JPS6160880A - スパッタリング装置 - Google Patents

スパッタリング装置

Info

Publication number
JPS6160880A
JPS6160880A JP59179833A JP17983384A JPS6160880A JP S6160880 A JPS6160880 A JP S6160880A JP 59179833 A JP59179833 A JP 59179833A JP 17983384 A JP17983384 A JP 17983384A JP S6160880 A JPS6160880 A JP S6160880A
Authority
JP
Japan
Prior art keywords
target
sputtering
magnet
plasma
sputtering apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59179833A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0351788B2 (enExample
Inventor
Ikuo Sakai
郁夫 坂井
Kunyu Sumita
住田　勲勇
Yasuhiko Nakayama
中山　靖彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP59179833A priority Critical patent/JPS6160880A/ja
Publication of JPS6160880A publication Critical patent/JPS6160880A/ja
Publication of JPH0351788B2 publication Critical patent/JPH0351788B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Thin Magnetic Films (AREA)
JP59179833A 1984-08-29 1984-08-29 スパッタリング装置 Granted JPS6160880A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59179833A JPS6160880A (ja) 1984-08-29 1984-08-29 スパッタリング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59179833A JPS6160880A (ja) 1984-08-29 1984-08-29 スパッタリング装置

Publications (2)

Publication Number Publication Date
JPS6160880A true JPS6160880A (ja) 1986-03-28
JPH0351788B2 JPH0351788B2 (enExample) 1991-08-07

Family

ID=16072691

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59179833A Granted JPS6160880A (ja) 1984-08-29 1984-08-29 スパッタリング装置

Country Status (1)

Country Link
JP (1) JPS6160880A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01165771A (ja) * 1987-12-21 1989-06-29 Matsushita Electric Ind Co Ltd マグネトロンスパッタカソード
JPH04128372A (ja) * 1990-09-18 1992-04-28 Shinku Kikai Kogyo Kk スパッタリング方法および装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01165771A (ja) * 1987-12-21 1989-06-29 Matsushita Electric Ind Co Ltd マグネトロンスパッタカソード
JPH04128372A (ja) * 1990-09-18 1992-04-28 Shinku Kikai Kogyo Kk スパッタリング方法および装置

Also Published As

Publication number Publication date
JPH0351788B2 (enExample) 1991-08-07

Similar Documents

Publication Publication Date Title
US4180450A (en) Planar magnetron sputtering device
US4265729A (en) Magnetically enhanced sputtering device
US4162954A (en) Planar magnetron sputtering device
US4865708A (en) Magnetron sputtering cathode
US5876576A (en) Apparatus for sputtering magnetic target materials
JPS5938385A (ja) スパツタリング装置
JPH04501585A (ja) 改良されたマグネトロンスパッタリング陰極
JPS6320304B2 (enExample)
JPS6272121A (ja) 半導体処理装置
JPS59133370A (ja) マグネトロンスパツタ−装置
GB2028377A (en) Magnetically-Enhanced Sputtering Device
EP0645798A1 (en) Magnetron sputtering apparatus
JPS6160880A (ja) スパッタリング装置
JPS6151410B2 (enExample)
JPH0881769A (ja) スパッタ装置
JPH0525625A (ja) マグネトロンスパツタカソード
JPS6128029B2 (enExample)
JPS583975A (ja) スパツタリングによる成膜方法及びその装置
JPS6169965A (ja) スパツタリング装置
JPH0159351B2 (enExample)
JPS6354789B2 (enExample)
JPH06224065A (ja) 一方向磁場発生装置
JPS63223173A (ja) 基板処理方法およびその装置
JPS62149868A (ja) 強磁性体の高速スパツタリング方法
JPS6338576A (ja) スパツタリング装置

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term