JPS6139377B2 - - Google Patents
Info
- Publication number
- JPS6139377B2 JPS6139377B2 JP53125955A JP12595578A JPS6139377B2 JP S6139377 B2 JPS6139377 B2 JP S6139377B2 JP 53125955 A JP53125955 A JP 53125955A JP 12595578 A JP12595578 A JP 12595578A JP S6139377 B2 JPS6139377 B2 JP S6139377B2
- Authority
- JP
- Japan
- Prior art keywords
- laser
- sample
- pulse
- pulsed laser
- scanning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000003287 optical effect Effects 0.000 claims description 14
- 238000004381 surface treatment Methods 0.000 claims description 10
- 230000010355 oscillation Effects 0.000 description 6
- 239000012535 impurity Substances 0.000 description 5
- 230000008018 melting Effects 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 239000002344 surface layer Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 208000032544 Cicatrix Diseases 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005224 laser annealing Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 231100000241 scar Toxicity 0.000 description 1
- 230000037387 scars Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
- B23K26/356—Working by laser beam, e.g. welding, cutting or boring for surface treatment by shock processing
Description
【発明の詳細な説明】
この発明はパルスレーザを用いて物体の表面処
理装置を行なう装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for surface treating an object using a pulsed laser.
従来から使用されているパルスレーザを用いた
表面処理装置では、レーザパルスをスポツト状に
集光して物体に照射し、レーザアニーリング(除
歪)、レーザハードニング(焼き入れ)を行つて
いる。 In conventional surface treatment apparatuses using pulsed lasers, laser pulses are focused into a spot and irradiated onto an object to perform laser annealing (distortion removal) and laser hardening (hardening).
しかし、パルスレーザは一般に発振の繰り返し
が遠くないので、試料を移動させると、表面処理
された部分が跡切れし、表面上の処理されたスポ
ツト間に連続性がなくなるという欠点がある。 However, since pulsed lasers generally repeat their oscillations over a short period of time, they have the disadvantage that when the sample is moved, traces of the surface-treated portion are cut off, and there is no continuity between the treated spots on the surface.
一方、連続発振レーザを用いれば、少なくとも
連続的な走査は可能となるが、一般に連続発振レ
ーザはレーザ出力が少ないので、熱伝導度のよい
金属や半導体表面上の一部を溶融状態にいたらし
めるには困難である。 On the other hand, if continuous wave lasers are used, at least continuous scanning is possible, but since continuous wave lasers generally have a low laser output, they can melt parts of the surface of metals or semiconductors with good thermal conductivity. It is difficult to
この発明の目的は上記の欠点を除去し、熱伝導
度のよい物体試料の表面上スポツト状に溶融させ
ながら連続的に走査できるパルスレーザを用いた
表面処理装置を提供することにある。 SUMMARY OF THE INVENTION An object of the present invention is to eliminate the above-mentioned drawbacks and to provide a surface treatment apparatus using a pulsed laser that can continuously scan while melting spots on the surface of an object sample having good thermal conductivity.
この発明によればパルスレーザと光偏向器と集
光光学系と試料微動載物台とを備え、集光光学系
により試料表面上にレーザビームをスポツト状に
集光し、単一のレーザパルスが持続している間に
光偏向器を用いてレーザビームを偏光し、試料表
面をスポツト状に溶融しながら線状に走査し、か
つ引続くレーザパルス発振時においても試料表面
をスポツト状に溶融しながら該走査線上を同一方
向に複数回重複して走査することを特徴とするパ
ルスレーザを用いた表面処理装置が得られる。 According to this invention, a pulsed laser, an optical deflector, a focusing optical system, and a sample fine movement stage are provided. While this continues, the laser beam is polarized using an optical deflector to scan the sample surface in a linear manner while melting it in a spot shape, and during the subsequent laser pulse oscillation, the sample surface is also melted in a spot shape. However, a surface treatment apparatus using a pulsed laser is obtained, which is characterized in that the scanning line is scanned multiple times in the same direction overlappingly.
この発明によれば、試料表面上の歪を方向性を
もたせて一方向に逃がすことができる利点があ
る。さらにこの発明によれば、表面上にある不純
物を溶融させながら一方向に移動させることがで
きるので、表面上の一部をとくに高純度化した
り、あるいは表面上の一部に連続的に不純物の濃
度勾配をもたせることができ、種々の表面デバイ
スに新たなプロセス手段を提供できるという利点
がある。 According to this invention, there is an advantage that the strain on the sample surface can be released in one direction with directionality. Furthermore, according to this invention, impurities on the surface can be melted and moved in one direction, so it is possible to make a part of the surface particularly highly purified, or to continuously remove impurities from part of the surface. The advantage is that concentration gradients can be created, providing new processing tools for various surface devices.
次に、この発明を図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.
図はこの発明のパルスレーザを用いた表面処理
装置の一実施例を示すブロツク図である。 The figure is a block diagram showing an embodiment of a surface treatment apparatus using a pulsed laser according to the present invention.
図において1はパルスレーザ発振器、2はその
電源、3は光偏向器である。 In the figure, 1 is a pulse laser oscillator, 2 is its power source, and 3 is an optical deflector.
パルス発振波形としては矩形状のパルス波形で
あることが望ましいので、電源2においてはパル
ス整形回路図網を用いて励起入力を制御し、矩形
状に近いレーザパルス波形を得ている。パルス幅
としては数マイクロ秒から数十ミリ秒が適当であ
る。光偏向器3は電源2からパルス発振の開始信
号を受け定められた方向に掃引を行なう。光偏向
器3としては高速走査が必要な場合には超音波光
偏向器が、また比較的低速走査でもよい場合には
回転鏡やポリゴンが利用できる。4は集光光学系
で、5の試料表面上でレーザビームを走査したと
きできるだけ収差が少なくなるようにした非球面
レンズを用いている。6は試料の位置および角度
が可変な試料微動載物台である。 Since it is desirable that the pulse oscillation waveform be a rectangular pulse waveform, the power source 2 controls the excitation input using a pulse shaping circuit network to obtain a laser pulse waveform that is close to a rectangular shape. The appropriate pulse width is from several microseconds to several tens of milliseconds. The optical deflector 3 receives a pulse oscillation start signal from the power source 2 and sweeps in a predetermined direction. As the optical deflector 3, an ultrasonic optical deflector can be used when high-speed scanning is required, and a rotating mirror or a polygon can be used when relatively low-speed scanning is sufficient. Reference numeral 4 denotes a condensing optical system, which uses an aspherical lens designed to minimize aberrations when the laser beam scans the surface of the sample 5. Reference numeral 6 denotes a sample fine movement stage whose position and angle of the sample are variable.
光偏向器3として複数個の光偏素子を用いれば
X,Y両方向に偏向可能となるので、これらを同
時に働かせるようにすれば試料面上で任意の方向
に走査できることになる。しかし、偏向方向の制
御は一般には高価なので、必要な走査方向が曲線
でなく直線だけでよいならば、あらかじめ試料微
動台の角度調整を行なうようにして一つの偏向素
子を用い、一方向だけの走査を行なつてもよい。 If a plurality of optical polarizing elements are used as the optical deflector 3, the beam can be deflected in both the X and Y directions, so if they are operated simultaneously, the sample surface can be scanned in any direction. However, controlling the deflection direction is generally expensive, so if the required scanning direction is only a straight line rather than a curved line, it is best to adjust the angle of the sample fine movement table in advance and use one deflection element. Scanning may also be performed.
レーザパルスは試料表面で光吸収され、表層を
瞬時に高温にまで加熱する。レーザパルス出力が
大きすぎると、レーザビームの集光たれたスポツ
ト部で試料表面は蒸発し、レーザ加工してしまう
ので、加えるレーザパルス出力は試料上の被照射
スポツト部が丁度溶融する程度に調整する。 The laser pulse is absorbed by the sample surface, instantly heating the surface layer to a high temperature. If the laser pulse output is too large, the sample surface will evaporate at the focused spot of the laser beam, resulting in laser processing, so adjust the applied laser pulse output just enough to melt the irradiated spot on the sample. do.
単一パルスの発振持続時間中に光偏光器3は定
められた方向に光ビームを走査する。このときの
走査速度は、あまりはやすぎもせず、またおそす
ぎもしない適度の速度に調整される。走査速度が
はやすぎると単一のパルスに照射されて溶融した
線状の領域がパルス照射終了後ほぼ同時に固化し
てしまうため、溶融した領域に含まれる歪とか不
純物などを一方向に移動させることはできない。
これに対し、逆に走査速度がおそすぎると、熱拡
散により表層からより下層にまで熱が移動してし
まうため、表層のみの熱処理が困難となる。従つ
て、丁度、レーザビームが試料表面において一ス
ポツト径程度移動し終えたときに、前の照射され
たスポツト領域が固化をはじめる程度に走査速度
を調整すると表面上に適度の温度勾配が生じるた
め好ましい結果が得られる。 During the oscillation duration of a single pulse, the light polarizer 3 scans the light beam in a defined direction. The scanning speed at this time is adjusted to an appropriate speed that is neither too fast nor too slow. If the scanning speed is too fast, the linear region that is irradiated by a single pulse and melted will solidify almost immediately after the pulse irradiation ends, so the strain and impurities contained in the molten region will move in one direction. It is not possible.
On the other hand, if the scanning speed is too slow, heat will move from the surface layer to lower layers due to thermal diffusion, making it difficult to heat treat only the surface layer. Therefore, if the scanning speed is adjusted to such an extent that the previously irradiated spot area begins to solidify just when the laser beam has finished moving about one spot diameter on the sample surface, an appropriate temperature gradient will be created on the surface. Favorable results are obtained.
単一パルスの照射を終えたら、一旦、試料表面
の被照射域の固化および冷却を持ち、再度またパ
ルス照射を繰り返すことにより非常に効率よく走
査表面上の歪や不純物を一方向に移動することが
できる。 After completing a single pulse irradiation, the irradiated area on the sample surface is solidified and cooled, and then the pulse irradiation is repeated again to move distortions and impurities on the scanning surface in one direction very efficiently. I can do it.
表面処理の適当な試料としてはある程度熱伝導
度がよく融点の低い金属や半導体が適している。
表面処理すべき線状領域の巾が狭いときには、固
化が速く生じるようになるのでそれに応じて走査
速度をはやめるようにする。 Suitable samples for surface treatment include metals and semiconductors that have good thermal conductivity and low melting points.
When the width of the linear area to be surface treated is narrow, solidification occurs quickly, so the scanning speed is reduced accordingly.
以上述べたように、この発明は、従来のパルス
レーザによる表面処理が跡切れや、不連続部分を
生ずるという欠点を、パルスレーザ発振持続時間
にレーザ光を走査することによつて解決したもの
で、この発明によれば、試料表面上にある歪や不
純物を溶融させながら一方向に移動できるパルス
レーザを用いた表面処理装置が得られる。 As described above, the present invention solves the drawbacks of conventional surface treatments using pulsed lasers, such as the generation of scars and discontinuous areas, by scanning the laser beam during the duration of pulsed laser oscillation. According to the present invention, a surface treatment apparatus using a pulsed laser that can move in one direction while melting distortions and impurities on the surface of a sample can be obtained.
図面はこの発明のパルスレーザを用いた表面処
理装置の一実施例を示すブロツク図ある。
1……パルスレーザ発振器、2……電源、3…
…光偏向器、4……集光光学系、5……試料表
面、6……試料微動載物台。
The drawing is a block diagram showing one embodiment of a surface treatment apparatus using a pulsed laser according to the present invention. 1...Pulse laser oscillator, 2...Power supply, 3...
...Light deflector, 4... Condensing optical system, 5... Sample surface, 6... Sample fine movement stage.
Claims (1)
ザ光を偏向する光偏向器と、被照射物体の表面に
レーザビームをスポツト状に集光する集光光学系
とを含むパルスレーザを用いた表面処理装置にお
いて、単一のパルスレーザ出力が持続している間
に前記光偏向器でレーザビームを走査し前記表面
を線状に溶融することを特徴とするパルスレーザ
を用いた表面処理装置。1. A surface treatment device using a pulsed laser, which includes a pulsed laser device, an optical deflector that deflects the laser beam emitted by this device, and a focusing optical system that focuses the laser beam into a spot on the surface of an object to be irradiated. A surface treatment apparatus using a pulsed laser, characterized in that while a single pulsed laser output continues, the laser beam is scanned by the optical deflector to linearly melt the surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12595578A JPS5554290A (en) | 1978-10-12 | 1978-10-12 | Surface treating device using pulse laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12595578A JPS5554290A (en) | 1978-10-12 | 1978-10-12 | Surface treating device using pulse laser |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5554290A JPS5554290A (en) | 1980-04-21 |
JPS6139377B2 true JPS6139377B2 (en) | 1986-09-03 |
Family
ID=14923101
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12595578A Granted JPS5554290A (en) | 1978-10-12 | 1978-10-12 | Surface treating device using pulse laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5554290A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01228742A (en) * | 1988-03-09 | 1989-09-12 | Honda Lock Mfg Co Ltd | Assembly line composed of combined working benches and working bench therefor |
JPH0231683U (en) * | 1988-08-22 | 1990-02-28 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5916923A (en) * | 1982-02-22 | 1984-01-28 | Toyota Motor Corp | Method for hardening surface of metal member by remelting |
JPS62142716A (en) * | 1985-12-17 | 1987-06-26 | Sanyo Electric Co Ltd | Laser beam processing machine |
US7750266B2 (en) | 2004-11-17 | 2010-07-06 | Metal Improvement Company Llc | Active beam delivery system for laser peening and laser peening method |
DE102011106097B4 (en) * | 2011-06-09 | 2017-02-16 | Cero Gmbh | Method and device for machining a workpiece |
-
1978
- 1978-10-12 JP JP12595578A patent/JPS5554290A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01228742A (en) * | 1988-03-09 | 1989-09-12 | Honda Lock Mfg Co Ltd | Assembly line composed of combined working benches and working bench therefor |
JPH0231683U (en) * | 1988-08-22 | 1990-02-28 |
Also Published As
Publication number | Publication date |
---|---|
JPS5554290A (en) | 1980-04-21 |
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