JPS6128029B2 - - Google Patents

Info

Publication number
JPS6128029B2
JPS6128029B2 JP18381181A JP18381181A JPS6128029B2 JP S6128029 B2 JPS6128029 B2 JP S6128029B2 JP 18381181 A JP18381181 A JP 18381181A JP 18381181 A JP18381181 A JP 18381181A JP S6128029 B2 JPS6128029 B2 JP S6128029B2
Authority
JP
Japan
Prior art keywords
magnetic pole
magnetic
target material
shaped
target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP18381181A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5887270A (ja
Inventor
Katsuo Abe
Hide Kobayashi
Tsuneaki Kamei
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP18381181A priority Critical patent/JPS5887270A/ja
Publication of JPS5887270A publication Critical patent/JPS5887270A/ja
Publication of JPS6128029B2 publication Critical patent/JPS6128029B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405Magnetron sputtering
    • H01J37/3408Planar magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP18381181A 1981-11-18 1981-11-18 プレ−ナマグネトロン方式のスパッタリング電極 Granted JPS5887270A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18381181A JPS5887270A (ja) 1981-11-18 1981-11-18 プレ−ナマグネトロン方式のスパッタリング電極

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18381181A JPS5887270A (ja) 1981-11-18 1981-11-18 プレ−ナマグネトロン方式のスパッタリング電極

Publications (2)

Publication Number Publication Date
JPS5887270A JPS5887270A (ja) 1983-05-25
JPS6128029B2 true JPS6128029B2 (US20110009641A1-20110113-C00116.png) 1986-06-28

Family

ID=16142283

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18381181A Granted JPS5887270A (ja) 1981-11-18 1981-11-18 プレ−ナマグネトロン方式のスパッタリング電極

Country Status (1)

Country Link
JP (1) JPS5887270A (US20110009641A1-20110113-C00116.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01180629U (US20110009641A1-20110113-C00116.png) * 1988-05-30 1989-12-26

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1242989A (en) * 1983-07-19 1988-10-11 Donald R. Boys Apparatus for and method of controlling sputter coating
NL8402012A (nl) * 1983-07-19 1985-02-18 Varian Associates Magnetron spetter deklaag opbrengbron voor zowel magnetische als niet-magnetische trefplaatmaterialen.
JPS6067668A (ja) * 1983-09-21 1985-04-18 Fujitsu Ltd スパッタリング装置
US4606806A (en) * 1984-05-17 1986-08-19 Varian Associates, Inc. Magnetron sputter device having planar and curved targets
JPH0726202B2 (ja) * 1985-12-17 1995-03-22 ローム株式会社 マグネトロンスパッタにおける膜厚調整方法
JPS63277756A (ja) * 1987-05-09 1988-11-15 Canon Inc 対向タ−ゲット式スパッタ装置
JP2638020B2 (ja) * 1987-12-22 1997-08-06 住友金属工業株式会社 熱間鍛造用快削鋼
KR101885123B1 (ko) * 2017-03-31 2018-08-03 한국알박(주) 마그네트론 스퍼터링 장치의 자석 제어 시스템

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01180629U (US20110009641A1-20110113-C00116.png) * 1988-05-30 1989-12-26

Also Published As

Publication number Publication date
JPS5887270A (ja) 1983-05-25

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