JPS6152120B2 - - Google Patents
Info
- Publication number
- JPS6152120B2 JPS6152120B2 JP5613179A JP5613179A JPS6152120B2 JP S6152120 B2 JPS6152120 B2 JP S6152120B2 JP 5613179 A JP5613179 A JP 5613179A JP 5613179 A JP5613179 A JP 5613179A JP S6152120 B2 JPS6152120 B2 JP S6152120B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon carbide
- silicon
- substrate
- layer
- raw material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Chemical Vapour Deposition (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5613179A JPS55149195A (en) | 1979-05-07 | 1979-05-07 | Manufacture of silicon carbide substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5613179A JPS55149195A (en) | 1979-05-07 | 1979-05-07 | Manufacture of silicon carbide substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55149195A JPS55149195A (en) | 1980-11-20 |
| JPS6152120B2 true JPS6152120B2 (cs) | 1986-11-12 |
Family
ID=13018513
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5613179A Granted JPS55149195A (en) | 1979-05-07 | 1979-05-07 | Manufacture of silicon carbide substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55149195A (cs) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101740094B1 (ko) | 2010-12-24 | 2017-05-25 | 도요탄소 가부시키가이샤 | 단결정 탄화규소 액상 에피택셜 성장용 유닛 및 단결정 탄화규소의 액상 에피택셜 성장 방법 |
| JP5707614B2 (ja) * | 2010-12-24 | 2015-04-30 | 東洋炭素株式会社 | 単結晶炭化ケイ素液相エピタキシャル成長用ユニット及び単結晶炭化ケイ素の液相エピタキシャル成長方法 |
| JP5707612B2 (ja) * | 2010-12-24 | 2015-04-30 | 東洋炭素株式会社 | 単結晶炭化ケイ素液相エピタキシャル成長用ユニット及び単結晶炭化ケイ素の液相エピタキシャル成長方法 |
| JP5707613B2 (ja) * | 2010-12-24 | 2015-04-30 | 東洋炭素株式会社 | 単結晶炭化ケイ素液相エピタキシャル成長用ユニット及び単結晶炭化ケイ素の液相エピタキシャル成長方法 |
-
1979
- 1979-05-07 JP JP5613179A patent/JPS55149195A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55149195A (en) | 1980-11-20 |
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