JPS6183245U - - Google Patents
Info
- Publication number
- JPS6183245U JPS6183245U JP16965384U JP16965384U JPS6183245U JP S6183245 U JPS6183245 U JP S6183245U JP 16965384 U JP16965384 U JP 16965384U JP 16965384 U JP16965384 U JP 16965384U JP S6183245 U JPS6183245 U JP S6183245U
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- heating elements
- gun
- lab
- longitudinal direction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010438 heat treatment Methods 0.000 claims description 3
- 239000013078 crystal Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
- 238000000137 annealing Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1984169653U JPH0238365Y2 (en:Method) | 1984-11-08 | 1984-11-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1984169653U JPH0238365Y2 (en:Method) | 1984-11-08 | 1984-11-08 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6183245U true JPS6183245U (en:Method) | 1986-06-02 |
| JPH0238365Y2 JPH0238365Y2 (en:Method) | 1990-10-16 |
Family
ID=30727372
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1984169653U Expired JPH0238365Y2 (en:Method) | 1984-11-08 | 1984-11-08 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0238365Y2 (en:Method) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017157368A (ja) * | 2016-03-01 | 2017-09-07 | 株式会社日立ハイテクノロジーズ | 電界放出電子源、その製造方法および電子線装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5796450A (en) * | 1980-12-09 | 1982-06-15 | Toshiba Corp | Electron gun |
| JPS57196444A (en) * | 1981-05-26 | 1982-12-02 | Ibm | Electron beam emission device |
-
1984
- 1984-11-08 JP JP1984169653U patent/JPH0238365Y2/ja not_active Expired
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5796450A (en) * | 1980-12-09 | 1982-06-15 | Toshiba Corp | Electron gun |
| JPS57196444A (en) * | 1981-05-26 | 1982-12-02 | Ibm | Electron beam emission device |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017157368A (ja) * | 2016-03-01 | 2017-09-07 | 株式会社日立ハイテクノロジーズ | 電界放出電子源、その製造方法および電子線装置 |
| WO2017149862A1 (ja) * | 2016-03-01 | 2017-09-08 | 株式会社日立ハイテクノロジーズ | 電界放出電子源、その製造方法および電子線装置 |
| US10586674B2 (en) | 2016-03-01 | 2020-03-10 | Hitachi High-Technologies Corporation | Field emission electron source, method for manufacturing same, and electron beam device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0238365Y2 (en:Method) | 1990-10-16 |