JPS6153430B2 - - Google Patents

Info

Publication number
JPS6153430B2
JPS6153430B2 JP57181383A JP18138382A JPS6153430B2 JP S6153430 B2 JPS6153430 B2 JP S6153430B2 JP 57181383 A JP57181383 A JP 57181383A JP 18138382 A JP18138382 A JP 18138382A JP S6153430 B2 JPS6153430 B2 JP S6153430B2
Authority
JP
Japan
Prior art keywords
substrate
cylindrical
gas
chamber
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57181383A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5970766A (ja
Inventor
Juichi Ishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP57181383A priority Critical patent/JPS5970766A/ja
Publication of JPS5970766A publication Critical patent/JPS5970766A/ja
Publication of JPS6153430B2 publication Critical patent/JPS6153430B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Chemical Vapour Deposition (AREA)
  • Light Receiving Elements (AREA)
JP57181383A 1982-10-18 1982-10-18 プラズマｃｖｄ装置 Granted JPS5970766A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57181383A JPS5970766A (ja) 1982-10-18 1982-10-18 プラズマｃｖｄ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57181383A JPS5970766A (ja) 1982-10-18 1982-10-18 プラズマｃｖｄ装置

Publications (2)

Publication Number Publication Date
JPS5970766A JPS5970766A (ja) 1984-04-21
JPS6153430B2 true JPS6153430B2 (enrdf_load_stackoverflow) 1986-11-18

Family

ID=16099766

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57181383A Granted JPS5970766A (ja) 1982-10-18 1982-10-18 プラズマｃｖｄ装置

Country Status (1)

Country Link
JP (1) JPS5970766A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59131510A (ja) * 1983-01-17 1984-07-28 Zenko Hirose アモルフアスシリコン膜の成膜方法
JPS61168922A (ja) * 1985-01-17 1986-07-30 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション プラズマ・エツチング装置
US5021138A (en) * 1985-01-17 1991-06-04 Babu Suryadevara V Side source center sink plasma reactor
JP5027667B2 (ja) * 2004-11-24 2012-09-19 エリコン・ソーラー・アクチェンゲゼルシャフト，トリュープバッハ 超大面積基板用真空処理チャンバ

Also Published As

Publication number Publication date
JPS5970766A (ja) 1984-04-21

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