JPS6137616B2 - - Google Patents

Info

Publication number
JPS6137616B2
JPS6137616B2 JP53143737A JP14373778A JPS6137616B2 JP S6137616 B2 JPS6137616 B2 JP S6137616B2 JP 53143737 A JP53143737 A JP 53143737A JP 14373778 A JP14373778 A JP 14373778A JP S6137616 B2 JPS6137616 B2 JP S6137616B2
Authority
JP
Japan
Prior art keywords
silicone
solvent
layer
protective layer
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53143737A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5569145A (en
Inventor
Hiroyuki Obata
Hitoshi Fujii
Minoru Takamizawa
Yoshio Inoe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Dai Nippon Printing Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd, Dai Nippon Printing Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP14373778A priority Critical patent/JPS5569145A/ja
Publication of JPS5569145A publication Critical patent/JPS5569145A/ja
Publication of JPS6137616B2 publication Critical patent/JPS6137616B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP14373778A 1978-11-21 1978-11-21 Production of machine plate for lithographic printing Granted JPS5569145A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14373778A JPS5569145A (en) 1978-11-21 1978-11-21 Production of machine plate for lithographic printing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14373778A JPS5569145A (en) 1978-11-21 1978-11-21 Production of machine plate for lithographic printing

Publications (2)

Publication Number Publication Date
JPS5569145A JPS5569145A (en) 1980-05-24
JPS6137616B2 true JPS6137616B2 (enrdf_load_html_response) 1986-08-25

Family

ID=15345832

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14373778A Granted JPS5569145A (en) 1978-11-21 1978-11-21 Production of machine plate for lithographic printing

Country Status (1)

Country Link
JP (1) JPS5569145A (enrdf_load_html_response)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5034970A (enrdf_load_html_response) * 1973-07-16 1975-04-03
JPS53120905A (en) * 1977-03-29 1978-10-21 Dainippon Printing Co Ltd Method of producing lithographic printing plate
JPS5391803A (en) * 1977-01-18 1978-08-12 Dainippon Printing Co Ltd Method of producing lithographic printing plate

Also Published As

Publication number Publication date
JPS5569145A (en) 1980-05-24

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