JPS6131352A - 感湿素子の後処理方法 - Google Patents

感湿素子の後処理方法

Info

Publication number
JPS6131352A
JPS6131352A JP59149349A JP14934984A JPS6131352A JP S6131352 A JPS6131352 A JP S6131352A JP 59149349 A JP59149349 A JP 59149349A JP 14934984 A JP14934984 A JP 14934984A JP S6131352 A JPS6131352 A JP S6131352A
Authority
JP
Japan
Prior art keywords
moisture
sensitive
humidity
treatment
zro
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59149349A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0122230B2 (enrdf_load_stackoverflow
Inventor
清 荻野
伊藤　瑛二
克巳 谷野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyama Prefecture
Eneos Corp
Original Assignee
Toyama Prefecture
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyama Prefecture, Nippon Mining Co Ltd filed Critical Toyama Prefecture
Priority to JP59149349A priority Critical patent/JPS6131352A/ja
Priority to US06/755,641 priority patent/US4656455A/en
Priority to GB08518338A priority patent/GB2163970B/en
Publication of JPS6131352A publication Critical patent/JPS6131352A/ja
Publication of JPH0122230B2 publication Critical patent/JPH0122230B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
  • Compositions Of Oxide Ceramics (AREA)
JP59149349A 1984-07-20 1984-07-20 感湿素子の後処理方法 Granted JPS6131352A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP59149349A JPS6131352A (ja) 1984-07-20 1984-07-20 感湿素子の後処理方法
US06/755,641 US4656455A (en) 1984-07-20 1985-07-16 Humidity-sensing element
GB08518338A GB2163970B (en) 1984-07-20 1985-07-19 Method of manufacturing a humidity-sensing element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59149349A JPS6131352A (ja) 1984-07-20 1984-07-20 感湿素子の後処理方法

Publications (2)

Publication Number Publication Date
JPS6131352A true JPS6131352A (ja) 1986-02-13
JPH0122230B2 JPH0122230B2 (enrdf_load_stackoverflow) 1989-04-25

Family

ID=15473177

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59149349A Granted JPS6131352A (ja) 1984-07-20 1984-07-20 感湿素子の後処理方法

Country Status (1)

Country Link
JP (1) JPS6131352A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009035469A (ja) * 2007-08-02 2009-02-19 Applied Materials Inc 制御された電気抵抗率を備えた耐プラズマ性セラミック
US8623527B2 (en) 2007-04-27 2014-01-07 Applied Materials, Inc. Semiconductor processing apparatus comprising a coating formed from a solid solution of yttrium oxide and zirconium oxide
US10242888B2 (en) 2007-04-27 2019-03-26 Applied Materials, Inc. Semiconductor processing apparatus with a ceramic-comprising surface which exhibits fracture toughness and halogen plasma resistance
US10622194B2 (en) 2007-04-27 2020-04-14 Applied Materials, Inc. Bulk sintered solid solution ceramic which exhibits fracture toughness and halogen plasma resistance

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8623527B2 (en) 2007-04-27 2014-01-07 Applied Materials, Inc. Semiconductor processing apparatus comprising a coating formed from a solid solution of yttrium oxide and zirconium oxide
US9051219B2 (en) 2007-04-27 2015-06-09 Applied Materials, Inc. Semiconductor processing apparatus comprising a solid solution ceramic formed from yttrium oxide, zirconium oxide, and aluminum oxide
US10242888B2 (en) 2007-04-27 2019-03-26 Applied Materials, Inc. Semiconductor processing apparatus with a ceramic-comprising surface which exhibits fracture toughness and halogen plasma resistance
US10622194B2 (en) 2007-04-27 2020-04-14 Applied Materials, Inc. Bulk sintered solid solution ceramic which exhibits fracture toughness and halogen plasma resistance
US10840112B2 (en) 2007-04-27 2020-11-17 Applied Materials, Inc. Coated article and semiconductor chamber apparatus formed from yttrium oxide and zirconium oxide
US10840113B2 (en) 2007-04-27 2020-11-17 Applied Materials, Inc. Method of forming a coated article and semiconductor chamber apparatus from yttrium oxide and zirconium oxide
US10847386B2 (en) 2007-04-27 2020-11-24 Applied Materials, Inc. Method of forming a bulk article and semiconductor chamber apparatus from yttrium oxide and zirconium oxide
US11373882B2 (en) 2007-04-27 2022-06-28 Applied Materials, Inc. Coated article and semiconductor chamber apparatus formed from yttrium oxide and zirconium oxide
JP2009035469A (ja) * 2007-08-02 2009-02-19 Applied Materials Inc 制御された電気抵抗率を備えた耐プラズマ性セラミック
US8367227B2 (en) 2007-08-02 2013-02-05 Applied Materials, Inc. Plasma-resistant ceramics with controlled electrical resistivity
US8871312B2 (en) 2007-08-02 2014-10-28 Applied Materials, Inc. Method of reducing plasma arcing on surfaces of semiconductor processing apparatus components in a plasma processing chamber

Also Published As

Publication number Publication date
JPH0122230B2 (enrdf_load_stackoverflow) 1989-04-25

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