JPS6135692B2 - - Google Patents

Info

Publication number
JPS6135692B2
JPS6135692B2 JP59225719A JP22571984A JPS6135692B2 JP S6135692 B2 JPS6135692 B2 JP S6135692B2 JP 59225719 A JP59225719 A JP 59225719A JP 22571984 A JP22571984 A JP 22571984A JP S6135692 B2 JPS6135692 B2 JP S6135692B2
Authority
JP
Japan
Prior art keywords
pattern
semiconductor wafer
mask
photodiode
target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59225719A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60121720A (ja
Inventor
Mitsuyoshi Koizumi
Yasuhiko Hara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59225719A priority Critical patent/JPS60121720A/ja
Publication of JPS60121720A publication Critical patent/JPS60121720A/ja
Publication of JPS6135692B2 publication Critical patent/JPS6135692B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59225719A 1984-10-29 1984-10-29 位置検出方式 Granted JPS60121720A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59225719A JPS60121720A (ja) 1984-10-29 1984-10-29 位置検出方式

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59225719A JPS60121720A (ja) 1984-10-29 1984-10-29 位置検出方式

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP56182282A Division JPS6025896B2 (ja) 1981-11-16 1981-11-16 位置検出方式

Publications (2)

Publication Number Publication Date
JPS60121720A JPS60121720A (ja) 1985-06-29
JPS6135692B2 true JPS6135692B2 (OSRAM) 1986-08-14

Family

ID=16833738

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59225719A Granted JPS60121720A (ja) 1984-10-29 1984-10-29 位置検出方式

Country Status (1)

Country Link
JP (1) JPS60121720A (OSRAM)

Also Published As

Publication number Publication date
JPS60121720A (ja) 1985-06-29

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