JPS61258256A - 焼枠 - Google Patents

焼枠

Info

Publication number
JPS61258256A
JPS61258256A JP61085133A JP8513386A JPS61258256A JP S61258256 A JPS61258256 A JP S61258256A JP 61085133 A JP61085133 A JP 61085133A JP 8513386 A JP8513386 A JP 8513386A JP S61258256 A JPS61258256 A JP S61258256A
Authority
JP
Japan
Prior art keywords
transparent plate
airtight sheet
roller
plate
spring roller
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61085133A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0376741B2 (enrdf_load_stackoverflow
Inventor
Hidekatsu Mizukami
水上　英勝
Yoshihiro Machida
町田　好宏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP61085133A priority Critical patent/JPS61258256A/ja
Publication of JPS61258256A publication Critical patent/JPS61258256A/ja
Publication of JPH0376741B2 publication Critical patent/JPH0376741B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP61085133A 1986-04-15 1986-04-15 焼枠 Granted JPS61258256A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61085133A JPS61258256A (ja) 1986-04-15 1986-04-15 焼枠

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61085133A JPS61258256A (ja) 1986-04-15 1986-04-15 焼枠

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP56145625A Division JPS5848035A (ja) 1981-09-17 1981-09-17 焼枠

Publications (2)

Publication Number Publication Date
JPS61258256A true JPS61258256A (ja) 1986-11-15
JPH0376741B2 JPH0376741B2 (enrdf_load_stackoverflow) 1991-12-06

Family

ID=13850151

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61085133A Granted JPS61258256A (ja) 1986-04-15 1986-04-15 焼枠

Country Status (1)

Country Link
JP (1) JPS61258256A (enrdf_load_stackoverflow)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5848035A (ja) * 1981-09-17 1983-03-19 Dainippon Screen Mfg Co Ltd 焼枠

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5848035A (ja) * 1981-09-17 1983-03-19 Dainippon Screen Mfg Co Ltd 焼枠

Also Published As

Publication number Publication date
JPH0376741B2 (enrdf_load_stackoverflow) 1991-12-06

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