JPS6141255U - mask protection device - Google Patents
mask protection deviceInfo
- Publication number
- JPS6141255U JPS6141255U JP1984125270U JP12527084U JPS6141255U JP S6141255 U JPS6141255 U JP S6141255U JP 1984125270 U JP1984125270 U JP 1984125270U JP 12527084 U JP12527084 U JP 12527084U JP S6141255 U JPS6141255 U JP S6141255U
- Authority
- JP
- Japan
- Prior art keywords
- protection device
- frame member
- mask
- mask protection
- filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は本考案にかかるペリクルの第1実施例を示す斜
視図、第2図は第1図の装置の■一■線に沿った断面図
、第3図は本考案の第2実施例を示す分解斜視図、第4
図は本考案の第3実施例を示す斜視図、第5図は第4図
の装置の■一■線に沿った断面図、第6図は第4実施例
を示す断面図であ−る。
〔主要部分の符号の説明〕、100・・・ガラス基板、
102・・・パターン領域、104,204,304・
・・ペリクル、108,208,308・・・フレーム
、110,210,310・・・薄膜、116,216
,316・・・通気孔、118.218・・・拡径部、
120・・・段部、122,322・・・フィルタ。Fig. 1 is a perspective view showing a first embodiment of the pellicle according to the present invention, Fig. 2 is a sectional view of the device shown in Fig. 1 taken along line 1, and Fig. 3 is a second embodiment of the present invention. 4th exploded perspective view showing
The figure is a perspective view showing a third embodiment of the present invention, FIG. 5 is a sectional view of the device shown in FIG. . [Explanation of symbols of main parts], 100... glass substrate,
102... pattern area, 104, 204, 304...
...Pericle, 108,208,308...Frame, 110,210,310...Thin film, 116,216
, 316...Vent hole, 118.218... Expanded diameter part,
120...Step part, 122, 322...Filter.
Claims (4)
一方の縁部が該マスク基板上に当接するとともに、マス
ク基板の表面に対して一定の間隔を有するように枠部材
の他方の縁部に膜手段が張設されたマスク保護装置にお
いて、 前記枠部材には少なくとも1つの通気孔が形成され、該
通気孔には塵埃等の通過を阻止するフィルタ部材が設け
られていることを特徴とするマスク保護装置。(1) One edge of the frame member is in contact with the mask substrate so as to include the pattern area of the mask substrate, and the other edge of the frame member is in contact with the mask substrate at a constant distance from the surface of the mask substrate. In the mask protection device in which a membrane means is stretched over the frame member, at least one ventilation hole is formed in the frame member, and the ventilation hole is provided with a filter member that prevents passage of dust and the like. mask protection equipment.
きな形状を有する実用新案登録請求の範囲第1項記載の
マスク保護装置。(2) The mask protection device according to claim 1, wherein the filter member has a larger shape than the cross section of the ventilation hole.
取付けられる実用新案登録請求の範囲第1項又は第2項
記栽のマスク保護装置。(3) The filter member is arranged from the outside of the frame member to -
A mask protection device according to claim 1 or 2 of the claimed utility model registration.
ように取付けられる実用新案登録請求の範囲第1項ない
し第3項のいずれかに記載のマスク保護装置。 .(4) The mask protection device according to any one of claims 1 to 3, wherein the filter is embedded in the frame member. ..
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1984125270U JPS6141255U (en) | 1984-08-20 | 1984-08-20 | mask protection device |
US07/136,427 US4833051A (en) | 1984-08-20 | 1987-12-17 | Protective device for photographic masks |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1984125270U JPS6141255U (en) | 1984-08-20 | 1984-08-20 | mask protection device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6141255U true JPS6141255U (en) | 1986-03-15 |
JPS6339703Y2 JPS6339703Y2 (en) | 1988-10-18 |
Family
ID=30683958
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1984125270U Granted JPS6141255U (en) | 1984-08-20 | 1984-08-20 | mask protection device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6141255U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004354720A (en) * | 2003-05-29 | 2004-12-16 | Semiconductor Leading Edge Technologies Inc | Pellicle for mask |
KR100746864B1 (en) * | 1999-11-08 | 2007-08-07 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Framed pellicle for protection of photolithographic photomask |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006301525A (en) * | 2005-04-25 | 2006-11-02 | Shin Etsu Chem Co Ltd | Pellicle frame |
JP5047232B2 (en) | 2009-06-26 | 2012-10-10 | 信越化学工業株式会社 | Pellicle |
SG11201701805QA (en) | 2014-09-19 | 2017-04-27 | Mitsui Chemicals Inc | Pellicle, production method thereof, exposure method |
JP6367342B2 (en) | 2014-09-19 | 2018-08-01 | 三井化学株式会社 | Pellicle, pellicle manufacturing method, and exposure method using pellicle |
-
1984
- 1984-08-20 JP JP1984125270U patent/JPS6141255U/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100746864B1 (en) * | 1999-11-08 | 2007-08-07 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Framed pellicle for protection of photolithographic photomask |
JP2004354720A (en) * | 2003-05-29 | 2004-12-16 | Semiconductor Leading Edge Technologies Inc | Pellicle for mask |
Also Published As
Publication number | Publication date |
---|---|
JPS6339703Y2 (en) | 1988-10-18 |
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