JPS61268016A - レーザーミラー膜の形成方法 - Google Patents
レーザーミラー膜の形成方法Info
- Publication number
- JPS61268016A JPS61268016A JP11093585A JP11093585A JPS61268016A JP S61268016 A JPS61268016 A JP S61268016A JP 11093585 A JP11093585 A JP 11093585A JP 11093585 A JP11093585 A JP 11093585A JP S61268016 A JPS61268016 A JP S61268016A
- Authority
- JP
- Japan
- Prior art keywords
- ionization
- substrate
- cluster
- acceleration voltage
- laser mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11093585A JPS61268016A (ja) | 1985-05-23 | 1985-05-23 | レーザーミラー膜の形成方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11093585A JPS61268016A (ja) | 1985-05-23 | 1985-05-23 | レーザーミラー膜の形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61268016A true JPS61268016A (ja) | 1986-11-27 |
JPH0517309B2 JPH0517309B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-03-08 |
Family
ID=14548318
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11093585A Granted JPS61268016A (ja) | 1985-05-23 | 1985-05-23 | レーザーミラー膜の形成方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61268016A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6375790B1 (en) | 1999-07-19 | 2002-04-23 | Epion Corporation | Adaptive GCIB for smoothing surfaces |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS554719A (en) * | 1978-06-22 | 1980-01-14 | Nec Corp | Pulse current driving unit for bubble |
JPS58181159A (ja) * | 1982-04-17 | 1983-10-22 | Nec Corp | 状態履歴記憶回路 |
-
1985
- 1985-05-23 JP JP11093585A patent/JPS61268016A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS554719A (en) * | 1978-06-22 | 1980-01-14 | Nec Corp | Pulse current driving unit for bubble |
JPS58181159A (ja) * | 1982-04-17 | 1983-10-22 | Nec Corp | 状態履歴記憶回路 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6375790B1 (en) | 1999-07-19 | 2002-04-23 | Epion Corporation | Adaptive GCIB for smoothing surfaces |
Also Published As
Publication number | Publication date |
---|---|
JPH0517309B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-03-08 |
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