JPS616275A - プラズマｃｖｄ装置 - Google Patents

プラズマｃｖｄ装置

Info

Publication number
JPS616275A
JPS616275A JP59125198A JP12519884A JPS616275A JP S616275 A JPS616275 A JP S616275A JP 59125198 A JP59125198 A JP 59125198A JP 12519884 A JP12519884 A JP 12519884A JP S616275 A JPS616275 A JP S616275A
Authority
JP
Japan
Prior art keywords
electrodes
drum
electrode
raw material
material gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59125198A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6242026B2 (enrdf_load_stackoverflow
Inventor
Yasutomo Fujiyama
藤山　靖朋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59125198A priority Critical patent/JPS616275A/ja
Publication of JPS616275A publication Critical patent/JPS616275A/ja
Publication of JPS6242026B2 publication Critical patent/JPS6242026B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Light Receiving Elements (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
JP59125198A 1984-06-20 1984-06-20 プラズマｃｖｄ装置 Granted JPS616275A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59125198A JPS616275A (ja) 1984-06-20 1984-06-20 プラズマｃｖｄ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59125198A JPS616275A (ja) 1984-06-20 1984-06-20 プラズマｃｖｄ装置

Publications (2)

Publication Number Publication Date
JPS616275A true JPS616275A (ja) 1986-01-11
JPS6242026B2 JPS6242026B2 (enrdf_load_stackoverflow) 1987-09-05

Family

ID=14904338

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59125198A Granted JPS616275A (ja) 1984-06-20 1984-06-20 プラズマｃｖｄ装置

Country Status (1)

Country Link
JP (1) JPS616275A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6242026B2 (enrdf_load_stackoverflow) 1987-09-05

Similar Documents

Publication Publication Date Title
JP6240607B2 (ja) 直線型大面積プラズマリアクタ内における均一プロセスのためのガス送出及び分配
JP2009503875A (ja) ガスマニホルドバルブクラスタ
WO2005064660A1 (ja) マイクロ波プラズマ処理方法、マイクロ波プラズマ処理装置及びそのプラズマヘッド
US4723508A (en) Plasma CVD apparatus
TWI844439B (zh) 均勻的原位清洗及沉積
JPS616275A (ja) プラズマｃｖｄ装置
US5036794A (en) CVD apparatus
JPS616278A (ja) プラズマｃｖｄ装置
JPS616277A (ja) プラズマｃｖｄ装置
JPS616276A (ja) プラズマｃｖｄ装置
JP2004508706A (ja) プラズマ処理
JPH0152052B2 (enrdf_load_stackoverflow)
JPS6357503B2 (enrdf_load_stackoverflow)
US6761128B2 (en) Plasma treatment apparatus
JPS6126779A (ja) プラズマｃｖｄ装置
JPS6239532B2 (enrdf_load_stackoverflow)
JPS6126778A (ja) プラズマｃｖｄ装置
JPS6126777A (ja) プラズマｃｖｄ装置
JPS58154226A (ja) プラズマｃｖｄ装置
JPS6126776A (ja) プラズマｃｖｄ装置
JPH04211115A (ja) Ｒｆプラズマｃｖｄ装置ならびに該装置による薄膜形成方法
TW202502652A (zh) 形成石墨烯膜的方法
JP2001214276A (ja) 堆積膜形成装置
JPH0628239B2 (ja) 連続式プラズマｃｖｄ装置
WO2011066769A1 (zh) 一种pecvd系统

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees