JPS6150309B2 - - Google Patents

Info

Publication number
JPS6150309B2
JPS6150309B2 JP4720279A JP4720279A JPS6150309B2 JP S6150309 B2 JPS6150309 B2 JP S6150309B2 JP 4720279 A JP4720279 A JP 4720279A JP 4720279 A JP4720279 A JP 4720279A JP S6150309 B2 JPS6150309 B2 JP S6150309B2
Authority
JP
Japan
Prior art keywords
pattern
original
plate
partial
continuous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4720279A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55140842A (en
Inventor
Hideji Fujita
Yoshinobu Shimada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP4720279A priority Critical patent/JPS55140842A/ja
Publication of JPS55140842A publication Critical patent/JPS55140842A/ja
Publication of JPS6150309B2 publication Critical patent/JPS6150309B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP4720279A 1979-04-19 1979-04-19 Preparation of large size original printing plate Granted JPS55140842A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4720279A JPS55140842A (en) 1979-04-19 1979-04-19 Preparation of large size original printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4720279A JPS55140842A (en) 1979-04-19 1979-04-19 Preparation of large size original printing plate

Publications (2)

Publication Number Publication Date
JPS55140842A JPS55140842A (en) 1980-11-04
JPS6150309B2 true JPS6150309B2 (enrdf_load_stackoverflow) 1986-11-04

Family

ID=12768546

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4720279A Granted JPS55140842A (en) 1979-04-19 1979-04-19 Preparation of large size original printing plate

Country Status (1)

Country Link
JP (1) JPS55140842A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS55140842A (en) 1980-11-04

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