抵抗、16はpチャネルへ1すSトランジスタ
、および14はnチャネルM OS トランジスタであ
る。16と14はコンプリメンタリ−M (J S 構
成であり、入力レベルがある境界値よりHighである
とき、センス信号出力はLowとなり、入力レベルが該
境界値よりLO〜Vであるとき、センス信号出力はHi
ghとなる。In the BD circuit built into electronic clock IC, etc.
A system is known in which a decrease in battery voltage is detected using a series connection of a ~103 resistor and a '4 voltage-independent resistor. An example of such a BD circuit is shown in FIG. In Figure 82, 11 is a resistor with no voltage dependence, and 12 is 1 lil.
US resistor, 16 is a p-channel to 1S transistor, and 14 is an n-channel MOS transistor. 16 and 14 are complementary M (JS configurations, when the input level is higher than a certain boundary value, the sense signal output is Low, and when the input level is LO to V from the boundary value, the sense signal output is is Hi
It becomes gh.
〜10S抵抗σ−へ抵抗値は電圧が低い程高くなるから
、第2図において、電池電圧が正常なるとき、11と1
2による分圧が、16と14の入力として、前記境界値
よりわずかしτLu〜Vであると判別されるように、1
1と12の抵抗値を設定しておけば、電池電圧が低下し
てきたときに、16と14のセンス出力信号を反転させ
ることができる。これが第2図のBD回路における電池
寿痛検出の動作原理である。~10S resistance σ- Since the resistance value increases as the voltage decreases, in Figure 2, when the battery voltage is normal, 11 and 1
1 so that the partial pressure due to 2 is determined as the input of 16 and 14 to be slightly τLu~V than the boundary value.
By setting the resistance values of 1 and 12, the sense output signals of 16 and 14 can be inverted when the battery voltage decreases. This is the operating principle of battery life detection in the BD circuit shown in FIG.
11と12を電流が流れるのは、サンプリング信号とし
てl−1−1iが入力さ几ている時間だけであるが、1
1と12の抵抗値が低いと、かかる電流が大きくなるた
め、BD回路で消費される電力が太き(なってしまう。Current flows through 11 and 12 only when l-1-1i is input as a sampling signal, but 1
If the resistance values of 1 and 12 are low, the current will be large, and the power consumed by the BD circuit will be large.
そこで通常は、11と12の抵抗は数100にΩ程度に
設定されろことが多い。実用的に許容できる大きさの範
囲でかがる抵抗を実現しようとすれば、11の抵抗のシ
ート抵抗は1〜2に077口以上にせざるを得ない。そ
のため従来は、11の抵抗をPウェル抵抗やポリシリコ
ン抵抗で実現してし・た。Therefore, the resistances 11 and 12 are usually set to several hundreds of ohms. In order to realize a resistance that bends within a practically allowable range, the sheet resistance of the resistor 11 must be 077 or more for 1 to 2. Therefore, in the past, the 11 resistors were realized with P-well resistors or polysilicon resistors.
しかしながら、−20〜+80℃のいわゆる常用温度に
おいて、M (J S抵抗の温度係数が02〜03%/
’degであるのに対し、Pウェル抵抗は約07%/(
legであり、ポリシリコン抵抗は−6〜−01%/d
egであるので、これらで1.′4成したBD回路は、
混池寿品検出i1j圧が温度によって変化してしまうと
し・5問題があった。However, at the so-called normal temperature of -20 to +80℃, the temperature coefficient of M (JS resistance is 02 to 03%/
'deg, whereas the P-well resistance is about 07%/(
leg, and the polysilicon resistance is -6 to -01%/d
eg, so these are 1. '4 The completed BD circuit is
There were five problems when the mixed pond longevity product detection i1j pressure changed depending on the temperature.
そこで本発明の目的は、温度依存性のない131)回路
を提供することである。Therefore, an object of the present invention is to provide a 131) circuit without temperature dependence.
本発明の第1の特徴は、第21y、lにおける11の抵
抗として、MO3抵抗とほぼ等しく・温度係数を有する
拡散抵抗を用いることである。11と12の温度係数が
等しければ、BD回路σ)温度依存性がなくなることは
明白である。11の抵抗として拡散抵抗を用℃・る理由
は、ICの構成要素のなかで、02〜03%/degな
ろ温度係数を実現することが、最も容易であるからであ
る。The first feature of the present invention is that a diffused resistor having a temperature coefficient approximately equal to that of the MO3 resistor is used as the 11 resistors in the 21 y and 21 l. It is clear that if the temperature coefficients of 11 and 12 are equal, the BD circuit σ) has no temperature dependence. The reason why a diffused resistor is used as the resistor 11 is that among the IC components, it is easiest to realize a temperature coefficient of 02 to 03%/deg.
本発明の紀2の特徴は、かかる拡散抵抗の表面不純物濃
度をlXl018c+n〜3以上とすることである。そ
の理由は以下の通りである。The second feature of the present invention is that the surface impurity concentration of the diffused resistor is set to 1Xl018c+n~3 or more. The reason is as follows.
常用温度においては、ドナーやアクセプタは完全電離し
ており、キャリアのl41隻変化はな−・。したがって
、拡散抵抗の濃度変化は移動度の温度変化である。移q
h度は、結晶欠陥などの条件を同じとすれば、電離した
ドナーやアクセプタの餉、界によるキャリアの散乱と、
格子振動によるキャリアの散乱とで決まる。このうち格
子振動による散乱断面積は、格子振動の大ぎさにそのま
ま依存するから、温度依存性が極めて大きい。これに対
し、不純物による電界は非常に広範囲に及ぶから、散乱
断面積が非常に大きく、格子振動による散乱断面積の増
加分は無視できる。つまり不純物によるキャリアの散乱
は、はとんど温度に依存しない。At normal temperatures, the donor and acceptor are completely ionized, and there is no change in the number of carriers. Therefore, a concentration change in diffused resistance is a temperature change in mobility. Move
If the conditions such as crystal defects are the same, the h degree is determined by the scattering of carriers by the ions of ionized donors and acceptors, and by the field.
It is determined by carrier scattering due to lattice vibration. Among these, the scattering cross section due to lattice vibration directly depends on the magnitude of the lattice vibration, and therefore has extremely high temperature dependence. On the other hand, since the electric field caused by impurities spreads over a very wide range, the scattering cross section is very large, and the increase in the scattering cross section due to lattice vibration can be ignored. In other words, carrier scattering due to impurities does not depend on temperature.
したがって、拡散抵抗の不純物濃度が高(・程、移動間
の温度変化は小さい。I X 10′8の−3の不純物
濃度において、移動度の温度係数は約−0,5%/ d
egである。したがって、かかるIr)度の拡散抵抗の
温度係数は、約+05%/deg″C−ある。Therefore, the higher the impurity concentration of the diffused resistance, the smaller the temperature change during movement. At an impurity concentration of -3 of I x 10'8, the temperature coefficient of mobility is approximately -0.5%/d
It is eg. Therefore, the temperature coefficient of such a diffusion resistance of Ir) degrees is approximately +05%/deg''C-.
へ405抵抗の温度係数が0.2〜0.3 % / d
egであるから、拡散抵抗の温度係数を、これと等しい
か近い値にするためには、不純物の表面濃度は少なくと
もl X 101′cra−3以上でなければならない
。Temperature coefficient of 405 resistance is 0.2-0.3%/d
eg, in order to make the temperature coefficient of the diffusion resistance equal to or close to this value, the surface concentration of impurities must be at least l x 101'cra-3 or more.
これが第2の特徴の理由である。This is the reason for the second feature.
本発明の第3の特徴1よ、第2図における11の拡散抵
抗の拡散深さを、1ttm以下に1−ることである。そ
の理由は以下の通りである。The third feature of the present invention is that the diffusion depth of the 11 diffused resistors in FIG. 2 is set to 1 ttm or less. The reason is as follows.
前記の如く、11の抵抗のシート抵抗は、1〜2にΩ1
つ以上にせざるを得ない。不純物の表面濃度がl X
] 018crn−”のとぎ、拡散深さがI、 Ir
2の拡散抵抗のノート抵抗は1〜2にΩ、/コである。As mentioned above, the sheet resistance of resistor 11 is Ω1 for 1 to 2.
I have no choice but to make it more than one. The surface concentration of impurities is l
] 018crn-”, the diffusion depth is I, Ir
The note resistance of the diffused resistor of 2 is 1 to 2 Ω,/co.
したがって、表面濃度がI X 10′6儂−3以上で
、かつノート抵抗が1〜2にΩ/り以上である拡1:j
l抵抗を実現するためには、拡散深さは1μm以下でな
ければならない。これが第3の特徴の埋山である。Therefore, an expansion 1:j with a surface concentration of I x 10'6 儂-3 or more and a note resistance of 1 to 2 Ω/min or more
In order to achieve l resistance, the diffusion depth must be less than 1 μm. This is the third hidden feature.
以下本発明の実施1FIIを図面に塙づいて1f1・述
忙る。Embodiment 1FII of the present invention will be described below with reference to the drawings.
第1図は、本発明による拡散抵抗と、nチャネルλIO
5抵抗との温度変化率を比4・又したグラフであり、2
0゛Cにおける抵抗値に対し、各温度で何゛Cの抵抗値
の増減があるかを示l、たものである。第1図において
、21.22はそれぞれ拡(1を抵抗′。FIG. 1 shows a diffused resistor according to the invention and an n-channel λIO
This is a graph showing the ratio of the temperature change rate with 5 resistors, and 2
It shows how many °C the resistance value increases or decreases at each temperature with respect to the resistance value at 0 °C. In Fig. 1, 21 and 22 are respectively expanded (1 is resistance').
よ3\Is砥抗の温度′変化;(、−である。拡散抵抗
は、10”’ Cm 3(ハ11形括阪上に形成したP
形拡散抵抗で、表面“″度:i約3 X l O” c
m ”であり、拡散深さは約0.25 tlmである。3\Is Temperature change of the abrasive resistor; (, -. Diffusion resistance is 10"' Cm3 (C
In the form of diffused resistance, the surface degree: i approx. 3 X l O" c
m” and the diffusion depth is approximately 0.25 tlm.
第2図より明らかなように、本発明を実用すれば、温度
係数がSl (J S抵抗とほぼ等し)、拡11ケ抵抗
を得ろことができる。As is clear from FIG. 2, if the present invention is put into practice, it is possible to obtain an expanded resistor with a temperature coefficient of Sl (approximately equal to the JS resistance).
213図は、本発明なりD回路に応用した場合の′11
℃也寿命検出電圧の温度特性を示す。常用温度範囲で検
出電圧はほぼ一定で、±6 m V以内になっている。Figure 213 shows '11 when the present invention is applied to the D circuit.
℃ Also shows the temperature characteristics of the life detection voltage. The detection voltage is almost constant within the normal temperature range, within ±6 mV.
以上の説明で明らかなように、本発明によればB I)
回路の温度依存性をなくすことが可能となり、テを子時
計用ICなどへ応用すれば、その効果は甚大である。As is clear from the above explanation, according to the present invention, B I)
It becomes possible to eliminate the temperature dependence of the circuit, and if it is applied to ICs for slave clocks, the effect will be enormous.
第1図は本発明の拡散抵抗とkl OS抵抗の温度変化
率0)グラフ、第2図は従来及び本発明を説明するBD
回路の回路図、第3図は本発明のBD回洛の電池寿命検
出電圧の温度特性を示すグラフである。
11・・温度依存性のな(抵抗、
12・・・・N40 S抵抗、
16・・−・ pチャネルMOSトランジスタ、14・
・・nチャネルNl03)ランジスタ、21・・・・本
発明による拡散抵抗の温度変化率、22・・・・・0チ
ヤネルへ105抵抗の温度変化率。
特許出願人 ンチズン時計株式会社
第1図
ンH度 (0C)
21 ’ 私で94代オルのノ■麦遺り弊22:
n子ffJネルMOS垢jルの眉げL変イじ弊第2図
ン且度 (°C)Fig. 1 is a graph of the temperature change rate of the diffused resistance and klOS resistance of the present invention, and Fig. 2 is a BD graph explaining the conventional and the present invention.
The circuit diagram of the circuit, FIG. 3, is a graph showing the temperature characteristics of the battery life detection voltage of the BD recycling according to the present invention. 11...Temperature-dependent (resistance), 12...N40S resistance, 16...p-channel MOS transistor, 14...
...n-channel N103) transistor, 21...temperature change rate of diffused resistance according to the invention, 22...temperature change rate of 105 resistance to 0 channel. Patent Applicant Nchizun Watch Co., Ltd. Figure 1 H degree (0C) 21 'I am a 94th generation old man.
n child ff J channel MOS dirt j le's eyebrows L change I am sorry Figure 2 n and degree (°C)
Claims (3)
いて、該電池寿命検出回路の構成要素として、温度係数
のほぼ等しい拡散抵抗とMOS抵抗との直列接続を有す
ることを特徴とする電池寿命検出回路付半導体集積回路
。(1) A semiconductor integrated circuit incorporating a battery life detection circuit, characterized in that the battery life detection circuit has, as a component of the battery life detection circuit, a series connection of a diffused resistor and a MOS resistor having substantially equal temperature coefficients. Semiconductor integrated circuit with.
表面不純物濃度が1×10^1^8cm^−^3以上で
あることを特徴とする特許請求の範囲第1項記載の電池
寿命検出回路付半導体集積回路。(2) The diffused resistance whose temperature coefficient is almost equal to the MOS resistance is
The semiconductor integrated circuit with a battery life detection circuit according to claim 1, wherein the surface impurity concentration is 1×10^1^8 cm^-^3 or more.
拡散深さが1μm以下であることを特徴とする特許請求
の範囲第1項記載の電池寿命検出回路付半導体集積回路
。(3) The diffused resistance whose temperature coefficient is almost equal to the MOS resistance is
A semiconductor integrated circuit with a battery life detection circuit according to claim 1, wherein the diffusion depth is 1 μm or less.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59209471A JPH0743414B2 (en) | 1984-10-05 | 1984-10-05 | Semiconductor integrated circuit with battery life detection circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59209471A JPH0743414B2 (en) | 1984-10-05 | 1984-10-05 | Semiconductor integrated circuit with battery life detection circuit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6188549A true JPS6188549A (en) | 1986-05-06 |
JPH0743414B2 JPH0743414B2 (en) | 1995-05-15 |
Family
ID=16573404
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59209471A Expired - Lifetime JPH0743414B2 (en) | 1984-10-05 | 1984-10-05 | Semiconductor integrated circuit with battery life detection circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0743414B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6359210A (en) * | 1986-08-29 | 1988-03-15 | Nec Corp | Rc active filter |
JPH03238365A (en) * | 1990-02-15 | 1991-10-24 | Nec Corp | Low voltage detection circuit |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5158378A (en) * | 1974-11-18 | 1976-05-21 | Suwa Seikosha Kk | |
JPS5719676A (en) * | 1981-06-01 | 1982-02-01 | Seiko Epson Corp | Voltage detecting circuit |
-
1984
- 1984-10-05 JP JP59209471A patent/JPH0743414B2/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5158378A (en) * | 1974-11-18 | 1976-05-21 | Suwa Seikosha Kk | |
JPS5719676A (en) * | 1981-06-01 | 1982-02-01 | Seiko Epson Corp | Voltage detecting circuit |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6359210A (en) * | 1986-08-29 | 1988-03-15 | Nec Corp | Rc active filter |
JPH03238365A (en) * | 1990-02-15 | 1991-10-24 | Nec Corp | Low voltage detection circuit |
Also Published As
Publication number | Publication date |
---|---|
JPH0743414B2 (en) | 1995-05-15 |
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