JPS6155063U - - Google Patents
Info
- Publication number
- JPS6155063U JPS6155063U JP13946784U JP13946784U JPS6155063U JP S6155063 U JPS6155063 U JP S6155063U JP 13946784 U JP13946784 U JP 13946784U JP 13946784 U JP13946784 U JP 13946784U JP S6155063 U JPS6155063 U JP S6155063U
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- target
- vacuum chamber
- attached
- deposition apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13946784U JPS6155063U (en:Method) | 1984-09-17 | 1984-09-17 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13946784U JPS6155063U (en:Method) | 1984-09-17 | 1984-09-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6155063U true JPS6155063U (en:Method) | 1986-04-14 |
Family
ID=30697846
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13946784U Pending JPS6155063U (en:Method) | 1984-09-17 | 1984-09-17 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6155063U (en:Method) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61168816A (ja) * | 1985-01-18 | 1986-07-30 | セイコーエプソン株式会社 | 透明導電性膜の形成方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5690975A (en) * | 1979-12-25 | 1981-07-23 | Toshiba Corp | Sputtering apparatus |
-
1984
- 1984-09-17 JP JP13946784U patent/JPS6155063U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5690975A (en) * | 1979-12-25 | 1981-07-23 | Toshiba Corp | Sputtering apparatus |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61168816A (ja) * | 1985-01-18 | 1986-07-30 | セイコーエプソン株式会社 | 透明導電性膜の形成方法 |