JPS63248465A - Vessel for low-pressure plasma thermal spraying - Google Patents
Vessel for low-pressure plasma thermal sprayingInfo
- Publication number
- JPS63248465A JPS63248465A JP62079631A JP7963187A JPS63248465A JP S63248465 A JPS63248465 A JP S63248465A JP 62079631 A JP62079631 A JP 62079631A JP 7963187 A JP7963187 A JP 7963187A JP S63248465 A JPS63248465 A JP S63248465A
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- vessel
- low
- thermal spraying
- degree
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007751 thermal spraying Methods 0.000 title abstract description 6
- 238000007750 plasma spraying Methods 0.000 claims description 15
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
Landscapes
- Nozzles (AREA)
- Coating By Spraying Or Casting (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の目的〕
(産業上の利用分野)
本発明は、低圧プラズマ溶射用容器に係り、特に、低レ
ベルの真空度を一定にするように改良された低圧プラズ
マ溶射用容器に関する。[Detailed Description of the Invention] [Object of the Invention] (Industrial Field of Application) The present invention relates to a container for low-pressure plasma spraying, and particularly to a low-pressure plasma spraying container that is improved to maintain a constant low-level vacuum. Concerning containers for use.
開発され、被膜材料の改良と共に急速に伸びてきた技術
である。しかしながら、従来行なわれてきた大気中での
溶射では、被膜中に気泡、酸化物の巻き込み等が生じ、
被膜材料の持つ特性を100%活用できない問題があっ
た。そこで、この問題に対し、最近低圧の不活性ガス雰
囲気中でプラズマ溶射を行なうことによって、緻密で酸
化物の巻き込み等のない被膜を得る技術が開発される。This is a technology that has been developed and rapidly expanded with improvements in coating materials. However, conventional thermal spraying in the atmosphere causes bubbles, oxides, etc. to be trapped in the coating.
There was a problem in that the properties of the coating material could not be utilized 100%. To solve this problem, a technique has recently been developed to obtain a dense coating without entrainment of oxides by performing plasma spraying in a low-pressure inert gas atmosphere.
この方法は、具体的には、真空容器内において不活性ガ
スをアークガスあるいは粉末のキャリアガスとして用い
てプラズマ溶射するもので、実質的真空度は50〜50
0Torr程度である。Specifically, this method involves plasma spraying in a vacuum container using an inert gas as an arc gas or a powder carrier gas, and the actual degree of vacuum is 50 to 50.
It is about 0 Torr.
(発明が解決しようとする問題点)
上述のように低圧プラズマ溶射は、真空容器内でプラズ
マ溶射を実施することになるが、ここで大きな問題とな
るのは、真空あるいは低圧という条件とプラズマジェッ
トというガス流条件の相反する状態を必要とすることで
ある。真空排気系の容量が小さすぎる場合には、プラズ
マジェットのために容器内はすぐに1気圧以上になり、
また。(Problems to be Solved by the Invention) As mentioned above, low-pressure plasma spraying involves performing plasma spraying in a vacuum container, but the major problems here are the vacuum or low pressure conditions and the plasma jet. This requires contradictory gas flow conditions. If the capacity of the vacuum evacuation system is too small, the pressure inside the container will quickly rise to over 1 atm due to the plasma jet.
Also.
排気系の容量が大きい場合には所期の真空度以上になっ
てプラズマ溶射が行なわれない事態になる。If the capacity of the exhaust system is large, the vacuum level will exceed the desired level and plasma spraying will not be performed.
このような問題に対して、アークガス量の調整を蜆
行なったり、真夏バルブの開閉を行ない対処している、
しかしながら、これらの手法では満足な溶射条件を設定
することは、困難なことであり、またバルブの本来の機
能を損なう等の問題がある。We deal with these problems by adjusting the amount of arc gas and opening and closing midsummer valves.
However, with these methods, it is difficult to set satisfactory thermal spraying conditions, and there are problems such as impairing the original function of the valve.
本発明は、従来のかかる問題点を解消し、低圧プラズマ
溶射条件を満足させながら、かつ装置に負担のかからな
い、低圧プラズマ溶射用容器を提供することを目的とす
るものである。SUMMARY OF THE INVENTION An object of the present invention is to provide a container for low-pressure plasma spraying that solves these conventional problems and satisfies the low-pressure plasma spraying conditions while not placing a burden on the apparatus.
即ち、本発明の低圧プラズマ溶射用容器は、容器中の真
空度を計測するためにその一部に取り付けられた真空計
等の測定手段を備え、さらにこの測定手段からの信号に
応じて、真空ポンプ等真空排気系の排気能力を調整して
、該容器内の圧力を所定の値に制御する保持手段を備え
たことを特徴とするものである。That is, the low-pressure plasma spraying container of the present invention is equipped with a measuring means such as a vacuum gauge attached to a part of the container in order to measure the degree of vacuum inside the container, and furthermore, according to a signal from this measuring means, the vacuum level is measured. The device is characterized by comprising a holding means for controlling the pressure inside the container to a predetermined value by adjusting the evacuation capacity of a vacuum evacuation system such as a pump.
こうした本発明の低圧プラズマ溶射用容器は、容器内の
真空度に応じて真空排気系の能力を調整し、これよりプ
ラズマ溶射ガンから供給されるガスの量とのバランスが
保たれる。In the low-pressure plasma spraying container of the present invention, the capacity of the evacuation system is adjusted according to the degree of vacuum within the container, thereby maintaining a balance with the amount of gas supplied from the plasma spraying gun.
(実 施 例)
内容積2m3の真空容器に対し、3000Q/分の排気
能力を有するロータリーポンプを仕切り弁を介して取り
付けた。該容器は測定手段とてブルドン管タイプの真空
計が取り付けられ、該真空計は真空度に対応した電気信
号を出力する。この信号は演算装置にかけられ、所定の
値に対する偏差が計算されるようになっている。計算さ
れた偏差値は電気信号として出力、ロータリポンプのモ
ータを制御する信号として用いられる。本実施例ではこ
れら演算装置及びロータリポンプにより真空保持手段を
形成している。(Example) A rotary pump having an exhaust capacity of 3000 Q/min was attached to a vacuum container with an internal volume of 2 m3 via a gate valve. A Bourdon tube type vacuum gauge is attached to the container as a measuring means, and the vacuum gauge outputs an electrical signal corresponding to the degree of vacuum. This signal is applied to an arithmetic unit so that the deviation from a predetermined value is calculated. The calculated deviation value is output as an electrical signal and is used as a signal to control the rotary pump motor. In this embodiment, the arithmetic unit and rotary pump form the vacuum holding means.
まずモータ制御回路を切った状態で、ロータリポンプを
100メ出力させ、該容器内をI X 10””Tor
r程度の真空度にした。この状態で制御回路を入れると
、真空計からの信号は所定値より大幅に負値(設定値よ
り高真空度側を負とする)となるため、モータへの出力
命令は殆ど0となる。次に真空容器のガスバルブを開放
して、容器内へアルゴンガスを導入し、所定の圧力まで
昇圧した。そしてこの時点でプラズマ溶射を開始した。First, with the motor control circuit turned off, the rotary pump is outputted at 100 meters, and the inside of the container is heated to I
The degree of vacuum was set to about r. When the control circuit is turned on in this state, the signal from the vacuum gauge becomes a much more negative value than the predetermined value (negative values are on the higher vacuum side than the set value), so the output command to the motor becomes almost zero. Next, the gas valve of the vacuum container was opened, argon gas was introduced into the container, and the pressure was increased to a predetermined pressure. At this point, plasma spraying was started.
このプラズマ溶射ガンから送給されるガス量に応じて真
空計からの信号は正値となり、ロータリーポンプへの出
力命令が増大して、容器内の真空度が一定に保持された
。二の時、プラズマ溶射ガンから送給されるガス量(1
00Q/分)よりもロータリーポンプの排気能力が十分
に大きくしたため変動幅の少ない圧力制御が可能であっ
た。The signal from the vacuum gauge became a positive value in accordance with the amount of gas supplied from the plasma spray gun, and the output command to the rotary pump increased to maintain a constant degree of vacuum inside the container. At time 2, the amount of gas supplied from the plasma spray gun (1
Since the exhaust capacity of the rotary pump was made sufficiently larger than that of 00Q/min), pressure control with a small range of fluctuation was possible.
本発明の容器を用いることにより、低圧プラズマ溶射条
件を良好に保持することが可能となった。By using the container of the present invention, it became possible to maintain low-pressure plasma spraying conditions well.
代理人 弁理士 則 近 憲 佑 −WAgent: Patent Attorney Noriyuki Chika -W
Claims (1)
度を所定の値に維持する保持手段とを備えたことを特徴
とする低圧プラズマ溶射用容器。[Scope of Claims] The invention is characterized by comprising a measuring means for measuring the degree of vacuum in the container, and a holding means for maintaining the degree of vacuum in the container at a predetermined value according to an output signal from the measuring means. Container for low pressure plasma spraying.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62079631A JP2695779B2 (en) | 1987-04-02 | 1987-04-02 | Low pressure plasma spray container |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62079631A JP2695779B2 (en) | 1987-04-02 | 1987-04-02 | Low pressure plasma spray container |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63248465A true JPS63248465A (en) | 1988-10-14 |
JP2695779B2 JP2695779B2 (en) | 1998-01-14 |
Family
ID=13695428
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62079631A Expired - Fee Related JP2695779B2 (en) | 1987-04-02 | 1987-04-02 | Low pressure plasma spray container |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2695779B2 (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5995156U (en) * | 1982-12-16 | 1984-06-28 | 日本電気ホームエレクトロニクス株式会社 | Vacuum deposition equipment |
JPS60122360U (en) * | 1984-01-30 | 1985-08-17 | 株式会社日立製作所 | sputtering equipment |
JPS6173653U (en) * | 1984-10-18 | 1986-05-19 | ||
JPS62192573A (en) * | 1986-02-19 | 1987-08-24 | Hitachi Ltd | Composite material and its production |
JPS62188591U (en) * | 1986-05-21 | 1987-12-01 |
-
1987
- 1987-04-02 JP JP62079631A patent/JP2695779B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5995156U (en) * | 1982-12-16 | 1984-06-28 | 日本電気ホームエレクトロニクス株式会社 | Vacuum deposition equipment |
JPS60122360U (en) * | 1984-01-30 | 1985-08-17 | 株式会社日立製作所 | sputtering equipment |
JPS6173653U (en) * | 1984-10-18 | 1986-05-19 | ||
JPS62192573A (en) * | 1986-02-19 | 1987-08-24 | Hitachi Ltd | Composite material and its production |
JPS62188591U (en) * | 1986-05-21 | 1987-12-01 |
Also Published As
Publication number | Publication date |
---|---|
JP2695779B2 (en) | 1998-01-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |