JPS614528A - Manufacturing apparatus of high-purity solution of water-soluble gas - Google Patents

Manufacturing apparatus of high-purity solution of water-soluble gas

Info

Publication number
JPS614528A
JPS614528A JP12198484A JP12198484A JPS614528A JP S614528 A JPS614528 A JP S614528A JP 12198484 A JP12198484 A JP 12198484A JP 12198484 A JP12198484 A JP 12198484A JP S614528 A JPS614528 A JP S614528A
Authority
JP
Japan
Prior art keywords
water
pressure
membrane
ammonia
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12198484A
Other languages
Japanese (ja)
Other versions
JPS6244964B2 (en
Inventor
Toru Yunoki
徹 柚木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ARUBATSUKU SERVICE KK
Ulvac Inc
Original Assignee
ARUBATSUKU SERVICE KK
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ARUBATSUKU SERVICE KK, Ulvac Inc filed Critical ARUBATSUKU SERVICE KK
Priority to JP12198484A priority Critical patent/JPS614528A/en
Publication of JPS614528A publication Critical patent/JPS614528A/en
Publication of JPS6244964B2 publication Critical patent/JPS6244964B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00Feed or outlet devices; Feed or outlet control devices
    • B01J4/04Feed or outlet devices; Feed or outlet control devices using osmotic pressure using membranes, porous plates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

PURPOSE:To obtain a high-purity aq. soln. and to make the manufacture of the soln. having required concn. easy in case of dissolving the water soluble gas of raw material into raw water via a hydrophobic porous membrane by making the pressure of raw water equal to or higher than the pressure of the water soluble gas. CONSTITUTION:Gaseous ammonia is reduced to the suitable pressure out of a gas bomb and fed to the inside of a hydrophobic porous membrane 2 through an inlet port 3 in the state wherein the flow rate is regulated with a flow rate regulating valve or the like. On one hand, since the pressure of ultrapure water fed from an inlet 1a of a vessel 1 is equal to ore higher than the pressure of gaseous ammonia, the fed gaseous ammonia is flowed toward an outlet part 4 thrugh the path of the inside of the membrane 2. At this time, ammonia is dissolved into the ultrapure water which is impregnated through the membrane 2 to enter the inside thereof and all the ammonia is almost dissolved in water by selecting suitably the flow rate of gaseous ammonia and the area of the membrane 2.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、例えば半導体の製造に利用され得る高純度の
薬品、試薬等の溶液を製造するのに用いられる水浴性ガ
スの高純度溶液の製造装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to an apparatus for producing a high purity solution of water bath gas used for producing solutions of high purity chemicals, reagents, etc. that can be used, for example, in the production of semiconductors. It is related to.

従来の技術 例えば半導体製造技術において利用されるような高純度
のアンモニア水を製造する場合、従来では超純水にアン
モニアガスを吹き込む方法が用いられてきた。しかしこ
のような方法では、ガス中の不純物や微粒子等が溶液中
に混入するという問題があシ、また超純水に原料ガスを
吹き込む方法では濃度調節を容易にかつ正確に行なうこ
とは困難であった。
BACKGROUND ART Conventionally, when producing high-purity ammonia water used in semiconductor manufacturing technology, for example, a method has been used in which ammonia gas is blown into ultrapure water. However, with this method, there is a problem that impurities and particulates in the gas get mixed into the solution, and with the method of blowing the raw material gas into ultrapure water, it is difficult to easily and accurately adjust the concentration. there were.

そこで、本発明では超純水に原料ガスを吹き込む代シに
原水に疎水性多孔質膜を介して原料ガスを溶解させるこ
とによってガス中の不純物や微粒子等の混入の問題およ
び製造すべき溶液濃度の容易かつ正確な調節の問題を解
決することを目的としている。
Therefore, in the present invention, instead of blowing the raw material gas into ultrapure water, the raw water is dissolved in the raw water through a hydrophobic porous membrane, which solves the problem of contamination of impurities and fine particles in the gas and the concentration of the solution to be produced. The aim is to solve the problem of easy and accurate adjustment of

問題点を解決するだめの手段 上述の目的を達成するために、本発明によれば、所要の
溶液を作るための原水の入口と溶液の出口とを備えた容
器内に疎水性多孔質膜を設け、この疎水性多孔質膜を介
して原料の水溶性ガスを原水中に溶解させるに際し原水
の圧力が原料の水浴性ガスの圧力に等しいかそれより高
くなるように構成した水溶性ガスの高純度溶液の製造装
置が提供される。
Means for Solving the Problems In order to achieve the above-mentioned object, according to the invention, a hydrophobic porous membrane is placed in a container provided with an inlet for raw water for making the required solution and an outlet for the solution. A water-soluble gas high-temperature filter is provided so that the pressure of the raw water is equal to or higher than the pressure of the water bathing gas of the raw material when the water-soluble gas of the raw material is dissolved in the raw water through this hydrophobic porous membrane. An apparatus for producing a purity solution is provided.

原料ガスとしては水に溶解するガスであればよく、例と
して、塩化水素、フッ化水素等の無機質、ギ酸、酢酸等
の有機酸、アルコール等の有機溶媒、塩素ガスおよびア
ミン類等を挙げることができる。
The raw material gas may be any gas that dissolves in water; examples include inorganic substances such as hydrogen chloride and hydrogen fluoride, organic acids such as formic acid and acetic acid, organic solvents such as alcohol, chlorine gas, and amines. I can do it.

作   用 このように構成した本発明の装置においては、疎水性多
孔質膜を介して原水に原料ガスが溶解され、従って原料
ガス中に不純物ガスや微粒子等があっても原水中に混入
することがない。また原料ガスの供給流量を調整するこ
とによって溶液濃度を任意に容易に変えることができる
Function: In the device of the present invention configured as described above, the raw material gas is dissolved in the raw water through the hydrophobic porous membrane, so that even if there are impurity gases or fine particles in the raw water, they will not be mixed into the raw water. There is no. Further, the solution concentration can be easily changed arbitrarily by adjusting the supply flow rate of the raw material gas.

実施例 以下添附図面を参照して本発明の一実施例について説明
する。
Embodiment Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings.

図面には本発明の一実施例による装置の構成を概略的に
示し、lは原水(例えば超純水)の入口/aと生成され
た溶液の出口/bとを備えた容器でおり、この容器l内
にその長手方向に沿ってほぼ中心軸線上に中空の疎水性
多孔質膜コが配置され、その一端に原料ガス入口部3が
また他端に不純物出口部≠がそれぞれ取付けられている
。原料ガス入口部3は適当な流量調節手段(図示してな
い)を介して図示してない原料ガス供給源に連結される
。中空の疎水性多孔質膜コとしては好ましくは例えばホ
ローファイバ型の膜部材が用いられ得る。
The drawing schematically shows the configuration of an apparatus according to an embodiment of the present invention, where l is a container equipped with an inlet /a for raw water (for example, ultrapure water) and an outlet /b for the produced solution; A hollow hydrophobic porous membrane is arranged approximately on the central axis along the longitudinal direction of the container L, and a raw material gas inlet 3 is attached to one end of the membrane, and an impurity outlet ≠ is attached to the other end. . The raw material gas inlet 3 is connected to a raw material gas supply source (not shown) via a suitable flow rate regulating means (not shown). As the hollow hydrophobic porous membrane, for example, a hollow fiber type membrane member can preferably be used.

このように構成した装置の動作において、超純水とアン
モニアガスを用いて高純度のアンモニア水を作る場合に
ついて説明すると、アンモニアガスはガス〆ンベよシ適
当な圧力を減圧し、そして流量調整弁等で流量調整され
た状態で入口部3を通って疎水性多孔質膜λ内へ供給さ
れる。一方容器lの入口/aから供給される超純水の圧
力はアンモニアガスの圧力に等しいか或いはそれよシ高
くされているので供給されたアンモニアガスは実質的に
膜λ内の通路を通って出口部≠に向って流   1れる
。その除膜コを浸透して内部に入ってくる超純水中にア
ンモニアガスが溶解する。この場合アンモニアガスの流
量および透過性の膜コの面積を適当に選択することによ
ってアンモニアはほとんど全て水に市解し、不純物出口
部≠よシ出てくるのは極く僅かである。
In the operation of the device configured as described above, when producing high-purity ammonia water using ultrapure water and ammonia gas, the ammonia gas is produced by reducing the appropriate pressure in the gas tank, and then using the flow rate regulating valve. The water is supplied into the hydrophobic porous membrane λ through the inlet portion 3 in a state where the flow rate is adjusted by the above methods. On the other hand, since the pressure of the ultrapure water supplied from the inlet/a of the container l is equal to or higher than the pressure of the ammonia gas, the supplied ammonia gas substantially passes through the passage within the membrane λ. Flows toward the outlet ≠. Ammonia gas dissolves in the ultrapure water that permeates through the membrane remover and enters the interior. In this case, by appropriately selecting the flow rate of ammonia gas and the area of the permeable membrane, almost all of the ammonia is dissolved into water, and only a small amount comes out from the impurity outlet.

下表にアンモニアガスおよび超純水流量とアンモニア水
濃度との例を示す。
The table below shows examples of ammonia gas and ultrapure water flow rates and ammonia water concentrations.

なお図示実施列は単に例示のためのものであシ、超純水
の供給される容器およびその中に挿置される込過性膜の
形状2よび構成については必要に応じて種々変形または
変更することができる。
Note that the illustrated embodiments are merely for illustration purposes, and the shape 2 and configuration of the container to which ultrapure water is supplied and the permeable membrane inserted therein may be variously modified or changed as necessary. can do.

効   果 以上説明してきたように、本発明によれば、原水に原料
ガスを吹き込1ずに疎水性多孔質膜を介して原料ガスを
原水中に溶解させるように構成しているので、原料ガス
中に不純物や微粒子等が含まれていてもそれらが溶液中
に混入することがなく、また不純物ガスが含まれていて
も水に溶解していかないので泡として残ることがなく、
従って高純度の水浴液を得ることができる。また原料ガ
スの流量を調整することによって所望の濃度の溶液を容
易に作ることができる。
Effects As explained above, according to the present invention, the raw material gas is dissolved in the raw water through the hydrophobic porous membrane without blowing the raw material gas into the raw water. Even if the gas contains impurities or fine particles, they will not be mixed into the solution, and even if impurity gas is contained, it will not dissolve in the water and will not remain as bubbles.
Therefore, a highly purified water bath liquid can be obtained. Furthermore, a solution with a desired concentration can be easily prepared by adjusting the flow rate of the raw material gas.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本発明の一実施例を示す部分断面図である。 図中、l:容器、la:原水の入口、lb:両液の出口
、2:疎水性多孔質膜。
The drawing is a partial sectional view showing an embodiment of the present invention. In the figure, l: container, la: inlet of raw water, lb: outlet of both liquids, 2: hydrophobic porous membrane.

Claims (1)

【特許請求の範囲】[Claims] 所要の溶液を作るための原水の入口と溶液の出口とを備
えた容器内に疎水性多孔質膜を設け、この疎水性多孔質
膜を介して原料の水溶性ガスを原水中に溶解させるに際
し原水の圧力が原料として供給される水溶性ガスの圧力
に等しいかそれより高くなるように構成したことを特徴
とする水溶性ガスの高純度溶液の製造装置。
A hydrophobic porous membrane is provided in a container equipped with an inlet for raw water and an outlet for the solution to create the required solution, and when the water-soluble gas as the raw material is dissolved in the raw water through this hydrophobic porous membrane. 1. An apparatus for producing a high-purity solution of a water-soluble gas, characterized in that the pressure of raw water is equal to or higher than the pressure of the water-soluble gas supplied as a raw material.
JP12198484A 1984-06-15 1984-06-15 Manufacturing apparatus of high-purity solution of water-soluble gas Granted JPS614528A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12198484A JPS614528A (en) 1984-06-15 1984-06-15 Manufacturing apparatus of high-purity solution of water-soluble gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12198484A JPS614528A (en) 1984-06-15 1984-06-15 Manufacturing apparatus of high-purity solution of water-soluble gas

Publications (2)

Publication Number Publication Date
JPS614528A true JPS614528A (en) 1986-01-10
JPS6244964B2 JPS6244964B2 (en) 1987-09-24

Family

ID=14824684

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12198484A Granted JPS614528A (en) 1984-06-15 1984-06-15 Manufacturing apparatus of high-purity solution of water-soluble gas

Country Status (1)

Country Link
JP (1) JPS614528A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63302926A (en) * 1987-05-30 1988-12-09 Eruma:Kk Device for replacing dissolved gas in liquid
JPH03293092A (en) * 1990-04-10 1991-12-24 Ebara Res Co Ltd Method for removing dissolved oxygen in water
WO1994020207A1 (en) * 1993-03-02 1994-09-15 Sri International Exothermic process with porous means to control reaction rate and exothermic heat
US5399188A (en) * 1993-12-01 1995-03-21 Gas Research Institute Organic emissions elimination apparatus and process for same
US7192609B2 (en) 2001-04-23 2007-03-20 Shire International Licensing B.V. Use of rare earth compounds for the prevention of kidney stone disease
JP2016077987A (en) * 2014-10-20 2016-05-16 株式会社ドクターズ・マン Hydrogen water feeding device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS551816A (en) * 1978-06-15 1980-01-09 Mitsubishi Rayon Co Ltd Vapor-liquid contactor
JPS5786623U (en) * 1980-11-17 1982-05-28

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS551816A (en) * 1978-06-15 1980-01-09 Mitsubishi Rayon Co Ltd Vapor-liquid contactor
JPS5786623U (en) * 1980-11-17 1982-05-28

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63302926A (en) * 1987-05-30 1988-12-09 Eruma:Kk Device for replacing dissolved gas in liquid
JPH03293092A (en) * 1990-04-10 1991-12-24 Ebara Res Co Ltd Method for removing dissolved oxygen in water
WO1994020207A1 (en) * 1993-03-02 1994-09-15 Sri International Exothermic process with porous means to control reaction rate and exothermic heat
US5583240A (en) * 1993-03-02 1996-12-10 Sri International Exothermic process with porous means to control reaction rate and exothermic heat
US5936106A (en) * 1993-03-02 1999-08-10 Sri International Process with porous means to control reaction rate and heat
US5399188A (en) * 1993-12-01 1995-03-21 Gas Research Institute Organic emissions elimination apparatus and process for same
US7192609B2 (en) 2001-04-23 2007-03-20 Shire International Licensing B.V. Use of rare earth compounds for the prevention of kidney stone disease
JP2016077987A (en) * 2014-10-20 2016-05-16 株式会社ドクターズ・マン Hydrogen water feeding device

Also Published As

Publication number Publication date
JPS6244964B2 (en) 1987-09-24

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