JP2004354720A - Pellicle for mask - Google Patents

Pellicle for mask Download PDF

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Publication number
JP2004354720A
JP2004354720A JP2003152629A JP2003152629A JP2004354720A JP 2004354720 A JP2004354720 A JP 2004354720A JP 2003152629 A JP2003152629 A JP 2003152629A JP 2003152629 A JP2003152629 A JP 2003152629A JP 2004354720 A JP2004354720 A JP 2004354720A
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JP
Japan
Prior art keywords
pellicle
pellicle frame
mask
frame
inert gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003152629A
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Japanese (ja)
Inventor
Yoshiyuki Tanaka
義之 田中
Keiji Tanaka
啓司 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Leading Edge Technologies Inc
Original Assignee
Semiconductor Leading Edge Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Leading Edge Technologies Inc filed Critical Semiconductor Leading Edge Technologies Inc
Priority to JP2003152629A priority Critical patent/JP2004354720A/en
Priority to KR1020040038005A priority patent/KR20040103384A/en
Publication of JP2004354720A publication Critical patent/JP2004354720A/en
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Abstract

<P>PROBLEM TO BE SOLVED: To make easily replacable inert gas in a corner part of a pellicle frame and to make efficiently replacable inert gas in the pellicle in a short time. <P>SOLUTION: A pellicle plate is adhered to the upper end face of a square pellicle frame, and the pellicle frame is provided with an aeration part near each of four corners to connect the inside and the outside of the pellicle. The aeration part is preferably an aeration hole formed in the pellicle frame or is preferably a notch formed in the pellicle frame. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

【０００１】
【発明の属する技術分野】
この発明は、四角形のペリクル枠の上端面にペリクル板を接着したマスク用ペリクルに関する。
【０００２】
【従来の技術】
ＬＳＩなどの半導体装置の製造における露光パターンニングの際に、パターンが形成されたマスクを介して半導体基板に対してレーザ光の照射が行われる。従って、パターニングの精度は、マスクパターンの精度に依存することが多い。
【０００３】
しかし、マスクのパターン形成面にゴミなどが付着すると、半導体基板上に形成されるパターン像が所定のものから変形したものとなる。このような不都合の発生を防止するために、マスクのパターン形成面には、ペリクルが設けられる。
【０００４】
このペリクルは、フォトマスクのパターン形成面上において、パターンの周囲に配置された所望の高さのペリクル枠と、このペリクル枠の上端面にマスクパターン形成面とほぼ平行に接合されたペリクル膜を有する。
【０００５】
ところで、波長１５７ｎｍのレーザ光を用いて露光パターニングを実施した場合、大気中の酸素や水分によって光が吸収を受けるため、露光光路を窒素又はヘリウム等の不活性ガスで満たし、酸素や水分を１ｐｐｍ以下にする必要がある。そして、ペリクルとレチクル間においても、同様の雰囲気が必要であり、側面に通気孔と排気孔を設けたペリクルが提案されている（例えば、特許文献１、特許文献２及び特許文献３参照）。
【０００６】
【特許文献１】
特開平９−１９７６５２号公報（第３頁、第１−３図）
【特許文献２】
特開２００１−１３３９６０号公報（第３−４頁、第１図）
【特許文献３】
特開２００１−１３３９６１号公報（第３−４頁、第１図）
【０００７】
【発明が解決しようとする課題】
しかし、従来のペリクルは、コーナー部において不活性ガスの置換がされにくく、ペリクル内を不活性ガスで置換するために時間がかかり、置換の効率が悪いという問題があった。
【０００８】
この発明は、このような課題を解決するためになされたもので、その目的は、ペリクル枠のコーナー部における不活性ガスを置換されやすくし、短時間で効率よくペリクル内を不活性ガスで置換することができるペリクルを得るものである。
【０００９】
【課題を解決するための手段】
この発明に係るマスク用ペリクルは、四角形のペリクル枠の上端面にペリクル板を接着し、ペリクル枠の四隅近傍に、それぞれ、ペリクルの内部と外部を連通する通気部が設けられている。この発明のその他の特徴は以下に明らかにする。
【００１０】
【発明の実施の形態】
実施の形態１．
図１はこの発明の実施の形態１におけるマスク用ペリクルを示す図である。図示は省略するが、平行平板からなるマスク１１の上端面には、クロム膜などにより所望のマスクパターンが形成されている。
【００１１】
そして、マスク１１の上端面には、マスクパターンを囲むように配置された四角形のペリクル枠１２の下端面が、接着剤層を介して接合されている。さらに、ペリクル枠１２の上端面に、透光性薄板であるペリクル板１３が取り付けられている。このペリクル枠１２とペリクル板１３により、マスク用ペリクルが構成される。
【００１２】
そして、ペリクル枠１２の四隅近傍に、それぞれ、ペリクルの内部と外部を連通する通気部である通気孔１４が設けられている。この通気孔１４は、排気効率とペリクル枠１２の強度を考慮し、直径０．１〜０．５ｍｍの円形の孔として設けられている。
【００１３】
これにより、波長１５７ｎｍのレーザ光を用いた露光パターニングを行う前に、露光光路を窒素又はヘリウム等の不活性ガスで満たす際、ペリクル枠のコーナー部における不活性ガスを置換されやすくし、短時間で効率よくペリクル内を不活性ガスで置換することができる。
【００１４】
なお、上記の例では、通気孔１４は、ペリクル枠１２の四辺のそれぞれに一つずつ形成されている。しかし、これに限らず、ペリクル枠１２の短辺に通気孔を設けず、長辺の両端にそれぞれ一つずつ通気孔を設けてもよい。また、ペリクル枠１２の四辺のそれぞれの両端に一つずつ通気孔を設けてもよい。そして、ペリクル枠１２の四隅近傍に、それぞれ、二つ以上の通気孔を設けてもよい。
【００１５】
また、通気孔の直径や形状は上記の例に限られず、必要に応じて、適宜設定できる。そして、通気孔に、異物を捕集するフィルターを設けてもよい。
【００１６】
実施の形態２．
図２はこの発明の実施の形態２におけるマスク用ペリクルを示す図である。図１と同じ構成要素には同じ番号を付し、説明は省略する。この実施の形態２のマスク用ペリクルは、実施の形態１と同様に、四角形のペリクル枠２１の上端面にペリクル板１３を接着したマスク用ペリクルにおいて、ペリクル枠２１の四隅近傍に、それぞれ、ペリクルの内部と外部を連通する通気部が設けられている。
【００１７】
ただし、この通気部は、実施の形態１とは異なり、ペリクル枠２１に設けられた切り欠き２２である。この切り欠き２２は、ペリクル枠２１を金型でプレス加工する際に同時に形成することができる。
【００１８】
よって、実施の形態２は、実施の形態１と同様の効果を有する他、通気部を形成するための追加の製造工程を必要としないという利点もある。
【００１９】
実施の形態３．
図３はこの発明の実施の形態３におけるマスク用ペリクルを示す図である。図１と同じ構成要素には同じ番号を付し、説明は省略する。図３に示すように、実施の形態３のマスク用ペリクルは、実施の形態１と同様に、四角形のペリクル枠３１の上端面にペリクル板１３を接着したマスク用ペリクルにおいて、ペリクル枠３１の四隅近傍に、それぞれ、ペリクルの内部と外部を連通する通気部が設けられている。
【００２０】
ただし、この通気部は、実施の形態１とは異なり、ペリクル枠３１の四隅に補強の為に設けられている補強部材３２に形成された通気孔３３である。このように補強部材３２を設けたことにより、通気孔３３をペリクル枠３１の四隅に形成することができる。これにより、実施の形態３は、実施の形態１よりもペリクル枠のコーナー部における不活性ガスを置換されやすくし、更に短時間で効率よくペリクル内を不活性ガスで置換することができる。
【００２１】
実施の形態４．
図４はこの発明の実施の形態４におけるマスク用ペリクルを示す図である。図１と同じ構成要素には同じ番号を付し、説明は省略する。図４（ａ）に示すように、実施の形態４のマスク用ペリクルは、実施の形態１と同様に、四角形のペリクル枠４１の上端面にペリクル板１３を接着したマスク用ペリクルにおいて、ペリクル枠４１の四隅近傍に、それぞれ、ペリクルの内部と外部を連通する通気部が設けられている。
【００２２】
ただし、この通気部は、実施の形態１とは異なり、ペリクル枠４１の四隅に補強の為に設けられている補強部材４２に形成された通気孔４３である。
【００２３】
ここで、図４（ａ）のＡ−Ｂでの断面図を図４（ｂ）に示す。この図に示すように、マスク１１の上端面に、補強部材４２の下端面が接着剤層４４を介して接合されている。そして、通気孔４３は、補強部材４２の上端面からペリクル枠４１の内側側面へ開通している。
【００２４】
このように補強部材４２を設けたことにより、通気孔４３をペリクル枠４１の四隅に形成することができる。これにより、実施の形態４は、実施の形態３と同様の効果を有する。
【００２５】
【発明の効果】
この発明は以上説明したように、ペリクル枠のコーナー部における不活性ガスを置換されやすくし、短時間で効率よくペリクル内を不活性ガスで置換することができる。
【図面の簡単な説明】
【図１】この発明の実施の形態１におけるマスク用ペリクルを示す図である。
【図２】この発明の実施の形態２におけるマスク用ペリクルを示す図である。
【図３】この発明の実施の形態３におけるマスク用ペリクルを示す図である。
【図４】この発明の実施の形態４におけるマスク用ペリクルを示す図である。
【符号の説明】
１１ マスク
１２ ペリクル枠
１３ ペリクル板
１４ 通気孔（通気部）
２１ ペリクル枠
２２ 切り欠き（通気部）
３１ ペリクル枠
３３ 通気孔（通気部）
４１ ペリクル枠
４３ 通気孔（通気部）[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a pellicle for a mask in which a pellicle plate is adhered to an upper end surface of a rectangular pellicle frame.
[0002]
[Prior art]
At the time of exposure patterning in the manufacture of a semiconductor device such as an LSI, a semiconductor substrate is irradiated with laser light via a mask on which a pattern is formed. Therefore, the patterning accuracy often depends on the mask pattern accuracy.
[0003]
However, when dust or the like adheres to the pattern forming surface of the mask, the pattern image formed on the semiconductor substrate is deformed from a predetermined one. In order to prevent such inconvenience, a pellicle is provided on the pattern forming surface of the mask.
[0004]
The pellicle has a pellicle frame of a desired height arranged around the pattern on the pattern forming surface of the photomask, and a pellicle film joined to the upper end surface of the pellicle frame substantially parallel to the mask pattern forming surface. Have.
[0005]
When exposure patterning is performed using a laser beam having a wavelength of 157 nm, light is absorbed by oxygen and moisture in the atmosphere. Therefore, the exposure optical path is filled with an inert gas such as nitrogen or helium, and the oxygen or moisture is 1 ppm. It must be: Further, a similar atmosphere is required between the pellicle and the reticle, and pellicles provided with vent holes and exhaust holes on side surfaces have been proposed (for example, see Patent Literature 1, Patent Literature 2, and Patent Literature 3).
[0006]
[Patent Document 1]
JP-A-9-197652 (page 3, FIG. 1-3)
[Patent Document 2]
JP 2001-133960 A (Page 3-4, FIG. 1)
[Patent Document 3]
JP 2001-133961 A (Page 3-4, FIG. 1)
[0007]
[Problems to be solved by the invention]
However, the conventional pellicle has a problem that the inert gas is hardly replaced in the corner portion, it takes time to replace the inside of the pellicle with the inert gas, and the efficiency of the replacement is poor.
[0008]
The present invention has been made to solve such a problem, and an object of the present invention is to facilitate replacement of an inert gas at a corner portion of a pellicle frame, and to efficiently and efficiently replace the inside of a pellicle with an inert gas in a short time. Is to get a pellicle that can do it.
[0009]
[Means for Solving the Problems]
In the pellicle for a mask according to the present invention, a pellicle plate is adhered to the upper end surface of a rectangular pellicle frame, and near the four corners of the pellicle frame, ventilation portions are provided for communicating the inside and the outside of the pellicle. Other features of the present invention will be clarified below.
[0010]
BEST MODE FOR CARRYING OUT THE INVENTION
Embodiment 1 FIG.
FIG. 1 is a diagram showing a mask pellicle according to Embodiment 1 of the present invention. Although not shown, a desired mask pattern such as a chromium film is formed on the upper end surface of the mask 11 made of a parallel plate.
[0011]
The lower end surface of a rectangular pellicle frame 12 arranged to surround the mask pattern is joined to the upper end surface of the mask 11 via an adhesive layer. Further, a pellicle plate 13 which is a light-transmitting thin plate is attached to an upper end surface of the pellicle frame 12. The pellicle frame 12 and the pellicle plate 13 form a pellicle for a mask.
[0012]
In the vicinity of the four corners of the pellicle frame 12, ventilation holes 14, which are ventilation portions that communicate the inside and outside of the pellicle, are provided. The vent hole 14 is provided as a circular hole having a diameter of 0.1 to 0.5 mm in consideration of the exhaust efficiency and the strength of the pellicle frame 12.
[0013]
This makes it easier to replace the inert gas at the corners of the pellicle frame when filling the exposure optical path with an inert gas such as nitrogen or helium before performing the exposure patterning using the laser light having a wavelength of 157 nm. Thus, the inside of the pellicle can be efficiently replaced with an inert gas.
[0014]
In the above example, one vent hole 14 is formed on each of the four sides of the pellicle frame 12. However, the present invention is not limited to this, and the ventilation holes may not be provided on the short side of the pellicle frame 12, but may be provided on both ends of the long side. Further, one vent hole may be provided at each end of each of the four sides of the pellicle frame 12. Two or more air holes may be provided near the four corners of the pellicle frame 12, respectively.
[0015]
Further, the diameter and shape of the ventilation hole are not limited to the above example, and can be appropriately set as needed. Then, a filter for collecting foreign matter may be provided in the ventilation hole.
[0016]
Embodiment 2 FIG.
FIG. 2 is a diagram showing a mask pellicle according to a second embodiment of the present invention. The same components as those in FIG. 1 are denoted by the same reference numerals, and description thereof will be omitted. The pellicle for mask of the second embodiment is similar to that of the first embodiment. Is provided with a ventilation portion communicating the inside and the outside of the inside.
[0017]
However, unlike the first embodiment, the ventilation portion is a notch 22 provided in the pellicle frame 21. The notch 22 can be formed at the same time when the pellicle frame 21 is pressed with a die.
[0018]
Therefore, the second embodiment has the same effect as the first embodiment, and also has an advantage that an additional manufacturing step for forming the ventilation portion is not required.
[0019]
Embodiment 3 FIG.
FIG. 3 is a diagram showing a mask pellicle according to Embodiment 3 of the present invention. The same components as those in FIG. 1 are denoted by the same reference numerals, and description thereof will be omitted. As shown in FIG. 3, the pellicle for a mask according to the third embodiment is similar to the pellicle according to the first embodiment in that the pellicle plate 13 is adhered to the upper end surface of a rectangular pellicle frame 31. In the vicinity, a ventilation portion is provided for communicating the inside and the outside of the pellicle, respectively.
[0020]
However, unlike the first embodiment, the ventilation portions are ventilation holes 33 formed in reinforcing members 32 provided at four corners of the pellicle frame 31 for reinforcement. By providing the reinforcing member 32 in this manner, the ventilation holes 33 can be formed at the four corners of the pellicle frame 31. Thus, in the third embodiment, the inert gas at the corners of the pellicle frame is more easily replaced than in the first embodiment, and the inside of the pellicle can be efficiently replaced with the inert gas in a shorter time.
[0021]
Embodiment 4 FIG.
FIG. 4 is a diagram showing a pellicle for a mask according to a fourth embodiment of the present invention. The same components as those in FIG. 1 are denoted by the same reference numerals, and description thereof will be omitted. As shown in FIG. 4A, the pellicle for a mask according to the fourth embodiment is a pellicle frame for a mask in which a pellicle plate 13 is adhered to the upper end surface of a rectangular pellicle frame 41 as in the first embodiment. In the vicinity of the four corners of 41, ventilation portions are provided to communicate the inside and outside of the pellicle.
[0022]
However, unlike the first embodiment, the ventilation portions are ventilation holes 43 formed in reinforcing members 42 provided at four corners of the pellicle frame 41 for reinforcement.
[0023]
Here, FIG. 4B is a cross-sectional view taken along a line AB in FIG. As shown in this figure, the lower end surface of the reinforcing member 42 is joined to the upper end surface of the mask 11 via an adhesive layer 44. The ventilation hole 43 opens from the upper end surface of the reinforcing member 42 to the inner side surface of the pellicle frame 41.
[0024]
By providing the reinforcing member 42 in this manner, the ventilation holes 43 can be formed at the four corners of the pellicle frame 41. Thus, the fourth embodiment has the same effect as the third embodiment.
[0025]
【The invention's effect】
According to the present invention, as described above, the inert gas at the corner of the pellicle frame is easily replaced, and the inside of the pellicle can be efficiently replaced with the inert gas in a short time.
[Brief description of the drawings]
FIG. 1 is a diagram showing a mask pellicle according to a first embodiment of the present invention.
FIG. 2 is a diagram showing a mask pellicle according to a second embodiment of the present invention.
FIG. 3 is a diagram showing a mask pellicle according to a third embodiment of the present invention.
FIG. 4 is a diagram showing a mask pellicle according to a fourth embodiment of the present invention.
[Explanation of symbols]
11 Mask 12 Pellicle frame 13 Pellicle plate 14 Vent (vent)
21 Pellicle frame 22 Notch (vent)
31 Pellicle frame 33 Vent (vent)
41 Pellicle frame 43 Vent (vent)

Claims (3)

四角形のペリクル枠の上端面にペリクル板を接着したマスク用ペリクルにおいて、前記ペリクル枠の四隅近傍に、それぞれ、ペリクルの内部と外部を連通する通気部が設けられていることを特徴とするマスク用ペリクル。In a pellicle for a mask in which a pellicle plate is adhered to an upper end surface of a rectangular pellicle frame, near the four corners of the pellicle frame, a ventilation portion communicating between the inside and the outside of the pellicle is provided. Pellicle. 前記通気部は、前記ペリクル枠に設けられた通気孔であることを特徴とする請求項１記載のマスク用ペリクル。The pellicle for a mask according to claim 1, wherein the ventilation part is a ventilation hole provided in the pellicle frame. 前記通気部は、前記ペリクル枠に設けられた切り欠きであることを特徴とする請求項１記載のマスク用ペリクル。The pellicle for a mask according to claim 1, wherein the ventilation portion is a notch provided in the pellicle frame.
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