JPS6173653U - - Google Patents
Info
- Publication number
- JPS6173653U JPS6173653U JP15824884U JP15824884U JPS6173653U JP S6173653 U JPS6173653 U JP S6173653U JP 15824884 U JP15824884 U JP 15824884U JP 15824884 U JP15824884 U JP 15824884U JP S6173653 U JPS6173653 U JP S6173653U
- Authority
- JP
- Japan
- Prior art keywords
- evaporation source
- vacuum
- thin film
- sample chamber
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001704 evaporation Methods 0.000 claims description 6
- 230000008020 evaporation Effects 0.000 claims description 6
- 238000001514 detection method Methods 0.000 claims description 3
- 230000001105 regulatory effect Effects 0.000 claims description 2
- 239000010409 thin film Substances 0.000 claims 4
- 238000005192 partition Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 5
- 238000007738 vacuum evaporation Methods 0.000 description 3
- 230000002123 temporal effect Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Description
第１図は本考案の一実施例に係る真空蒸着装置
の概略構成図、第２図は従来の真空蒸着装置の概
略構成図で、第３図はその排気系統図、第４図は
真空蒸着装置に含まれる試料取付治具の拡大断面
図、第５図は真空圧力の時間的変化を示す図であ
る。
１…試料室、２…蒸発源室、３，３′…排気系
、７，８…検出センサ、Ｖ１，Ｖ２，Ｖ３，Ｖ４
，Ｖ５…開閉弁、Ｖ６…調整弁。
Fig. 1 is a schematic diagram of a vacuum evaporation device according to an embodiment of the present invention, Fig. 2 is a schematic diagram of a conventional vacuum evaporation device, Fig. 3 is an exhaust system diagram thereof, and Fig. 4 is a vacuum evaporation system diagram. FIG. 5 is an enlarged sectional view of the sample mounting jig included in the apparatus, and is a diagram showing temporal changes in vacuum pressure. 1... Sample chamber, 2... Evaporation source chamber, 3, 3'... Exhaust system, 7, 8... Detection sensor, V 1 , V 2 , V 3 , V 4
, V5 ...opening/closing valve, V6 ...regulating valve.
Claims (1)
て連通する薄膜の蒸発源室と、上記試料室及び蒸
発源室に開閉弁を介して連通し、試料室及び蒸発
源室を排気して真空にする排気系と、該真空圧力
を検出する検出センサとからなる真空薄膜形成装
置において、上記試料室及び／又は蒸発源室と排
気系との間に、上記検出センサと連動して排気コ
ンダクタンスを連続的に調整する調整弁を付設し
たことを特徴とする真空薄膜形成装置。 a sample chamber, a thin film evaporation source chamber that communicates with the sample chamber via a partition plate that can be opened and closed; and a thin film evaporation source chamber that communicates with the sample chamber and the evaporation source chamber via an on-off valve, and exhausts the sample chamber and the evaporation source chamber. In a vacuum thin film forming apparatus comprising an evacuation system that creates a vacuum using a vacuum cleaner, and a detection sensor that detects the vacuum pressure, an evacuation system is provided between the sample chamber and/or evaporation source chamber and the evacuation system in conjunction with the detection sensor. A vacuum thin film forming apparatus characterized by being equipped with a regulating valve that continuously adjusts conductance.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15824884U JPS6173653U (en) | 1984-10-18 | 1984-10-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15824884U JPS6173653U (en) | 1984-10-18 | 1984-10-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6173653U true JPS6173653U (en) | 1986-05-19 |
Family
ID=30716230
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15824884U Pending JPS6173653U (en) | 1984-10-18 | 1984-10-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6173653U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63248465A (en) * | 1987-04-02 | 1988-10-14 | Toshiba Corp | Vessel for low-pressure plasma thermal spraying |
-
1984
- 1984-10-18 JP JP15824884U patent/JPS6173653U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63248465A (en) * | 1987-04-02 | 1988-10-14 | Toshiba Corp | Vessel for low-pressure plasma thermal spraying |