JPS6134261B2 - - Google Patents

Info

Publication number
JPS6134261B2
JPS6134261B2 JP51010661A JP1066176A JPS6134261B2 JP S6134261 B2 JPS6134261 B2 JP S6134261B2 JP 51010661 A JP51010661 A JP 51010661A JP 1066176 A JP1066176 A JP 1066176A JP S6134261 B2 JPS6134261 B2 JP S6134261B2
Authority
JP
Japan
Prior art keywords
circuit
output
charge pump
mos
power supply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP51010661A
Other languages
Japanese (ja)
Other versions
JPS5294084A (en
Inventor
Toshio Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP1066176A priority Critical patent/JPS5294084A/en
Publication of JPS5294084A publication Critical patent/JPS5294084A/en
Publication of JPS6134261B2 publication Critical patent/JPS6134261B2/ja
Granted legal-status Critical Current

Links

Description

【発明の詳細な説明】 この発明は単一電源で高速動作を得ることので
きる絶縁ゲート型電界効果トランジスタを用いた
集積回路(MOS−IC)に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an integrated circuit (MOS-IC) using an insulated gate field effect transistor that can achieve high-speed operation with a single power supply.

従来、MOS−ICは共通の半導体基体上に所要
の回路動作を実現する複数の回路素子から成る電
子回路を設け、外部電源の供給により回路機能を
発揮する。動作速度を高速化するため外部電源と
しては+5V,+12V,GND,−2〜−5Vの如く多
数の電源数を要する。しかし乍らMOS−ICの周
辺回路および制御系の電子回路素子は一般に+
5V−GNDの単一電源で統一化されて居り、MOS
−ICの動作のみに電源を増設せしめることは好
ましいものではない。
Conventionally, MOS-ICs have an electronic circuit consisting of a plurality of circuit elements that realize the required circuit operation on a common semiconductor substrate, and perform the circuit function by supplying an external power supply. In order to increase the operating speed, a large number of external power supplies such as +5V, +12V, GND, and -2 to -5V are required. However, the peripheral circuits and control system electronic circuit elements of MOS-IC are generally +
It is unified with a single power supply of 5V-GND, and MOS
-It is not desirable to add a power supply only for IC operation.

これを一部解決する方法は、先願に係る特願昭
48−16325号明細書に示すように、MOS−IC内部
に外部供給以外の電源を発生せしめることであ
り、この先願発明によれば単一の外部電源の供給
でMOS−IC内部に高電圧源を発生せしめること
ができる。しかし乍らMOS−ICの高速動作には
高電圧源の発生による処理信号振巾の増大のみな
らず、PN接合容量を減少するために基体バイア
ス源を確保することも併せて必要である。
A way to partially solve this problem is to
As shown in the specification of No. 48-16325, the purpose is to generate a power source other than an external power source inside a MOS-IC, and according to this prior invention, a high voltage source is generated inside a MOS-IC by supplying a single external power source. can be caused to occur. However, for high-speed operation of a MOS-IC, it is necessary not only to increase the processing signal amplitude by generating a high voltage source, but also to secure a body bias source in order to reduce the PN junction capacitance.

したがつてこの発明の目的は、単一電源で高速
動作を実現するMOS−ICを提供することにあ
る。
Therefore, an object of the present invention is to provide a MOS-IC that achieves high-speed operation with a single power supply.

この発明の他の目的はMOS−ICの内部に基体
バイアス源を収納した集積回路を提供することに
ある。
Another object of the present invention is to provide an integrated circuit in which a body bias source is housed inside a MOS-IC.

この発明によれば、外部電源の供給により所定
の回路機能を実現する絶縁ゲート型電界効果トラ
ンジスタ(MOS−FET)を用いた電子回路を共
通の半導体基体に設けた集積回路において、前記
半導体基体に前記外部電源の供給により発振し、
第1のクロツクおよびこれと逆相の第2のクロツ
クを発生する自励発振回路と、該発振回路の第1
クロツクおよび第2のクロツクを入力としてゲー
ト電極に受ける2個のチヤージポンプ型素子と、
該チヤージポンプ型素子の出力領域を共通化し前
記外部電源および前記電子回路の基準端子、即ち
GNDに導電結合せしめたMOS−ICが得られる。
ここで、MOS−ICの共通の半導体基体は外部電
源との直接の導電結合がなく、チヤージポンプ型
素子の発生電源が基体バイアス源となる。チヤー
ジポンプ型素子としては特願昭48−30820号明細
書に示すようにチヤネル領域中に半導体基体と同
一導電型の高濃度領域を設けた構造が好ましく、
かかる構造によればチヤネル形成の閾値が増大し
ているため基体バイアス源としての効率を一層高
めることができる。
According to the present invention, in an integrated circuit in which an electronic circuit using an insulated gate field effect transistor (MOS-FET) that realizes a predetermined circuit function by supplying an external power supply is provided on a common semiconductor substrate, the semiconductor substrate oscillates due to the supply of the external power,
a self-excited oscillation circuit that generates a first clock and a second clock having an opposite phase;
two charge pump elements whose gate electrodes receive a clock and a second clock as input;
The output range of the charge pump type element is made common to the external power supply and the reference terminal of the electronic circuit, i.e.
A MOS-IC that is conductively coupled to GND is obtained.
Here, the common semiconductor substrate of the MOS-IC has no direct conductive coupling with an external power source, and the power source generated by the charge pump type element serves as the substrate bias source. As a charge pump type element, a structure in which a high concentration region of the same conductivity type as the semiconductor substrate is provided in the channel region as shown in Japanese Patent Application No. 48-30820 is preferable;
According to such a structure, the threshold value for forming a channel is increased, so that the efficiency as a substrate bias source can be further improved.

この発明のMOS−ICは本来の信号処理のため
の回路機能のほかに基体バイアス源を含み、外部
電源の印加で電源の電圧安定性の優れたバイアス
が発生してPN接合容量を減少するため、回路動
作を高速で安定に実行することができる。したが
つて従来の基体バイアス源を外部に求めたMOS
−ICと同様の高速動作を単一電源で実現するこ
とができる。
In addition to the original circuit function for signal processing, the MOS-IC of this invention includes a body bias source, and when an external power supply is applied, a bias with excellent voltage stability is generated in the power supply, reducing the PN junction capacitance. , circuit operations can be executed stably at high speed. Therefore, conventional MOS that requires an external body bias source
- Can achieve high-speed operation similar to IC with a single power supply.

次にこの発明の特徴をより良く理解するため、
この発明の実施例につき図を用いて説明する。
Next, in order to better understand the characteristics of this invention,
Embodiments of the present invention will be described with reference to the drawings.

第1図はこの発明の一実施例のブロツク図であ
る。この実施例はMOS−ICの外部から+5Vの直
流電源Vccを供給し、入力信号inを出力信号outに
所定の回路機能を経て導出する。MOS−ICの内
部には基準端子GNDに対して+5Vの電源Vccの
供給で約1MHzの互いに逆相の短形波出力φ,
を発生する自励発振回路Aと、短形波出力φ,
の到来で約−3Vの直流基体バイアスを発生する
チヤージポンプ型素子を用いた基体バイアス源回
路Bと、所定の回路動作を行う機能回路Cとを有
する。基体バイアス源回路Bは出力バイアスVSB
を自励発振回路Aと機能回路Cとに供給し、自励
発振回路からの出力φ、の低レベルを実質的に
基体バイアスVSBにまで下降して振巾値を増大し
チヤージポンプ効果を高める。又、基体バイアス
SBの機能回路への効果は、この回路内での高速
動作を保障する。
FIG. 1 is a block diagram of one embodiment of the present invention. In this embodiment, a +5V DC power supply Vcc is supplied from outside the MOS-IC, and an input signal in is derived as an output signal out through a predetermined circuit function. Inside the MOS-IC, when a +5V power supply Vcc is supplied with respect to the reference terminal GND, approximately 1MHz rectangular wave outputs φ, which are opposite in phase to each other, are generated.
A self-excited oscillation circuit A that generates a rectangular wave output φ,
The circuit has a substrate bias source circuit B using a charge pump type element that generates a DC substrate bias of about -3 V when the voltage comes on, and a functional circuit C that performs a predetermined circuit operation. The body bias source circuit B has an output bias V SB
is supplied to the self-excited oscillation circuit A and the functional circuit C, and the low level of the output φ from the self-excited oscillation circuit is lowered to substantially the base bias V SB to increase the amplitude value and enhance the charge pump effect. . Also, the effect of the body bias V SB on the functional circuit ensures high speed operation within this circuit.

第2図は第1図の実施例の自励発振回路の回路
図である。この回路は図に示す如くリングオシレ
ター回路を形成し、リングオシレター回路を形成
し、リングオシレターR・OSCからの−出力φ
と逆相出力とをそれぞれ増巾部BF1,BF2を
経て導出する。リングオシレタR・OSC及び増
巾部BF1,BF2の初段のインバータの駆動用ト
ランジスタのソースは全て基準端子GNDに接続
し、増巾部BF1,BF2の出力段の駆動用トラン
ジスタQ01,Q02のソースは基体バイアスVSB
結合する。これによつて短形波出力φ,の振巾
は基体バイアスの発生と共に増大する。
FIG. 2 is a circuit diagram of the self-excited oscillation circuit of the embodiment shown in FIG. This circuit forms a ring oscillator circuit as shown in the figure, and the -output φ from the ring oscillator R OSC
and a negative phase output are respectively derived through amplification parts BF1 and BF2. The sources of the drive transistors of the ring oscillator R/OSC and the first-stage inverters of the amplifiers BF1 and BF2 are all connected to the reference terminal GND, and the sources of the drive transistors Q 01 and Q 02 of the output stages of the amplifiers BF1 and BF2 are connected to the reference terminal GND. is coupled to the body bias VSB . As a result, the amplitude of the rectangular wave output φ increases as the body bias occurs.

第3図AおよびBは第1図の実施例の基体バイ
アス源回路のチヤージポンプ型素子を示す。この
回路は2個のチヤージポンプ型素子QP1,QP2
出力領域を共通に基準端子GNDに接続し、ゲー
ト電極にそれぞれリングオシレター回路からの互
いに逆相の出力φ,を受ける。基体はMOS−
IC中の中の他のトランジスタと共通である。第
3図Bにチヤージポンプ素子の断面を示すよう
に、チヤージポンプ型素子QP1,QP2は比抵抗10
Ω−cmのP型シリコン単結晶SBの一表面に共通
のN型出力領域N1を有し、基準端子GNDへの
導電配線を導出せしめてある。この領域N1の近
傍には各トランジスタQP1,QP2のための1000Å
程度のSiO2の絶縁ゲート膜01,02およびア
ルミニウムのゲート電極G1,G2が有る。又、
これらを囲む不活性領域の基体表面には厚さ1.0
μ程度のSiO2の周辺酸化膜F0と直下の表面濃
度1.5×1016cm-3のP型領域DP1がある。活性領
域には前述の共通の出力領域N1と表面濃度1〜
10×1016cm-3のVsubを発生するためのチヤージポ
ンプ素子の出力領域としての高濃度のP型領域P
1,P2があり、このP型領域P1,P2はN型
領域N1とPN接合接触、すなわち整流結合して
いる。このP型領域P1,P2はチヤージポンプ
型素子のゲート直下にあり、導電チヤネル形成の
閾値を上昇し且つ、誘起キヤリアの再結合速度を
早めるため効率を上昇する。
3A and 3B show charge pump type elements of the substrate bias source circuit of the embodiment of FIG. 1. FIG. In this circuit, the output regions of the two charge pump type elements Q P1 and Q P2 are commonly connected to the reference terminal GND, and the gate electrodes receive outputs φ, which are opposite in phase to each other, from the ring oscillator circuit. The base is MOS-
This is common to other transistors in the IC. As shown in the cross section of the charge pump element in Figure 3B, the charge pump type elements Q P1 and Q P2 have a specific resistance of 10.
A common N-type output region N1 is provided on one surface of the P-type silicon single crystal SB of Ω-cm, and a conductive wiring to the reference terminal GND is led out. The area near this region N1 is 1000 Å for each transistor Q P1 and Q P2 .
There are insulating gate films 01 and 02 made of SiO 2 and gate electrodes G1 and G2 made of aluminum. or,
The substrate surface of the inactive area surrounding these has a thickness of 1.0
There is a peripheral oxide film F0 of SiO 2 of about μ and a P-type region DP1 immediately below with a surface concentration of 1.5×10 16 cm -3 . The active region has the above-mentioned common output region N1 and surface concentration 1~
High concentration P-type region P as the output region of the charge pump element to generate Vsub of 10×10 16 cm -3
1 and P2, and these P-type regions P1 and P2 are in PN junction contact with the N-type region N1, that is, rectifying coupling. These P-type regions P1 and P2 are located directly under the gate of the charge pump type element, and increase the efficiency by increasing the threshold for forming a conductive channel and accelerating the recombination speed of induced carriers.

又、この図に示すように2個のチヤージポンプ
型素子に互いに逆相の入力を与えるため電源リツ
プルが少なく安定動作が得られると共に過渡的な
負荷に対する追従も優れている。チヤージポンプ
型素子は負荷充電時には定電流源であるが、定常
状態では負荷電流の変動に対する電圧変動を抑え
る電圧安定作用を有するため基体バイアス源とし
て充分な特性が得られる。
Furthermore, as shown in this figure, since inputs of opposite phases are given to the two charge pump elements, stable operation is achieved with little power supply ripple, and excellent follow-up to transient loads is achieved. A charge pump type element is a constant current source when charging a load, but in a steady state it has a voltage stabilizing effect that suppresses voltage fluctuations in response to fluctuations in load current, so that sufficient characteristics can be obtained as a substrate bias source.

更に、この実施例によれば、チヤージポンプ型
素子を駆動するリングオシレター回路の出力振巾
を基体バイアスを低レベルまで下降することによ
り増大しているためチヤージポンプ作用に寄与す
る誘起重荷重が多く、基体バイアス値を充分に大
きく得ることができる。従つてこの実施例によれ
ば外部からの単一電源の供給でPN接合寄生容量
を減少する内部基体バイアスを生じ、MOS−IC
に高速動作の回路機能を達成することができる。
Furthermore, according to this embodiment, the output amplitude of the ring oscillator circuit that drives the charge pump type element is increased by lowering the base bias to a low level, so that the induced heavy load that contributes to the charge pump action is large. A sufficiently large base bias value can be obtained. Therefore, according to this embodiment, by supplying a single external power supply, an internal body bias is generated to reduce the PN junction parasitic capacitance, and the MOS-IC
A high-speed operation circuit function can be achieved.

上にこの発明の実施例を説明したが、この発明
は必要に応じて動作導電型、材料、デバイス構造
等の変更が容易であり、たとえば自励発振回路に
は非安定マルチバイブレータやブロツキング発振
回路を用いることができ、回路機能にはメモリ、
ロジツク等を構成し得る。
Although the embodiments of the present invention have been described above, it is easy to change the operating conductivity type, material, device structure, etc. as necessary. can be used, and the circuit functions include memory,
Logic etc. can be configured.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の一実施例のブロツク図、第
2図は第1図の実施例に好適なリングオシレター
回路の回路図、第3図AおよびBは第1図の実施
例に好適なチヤージポンプ型素子を用いた基体バ
イアス源の回路図と断面図である。 図中、Aは自励発振回路、Bはチヤージポンプ
型素子を用いた基体バイアス源回路、Cは所定の
MOS−ICに要求された動作回路である。
FIG. 1 is a block diagram of an embodiment of the present invention, FIG. 2 is a circuit diagram of a ring oscillator circuit suitable for the embodiment of FIG. 1, and FIGS. 3A and B are suitable for the embodiment of FIG. 1. FIG. 2 is a circuit diagram and a cross-sectional view of a substrate bias source using a charge pump type element. In the figure, A is a self-oscillation circuit, B is a substrate bias source circuit using a charge pump type element, and C is a predetermined
This is the operating circuit required for MOS-IC.

Claims (1)

【特許請求の範囲】[Claims] 1 外部電圧端子および外部基準電圧端子を介し
て外部電源の供給を受け所定の回路機能を実現す
る絶縁ゲート型電界効果トランジスタを用いた電
子回路を共通の半導体基体に設けた集積回路にお
いて、前記半導体基体に前記外部電源の供給によ
り発振する発振回路と、該発振回路の出力を入力
としてゲート電極に受けるチヤージポンプ型素子
と、該チヤージポンプ型素子の出力領域を前記外
部基準電圧端子に整流結合して該出力領域に基体
バイアス電圧を生成せしめる手段とを含み、前記
発振回路は前記外部電源を受けて発振動作を行な
う発振段と、前記外部電圧端子の電圧と前記基体
バイアス電圧とを受けて前記外部電圧端子の電圧
と前記基体バイアス電圧との間を振巾する発振信
号を該発振回路の出力として出力する出力段とを
有することを特徴とする集積回路。
1. In an integrated circuit in which an electronic circuit using an insulated gate field effect transistor that receives external power supply through an external voltage terminal and an external reference voltage terminal and realizes a predetermined circuit function is provided on a common semiconductor substrate, the semiconductor an oscillation circuit that oscillates when the external power is supplied to the base; a charge pump type element whose gate electrode receives the output of the oscillation circuit as input; and an output region of the charge pump type element that is rectified and coupled to the external reference voltage terminal. means for generating a body bias voltage in an output region; An integrated circuit comprising: an output stage that outputs an oscillation signal that oscillates between a terminal voltage and the body bias voltage as an output of the oscillation circuit.
JP1066176A 1976-02-02 1976-02-02 Integrated circuit Granted JPS5294084A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1066176A JPS5294084A (en) 1976-02-02 1976-02-02 Integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1066176A JPS5294084A (en) 1976-02-02 1976-02-02 Integrated circuit

Publications (2)

Publication Number Publication Date
JPS5294084A JPS5294084A (en) 1977-08-08
JPS6134261B2 true JPS6134261B2 (en) 1986-08-06

Family

ID=11756409

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1066176A Granted JPS5294084A (en) 1976-02-02 1976-02-02 Integrated circuit

Country Status (1)

Country Link
JP (1) JPS5294084A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0620177B2 (en) * 1984-01-20 1994-03-16 株式会社東芝 Internal bias generation circuit for semiconductor device

Also Published As

Publication number Publication date
JPS5294084A (en) 1977-08-08

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