JPS6150155B2 - - Google Patents
Info
- Publication number
- JPS6150155B2 JPS6150155B2 JP8429381A JP8429381A JPS6150155B2 JP S6150155 B2 JPS6150155 B2 JP S6150155B2 JP 8429381 A JP8429381 A JP 8429381A JP 8429381 A JP8429381 A JP 8429381A JP S6150155 B2 JPS6150155 B2 JP S6150155B2
- Authority
- JP
- Japan
- Prior art keywords
- mesh
- master
- metal mesh
- pattern
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052751 metal Inorganic materials 0.000 claims description 28
- 239000002184 metal Substances 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 7
- 238000009713 electroplating Methods 0.000 claims description 4
- 239000004020 conductor Substances 0.000 claims description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 230000003321 amplification Effects 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 238000003199 nucleic acid amplification method Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910001111 Fine metal Inorganic materials 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 230000002787 reinforcement Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8429381A JPS57200587A (en) | 1981-06-03 | 1981-06-03 | Manufacture of metal mesh |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8429381A JPS57200587A (en) | 1981-06-03 | 1981-06-03 | Manufacture of metal mesh |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57200587A JPS57200587A (en) | 1982-12-08 |
| JPS6150155B2 true JPS6150155B2 (enrdf_load_stackoverflow) | 1986-11-01 |
Family
ID=13826416
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8429381A Granted JPS57200587A (en) | 1981-06-03 | 1981-06-03 | Manufacture of metal mesh |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57200587A (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008001952A (ja) * | 2006-05-26 | 2008-01-10 | Hitachi Chem Co Ltd | めっき用導電性基材、その製造法、導体層パターン付き基材の製造法、導体層パターン付き基材及びそれを用いた電磁波遮蔽部材 |
| JP2008001936A (ja) * | 2006-06-21 | 2008-01-10 | Hitachi Chem Co Ltd | めっき用導電性基材、その製造法、導体層パターン付き基材の製造法、導体層パターン付き基材及びそれを用いた電磁波遮蔽部材 |
| JP2010009729A (ja) * | 2008-06-30 | 2010-01-14 | Toshiba Corp | インプリント用スタンパ、インプリント用スタンパの製造方法、磁気記録媒体、磁気記録媒体の製造方法及び磁気ディスク装置 |
| JP5925582B2 (ja) * | 2012-04-27 | 2016-05-25 | セーレン株式会社 | キャリア付き穴開き金属箔およびその製造方法 |
-
1981
- 1981-06-03 JP JP8429381A patent/JPS57200587A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57200587A (en) | 1982-12-08 |
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