JPS6132400B2 - - Google Patents
Info
- Publication number
- JPS6132400B2 JPS6132400B2 JP391282A JP391282A JPS6132400B2 JP S6132400 B2 JPS6132400 B2 JP S6132400B2 JP 391282 A JP391282 A JP 391282A JP 391282 A JP391282 A JP 391282A JP S6132400 B2 JPS6132400 B2 JP S6132400B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- permalloy
- polarization
- current
- cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 claims description 37
- 230000010287 polarization Effects 0.000 claims description 36
- 229910000889 permalloy Inorganic materials 0.000 claims description 27
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 16
- 230000002159 abnormal effect Effects 0.000 claims description 14
- 238000002203 pretreatment Methods 0.000 claims description 10
- 229910052759 nickel Inorganic materials 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 7
- 239000010408 film Substances 0.000 description 16
- 238000005259 measurement Methods 0.000 description 9
- 239000000203 mixture Substances 0.000 description 8
- 230000005856 abnormality Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- 230000035699 permeability Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
- Thin Magnetic Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57003912A JPS58120798A (ja) | 1982-01-12 | 1982-01-12 | 磁性パ−マロイメツキの前処理法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57003912A JPS58120798A (ja) | 1982-01-12 | 1982-01-12 | 磁性パ−マロイメツキの前処理法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58120798A JPS58120798A (ja) | 1983-07-18 |
| JPS6132400B2 true JPS6132400B2 (show.php) | 1986-07-26 |
Family
ID=11570389
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57003912A Granted JPS58120798A (ja) | 1982-01-12 | 1982-01-12 | 磁性パ−マロイメツキの前処理法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58120798A (show.php) |
-
1982
- 1982-01-12 JP JP57003912A patent/JPS58120798A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58120798A (ja) | 1983-07-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8524068B2 (en) | Low-rate electrochemical etch of thin film metals and alloys | |
| US4454014A (en) | Etched article | |
| DE2835577A1 (de) | Verfahren zum herstellen eines duennfilmmagnetkopfes und duennfilmmagnetkopf mit einem nickel-eisen-muster mit boeschungen | |
| CA1213044A (en) | Process of lift-off of material | |
| Bardwell et al. | Use of SIMS to Investigate the Induction Stage in the Pitting of Iron | |
| JPS6132400B2 (show.php) | ||
| DE2703390B2 (de) | Meßfühler zur Feststellung des Luft/ Brennstoff-Verhältnisses des einer Brennkraftmaschine zugeführten Ansauggemisches | |
| Gielen et al. | Comparison of electrode impedances of Pt, PtIr (10% Ir) and Ir-AIROF electrodes used in electrophysiological experiments | |
| JP3120521B2 (ja) | 金属膜の陽極酸化方法 | |
| DE69019416T2 (de) | Magnetische Vorrichtungen mit verbesserten Polen. | |
| DD227800B1 (de) | Verfahren zur herstellung einer fluoridsensitiven membran | |
| US6767477B2 (en) | Etching process to selectively remove copper plating seed layer | |
| JPH03130392A (ja) | 磁性合金メッキの前処理方法 | |
| JP4227826B2 (ja) | 直接金めっき方法およびそのためのめっき装置 | |
| JPS58197289A (ja) | パ−マロイメッキの前処理法 | |
| Eastham et al. | Factors Affecting the Composition Gradient in Electrodeposited Permalloy Films | |
| JPH11100693A (ja) | Ｎｉ−Ｆｅ合金電気めっき方法およびこの方法を用いた Ｎｉ−Ｆｅ合金めっき膜 | |
| Randin | Kinetics of the electrochemical deposition and dissolution of sodium tungsten bronzes | |
| IE51854B1 (en) | Method of fabricating a metallic pattern on a substrate | |
| JPH02128151A (ja) | 金属材料の耐食性評価法 | |
| EP0440071B1 (en) | Plating process | |
| DE69409186T2 (de) | Magnetisches Material mit Zero-Magnetostriktion | |
| DE2164490B2 (de) | Verfahren zur Herstellung eines Leitermusters einer elektronischen Schaltung durch Ätzen | |
| JPH03183136A (ja) | 半導体装置の製造方法 | |
| Breiter et al. | Identification of Gold Islands on Copper‐Plated Wire Surfaces by Cyclic Voltammetry |