JPS61283162A - Semiconductor memory device - Google Patents

Semiconductor memory device

Info

Publication number
JPS61283162A
JPS61283162A JP60124337A JP12433785A JPS61283162A JP S61283162 A JPS61283162 A JP S61283162A JP 60124337 A JP60124337 A JP 60124337A JP 12433785 A JP12433785 A JP 12433785A JP S61283162 A JPS61283162 A JP S61283162A
Authority
JP
Japan
Prior art keywords
word line
word
pitch
line driver
memory
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60124337A
Other languages
Japanese (ja)
Inventor
Toru Tsutsui
徹 筒井
Kenji Kanamaru
健次 金丸
Nobunari Morita
森田 展功
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
NipponDenso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NipponDenso Co Ltd filed Critical NipponDenso Co Ltd
Priority to JP60124337A priority Critical patent/JPS61283162A/en
Publication of JPS61283162A publication Critical patent/JPS61283162A/en
Pending legal-status Critical Current

Links

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  • Static Random-Access Memory (AREA)
  • Semiconductor Memories (AREA)
  • Dram (AREA)

Abstract

PURPOSE:To highly integrate a semiconductor memory device by longitudinally providing rows of word decoders and word line drivers laterally of a memory matrix, and constructing to run word lines alternately from the right and left word line drivers on a memory matrix. CONSTITUTION:Word decoders 101, 102 and word line drivers 201, 202 are formed along the bit line 40 of a memory matrix 30. The word lines 50 corresponding to the outputs of the drivers 201, 202 run alternately on a memory matrix 30 from the right and left word line drivers 201, 202. That is, two word lines are disposed in a drive pitch for generating one word line output, the pitches of the decoders 101, 102 and the drivers 201, 202 are doubled by the pitch of the memory cell 60, i.e., the pitch of the word line 50, thereby reducing the interval between the word lines.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、特に大容量、高集積化を可能にした半導体
記憶装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention particularly relates to a semiconductor memory device that enables large capacity and high integration.

〔発明の背景技術〕[Background technology of the invention]

半導体記憶装置において、大記憶容量、高集積化が進む
につれて、記憶装置を構成するメモリセルのサイズも小
さくすることが要求されている。そして、このメモリセ
ルのサイズが小さくなると、メモリセルに沿って設けら
れるワード線の間隔も小さくなるものであり、したがっ
てワード線駆動のためのドライバ回路のサイズも小さく
しなければならない。しかしワード線ドライバ回路は、
メモリセルに比べて回路が複雑なため、ある程度以上そ
のサイズを小さくすることができない。しかも、各ワー
ド線ドライバ回路ピッチに対して、それぞれ1本ずつの
ワード線を設置する構造となるものであるため、ワード
線ドライバ回路の大きさが、ワード線間隔の限界を設定
するようになシ、メモリセル部分の縮小を妨げる結果と
なっている。
As semiconductor memory devices become larger in storage capacity and more highly integrated, there is a need to reduce the size of memory cells that constitute the memory devices. As the size of the memory cells decreases, the spacing between word lines provided along the memory cells also decreases, and therefore the size of the driver circuit for driving the word lines must also decrease. However, the word line driver circuit is
Since the circuit is more complex than that of a memory cell, its size cannot be reduced beyond a certain point. Moreover, since the structure is such that one word line is installed for each word line driver circuit pitch, the size of the word line driver circuit sets the limit for the word line spacing. However, this results in hindering the reduction of the memory cell portion.

そこで、このような問題を解決するだめに、例えば、実
公昭57−25440号公報に示す手段が考えられてい
る。すなわち記憶装置を構成する半導体基板のほぼ中央
位置に、デコーダ回路を挾んで、ワード線ドライバ回路
をビット線方向に沿って2列に設け、その両側に多数の
ワード線が延びるように形成しているものである。この
ようにすれば、上記ドライバ回路の1つのピッチ内に2
本のワード線が配置できるようにな9、メモリサイズの
縮小化がはかれる。しかし、このような手段では、デコ
ーダ回路とワード線ドライバ回路上をワード線が横切る
ような構造となるため、バタン設計が複雑になる。
In order to solve this problem, for example, the means shown in Japanese Utility Model Publication No. 57-25440 has been considered. That is, word line driver circuits are provided in two rows along the bit line direction, with a decoder circuit sandwiched in the semiconductor substrate constituting the memory device, and a large number of word lines are formed to extend on both sides of the word line driver circuits. It is something that exists. In this way, two pitches are included within one pitch of the driver circuit.
The memory size can be reduced by making it possible to arrange a book's word line9. However, with such means, the word line crosses over the decoder circuit and the word line driver circuit, which complicates the baton design.

また、各ワード線ドライバ回路ピッチに対し、そのワー
ド線ドライバ回路からの出力である2本の同一信号のワ
ード線を配置し、ワード線間隔の縮小を可能とすること
が考えられている。
It has also been considered to arrange two word lines of the same signal, which are output from the word line driver circuit, for each word line driver circuit pitch, thereby making it possible to reduce the word line spacing.

しかし、この手段では、メモリセルを各ワード線に対し
て、ひとつおきのビット線との交点にしか配置できない
ため、ワード線の長さが長くなるという集積上の欠点が
ある。
However, with this method, memory cells can only be placed at the intersections of every other bit line with respect to each word line, so there is a drawback in terms of integration that the length of the word line becomes long.

〔発明が解決すべき問題点〕[Problems to be solved by the invention]

この発明は、上記のような点に鑑みなされたもので、高
集積化におけるメモリセルのサイズの縮小率に応じた、
デコーダ回路やワード線ドライバ回路等を含めた半導体
装置全体の縮小を容易なバタン設計で構成される半導体
記憶装置を提供しようとするものである。
This invention has been made in view of the above points, and is designed to meet the reduction rate of memory cell size due to high integration.
It is an object of the present invention to provide a semiconductor memory device configured with a button design that allows easy downsizing of the entire semiconductor device including a decoder circuit, a word line driver circuit, and the like.

〔問題点を解決するための手段〕[Means for solving problems]

すなわち、この発明に係る半導体記憶装置は、メモリマ
トリックスの左右にワードデコーダ回路とワード線ドラ
イバ回路の列を縦方向に設け、ワード線が左右のワード
線ドライバ回路から交互にメモリマトリックス上を走る
ように構成して、ワード線ドライバ回路のピッチをメモ
リセルのピッチの2倍にして、高集積化をはかるように
しているものである。
That is, in the semiconductor memory device according to the present invention, rows of word decoder circuits and word line driver circuits are vertically provided on the left and right sides of a memory matrix, and the word lines run alternately on the memory matrix from the left and right word line driver circuits. The pitch of the word line driver circuit is twice the pitch of the memory cells to achieve high integration.

〔作用〕[Effect]

このように構成される半導体記憶装置にあっては、左右
のドライバ回路から交互に異なる信号のワード線がメモ
リマトリックスを走るため、ワード線ドライバ回路のピ
ッチをメモリセルのピッチの2倍にすることができワー
ド線ドライバ回路ピッチによる限界を越えたワード線間
隔の縮小が可能となる。さらに、メモリセルをワード線
とビット線との全ての交点に配置できるため、メモリセ
ルの高集積化が可能となる。また、ワード線がワードデ
コーダ回路やワード線ドライバ回路上を通らないため、
容易なバタン設計で構成できる。
In a semiconductor memory device configured in this manner, word lines with different signals alternately run from the left and right driver circuits through the memory matrix, so the pitch of the word line driver circuits should be twice the pitch of the memory cells. This makes it possible to reduce the word line spacing beyond the limit imposed by the word line driver circuit pitch. Furthermore, since memory cells can be arranged at all intersections between word lines and bit lines, high integration of memory cells is possible. Also, since the word line does not pass over the word decoder circuit or word line driver circuit,
It can be configured with an easy slam design.

〔発明の実施例〕[Embodiments of the invention]

以下、図面を参照してこの発明の一実施例を説明する。 Hereinafter, one embodiment of the present invention will be described with reference to the drawings.

図はその構成を示す。記憶装置を構成する半導体基板の
両側に第1および第2のワードデコーダ回路101.1
02を形成し、このデコーダ回路101,102のそれ
ぞれ内側に第1および第2のワード線ドライバ回路20
1゜202を形成する。そして、このワード線ドライバ
回路201,202との間に、メモリマトリックス3θ
を形成する。すなわち、ワードデコーダ回路101,1
02およびワード線ドライバ回路201.202は、メ
モリマトリックス30のビット線4Qに沿って形成され
るようになり、各ワード線ドライバ回路201,202
の出力に対応するワード線50が左右のワード線ドライ
バ回路201.202から交互にメモリマトリ、ジス3
0上を走る構成になっている。
The figure shows its configuration. First and second word decoder circuits 101.1 are disposed on both sides of a semiconductor substrate constituting a memory device.
02, and first and second word line driver circuits 20 are formed inside the decoder circuits 101 and 102, respectively.
1°202 is formed. A memory matrix 3θ is connected between the word line driver circuits 201 and 202.
form. That is, word decoder circuit 101,1
02 and word line driver circuits 201 and 202 are now formed along the bit line 4Q of the memory matrix 30, and each word line driver circuit 201, 202 is formed along the bit line 4Q of the memory matrix 30.
The word line 50 corresponding to the output of
It is configured to run above 0.

すなわち、1つのワード線出力を発生するドライバ回路
ピッチ内に、2本のワード線が配置されるようになるも
のであり、ワードデコーダ回路101,102とワード
線ドライバ回路201.202のピッチは、メモリセル
60のピッチ、すなわちワード線50のピッチの2倍に
することができ、ワード線間隔の縮小を可能にする。
That is, two word lines are arranged within the driver circuit pitch that generates one word line output, and the pitch of the word decoder circuits 101 and 102 and the word line driver circuits 201 and 202 is as follows. The pitch of the memory cells 60, ie, twice the pitch of the word lines 50, can be made, and the word line spacing can be reduced.

さらに、左右の第1および第2のドライバ回路201.
202から、それぞれ交互に異なる信号のワード線50
が、メモリマトリックス30上を走るため、メモリセル
60をワード線50とビット線40の全ての交点に配置
することができ、メモリセル60の高集積化が可能とな
る。
Further, left and right first and second driver circuits 201.
202, word lines 50 each of alternating different signals.
runs on the memory matrix 30, the memory cells 60 can be placed at all intersections of the word lines 50 and the bit lines 40, and the memory cells 60 can be highly integrated.

また、ワードデコーダ回路101,102とワード線ド
ライバ回路201,20;!とがメモリマトリックス3
0を挾んで左右に配置されているため、各ワード線50
が上記デコーダ回路101.102やワード線ドライバ
回路201゜202の上を通ることがなく、/4’タン
設計が単純化される。
Also, word decoder circuits 101, 102 and word line driver circuits 201, 20;! Toga Memory Matrix 3
0 on the left and right, each word line 50
does not pass over the decoder circuits 101 and 102 and the word line driver circuits 201 and 202, simplifying the /4' tan design.

〔発明の効果〕〔Effect of the invention〕

以上のように、この発明によれば、2組のワードデコー
ダ回路とワード線ドライバ回路をメモリマトリックスを
挾んで左右に配置したため、ワード線ドライバ回路によ
る高集積化阻害を解決し、容易なノタン設計で大容量の
半導体記憶装置を実現することができる。
As described above, according to the present invention, two sets of word decoder circuits and word line driver circuits are arranged on the left and right sides with the memory matrix in between, which solves the problem of high integration caused by the word line driver circuits and facilitates the notan design. A large-capacity semiconductor memory device can be realized by using this method.

【図面の簡単な説明】[Brief explanation of drawings]

図は、この発明の一実施例に係る半導体記憶装置を説明
する図である。 101.102・・・第1および第2のワードデコーダ
回路、201,202・・・第1および第2のワード線
ドライバ回路、30・・・メモリマトリックス、40・
・・ビット線、50・・・ワード線、60・・・メモリ
セル。
FIG. 1 is a diagram illustrating a semiconductor memory device according to an embodiment of the present invention. 101.102...First and second word decoder circuits, 201,202...First and second word line driver circuits, 30...Memory matrix, 40.
...Bit line, 50...Word line, 60...Memory cell.

Claims (1)

【特許請求の範囲】  多数の平行にしたワード線およびこのワード線に交差
するように設定した多数のビット線を配置して構成した
メモリマトリックスと、 このメモリマトリックスの他にワード線の延びる方向の
両側にそれぞれ配置形成した第1および第2のワード線
ドライバ回路と、 この第1および第2のドライバ回路にそれぞれ付属して
形成されたワードデコーダ回路とを具備し、 上記多数のワード線は交互に第1および第2のワード線
ドライバ回路に接続されるようにしたことを特徴とする
半導体記憶装置。
[Claims] A memory matrix configured by arranging a large number of parallel word lines and a large number of bit lines set to intersect with the word lines; It is equipped with first and second word line driver circuits arranged and formed on both sides, and word decoder circuits formed respectively attached to the first and second driver circuits, and the plurality of word lines are arranged alternately. 1. A semiconductor memory device, wherein the semiconductor memory device is connected to first and second word line driver circuits.
JP60124337A 1985-06-10 1985-06-10 Semiconductor memory device Pending JPS61283162A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60124337A JPS61283162A (en) 1985-06-10 1985-06-10 Semiconductor memory device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60124337A JPS61283162A (en) 1985-06-10 1985-06-10 Semiconductor memory device

Publications (1)

Publication Number Publication Date
JPS61283162A true JPS61283162A (en) 1986-12-13

Family

ID=14882846

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60124337A Pending JPS61283162A (en) 1985-06-10 1985-06-10 Semiconductor memory device

Country Status (1)

Country Link
JP (1) JPS61283162A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02123596A (en) * 1988-11-02 1990-05-11 Nec Corp Semiconductor memory device
US4982372A (en) * 1988-06-16 1991-01-01 Mitsubishi Denki Kabushiki Kaisha Semiconductor memory device having divided word or bit line drivers and operating method therefor
JPH0444695A (en) * 1990-06-12 1992-02-14 Toshiba Corp Semiconductor memory
JPH04278289A (en) * 1991-02-05 1992-10-02 Samsung Electron Co Ltd Method for arranging word-line driver of semiconductor memory device
US6141269A (en) * 1991-08-30 2000-10-31 Mitsubishi Denki Kabushiki Kaisha Semiconductor integrated circuit device using BiCMOS technology
JP2009123252A (en) * 2007-11-12 2009-06-04 Nec Electronics Corp Semiconductor integrated circuit

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4982372A (en) * 1988-06-16 1991-01-01 Mitsubishi Denki Kabushiki Kaisha Semiconductor memory device having divided word or bit line drivers and operating method therefor
JPH02123596A (en) * 1988-11-02 1990-05-11 Nec Corp Semiconductor memory device
JPH0444695A (en) * 1990-06-12 1992-02-14 Toshiba Corp Semiconductor memory
JPH04278289A (en) * 1991-02-05 1992-10-02 Samsung Electron Co Ltd Method for arranging word-line driver of semiconductor memory device
US6141269A (en) * 1991-08-30 2000-10-31 Mitsubishi Denki Kabushiki Kaisha Semiconductor integrated circuit device using BiCMOS technology
US6314037B1 (en) 1991-08-30 2001-11-06 Mitsubishi Denki Kabushiki Kaisha Semiconductor integrated circuit device using BiCMOS technology
JP2009123252A (en) * 2007-11-12 2009-06-04 Nec Electronics Corp Semiconductor integrated circuit
US8391084B2 (en) 2007-11-12 2013-03-05 Renesas Electronics Corporation Semiconductor integrated circuit
US8699284B2 (en) 2007-11-12 2014-04-15 Renesas Electronics Corporation Semiconductor integrated circuit with thick gate oxide word line driving circuit
US8797810B2 (en) 2007-11-12 2014-08-05 Renesas Electronics Corporation Semiconductor integrated circuit with thick gate oxide word line driving circuit
US9099197B2 (en) 2007-11-12 2015-08-04 Renesas Electronics Corporation Semiconductor integrated circuit with thick gate oxide word line driving circuit

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