JPS6125133B2 - - Google Patents
Info
- Publication number
- JPS6125133B2 JPS6125133B2 JP52080235A JP8023577A JPS6125133B2 JP S6125133 B2 JPS6125133 B2 JP S6125133B2 JP 52080235 A JP52080235 A JP 52080235A JP 8023577 A JP8023577 A JP 8023577A JP S6125133 B2 JPS6125133 B2 JP S6125133B2
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- panel
- glass
- above substances
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 31
- 239000004973 liquid crystal related substance Substances 0.000 claims description 17
- 239000000126 substance Substances 0.000 claims description 15
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 12
- 238000011282 treatment Methods 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 5
- -1 inorganic acid salts Chemical class 0.000 claims description 5
- 238000010304 firing Methods 0.000 claims description 4
- 239000002904 solvent Substances 0.000 claims description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052788 barium Inorganic materials 0.000 claims description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 2
- 230000000694 effects Effects 0.000 claims description 2
- 239000011133 lead Substances 0.000 claims description 2
- 229910052700 potassium Inorganic materials 0.000 claims description 2
- 239000011591 potassium Substances 0.000 claims description 2
- 229910052708 sodium Inorganic materials 0.000 claims description 2
- 239000011734 sodium Substances 0.000 claims description 2
- 239000010409 thin film Substances 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 239000011701 zinc Substances 0.000 claims description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 claims 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims 1
- 229910002651 NO3 Inorganic materials 0.000 claims 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims 1
- 229910052796 boron Inorganic materials 0.000 claims 1
- 230000005685 electric field effect Effects 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 239000011777 magnesium Substances 0.000 claims 1
- 229910052749 magnesium Inorganic materials 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
- 150000003377 silicon compounds Chemical class 0.000 claims 1
- 239000010408 film Substances 0.000 description 19
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 15
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 5
- 235000019441 ethanol Nutrition 0.000 description 5
- 239000005297 pyrex Substances 0.000 description 5
- 238000004381 surface treatment Methods 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 3
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 210000004027 cell Anatomy 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical class [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 208000037998 chronic venous disease Diseases 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 210000002858 crystal cell Anatomy 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 150000003840 hydrochlorides Chemical class 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 229940046892 lead acetate Drugs 0.000 description 1
- 150000002611 lead compounds Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002075 main ingredient Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- UAEJRRZPRZCUBE-UHFFFAOYSA-N trimethoxyalumane Chemical compound [Al+3].[O-]C.[O-]C.[O-]C UAEJRRZPRZCUBE-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Description
【発明の詳細な説明】
本発明は液晶表示パネルにおける、セルを構成
するパネルガラスに関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a panel glass constituting a cell in a liquid crystal display panel.
本発明の目的は、化学的耐久性の悪いソーダガ
ラス等に表面処理を施し、パイレツクスガラスと
同等、或いはそれ以上に化学的耐久性を向上し
て、ソーダガラス等で構成した液晶表示パネルを
実現し、コストの低減をはかるものである。 The purpose of the present invention is to surface-treat soda glass, etc., which has poor chemical durability, to improve its chemical durability to the same level as that of Pyrex glass, or even more so, to create a liquid crystal display panel made of soda glass, etc. This is aimed at reducing costs.
従来液晶表示パネネルは第1図の様な構造をな
している。上,下それぞれのパネルガラスの内側
に透明電極を形成して、液晶を配向させるため
に、ラピング、斜め蒸着等の配向処理を施し、液
晶の分子軸がツイストする様に、上,下パネルガ
ラスを合わせ、均一な間隔を保つ様にスペーサー
をはさみ、接着剤で固定する。このセルに液晶を
封じ込め液晶表示パネルとなる。一般に上,下パ
ネルガラスの材質としては、化学的耐久性の強い
ハイレツクスが幅広く使用されている。しかし高
価であることから経済的でないという欠点があ
る。 A conventional liquid crystal display panel has a structure as shown in FIG. Transparent electrodes are formed inside the upper and lower panel glasses, and in order to orient the liquid crystal, alignment treatments such as wrapping and oblique vapor deposition are applied to the upper and lower panel glasses so that the molecular axes of the liquid crystal are twisted. Align them, insert spacers to maintain even spacing, and secure with adhesive. Liquid crystal is sealed in this cell and it becomes a liquid crystal display panel. Generally, HIREX, which has strong chemical durability, is widely used as the material for the upper and lower panel glass. However, it has the drawback of being expensive and not economical.
そこで安価なソーダガラスを使用するのが良い
のであるが、ソーダガラスの中に含まれるアルカ
リ金属、等の液出により、表示パネルとしての寿
命が著しく損われる。したがつてソーダガラスを
直接液晶セルに使用することは不可能であり、適
当な表面処理を施し、化学的耐久性を向上する必
要がある。 Therefore, it would be better to use inexpensive soda glass, but the life of the display panel will be significantly shortened due to the leaching of alkali metals and the like contained in the soda glass. Therefore, it is impossible to use soda glass directly in liquid crystal cells, and it is necessary to perform appropriate surface treatment to improve chemical durability.
従来行なわれているソーダガラスの表面処理方
法には、スパツタ蒸着法によりソーダガラス上へ
Sio2膜を形成する方法がある。しかしこの方法
は、連続的な膜形成操作が不可能である点やスパ
ツタ蒸着装置のトラブル発生の危険性を含んでい
るため量産性に欠ける。また、一般にSio2膜形成
剤として市販されているものを用いたソーダガラ
スの表面処理方法がある。この方法は処理剤が液
体であるためガラスを浸漬して回転振切りして塗
布し、乾燥、焼成してソーダガラスの表面にSio2
膜を形成するものである。この方法では、量産性
は充分得られるが、処理剤の販売価格が高く経済
的でない。したがつて処理したソーダガラスがパ
イレツクスより高くなりソーダガラスを使用する
メリツトが全くなくなつてしまう。またケイ素の
水素化物(総称してシランという)を用いての
CVD処理によるSio2膜形成がある。しかしこの方
法では両面への膜形成が不可能で、時計用の液晶
パネルの様に小さなパネルガラスでは、ソリが生
じて適用不可能であつた。 Conventional surface treatment methods for soda glass include sputter deposition.
There is a method to form Sio 2 film. However, this method is not suitable for mass production because continuous film formation is impossible and there is a risk of trouble occurring in the sputter deposition equipment. There is also a method for surface treatment of soda glass using a commercially available Sio 2 film forming agent. In this method, the treatment agent is a liquid, so it is applied by dipping the glass and rotating it, then drying and baking to coat the surface of the soda glass with Sio 2 .
It forms a film. Although this method allows sufficient mass production, the selling price of the processing agent is high and it is not economical. Therefore, treated soda glass becomes more expensive than pyrex, and there is no advantage to using soda glass. In addition, silicon hydrides (collectively called silanes) are used to
There is Sio 2 film formation due to CVD treatment. However, this method cannot form a film on both sides, and warpage occurs on small panel glass such as liquid crystal panels for watches, making it unapplicable.
本発明は、上記の従来の欠点を克服するための
ものであり、本方法は、アルコキシシリケートを
主剤として、アルコール(例えばメチルアルコー
ル,エチルアルコール,プロパノール,n―ブチ
ルアルコール,イソプロピルアルコール)と酸
(例えば酢酸,塩酸,硝酸,硫酸,キ酸,酪酸)
又は水の混合溶剤に溶かしたものを処理剤とす
る。処理方法としては、先ず、スピンナー法、吹
付け法、浸せき法、刷毛塗り法などでソーダガラ
スに塗布する。次に100〜200℃の範囲の適当な温
度でアルコール乾燥する。この条件により最後の
処理膜厚をコントロールできる。 The present invention aims to overcome the above-mentioned conventional drawbacks, and the present method uses an alkoxysilicate as a main ingredient, an alcohol (for example, methyl alcohol, ethyl alcohol, propanol, n-butyl alcohol, isopropyl alcohol) and an acid ( (e.g. acetic acid, hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, butyric acid)
Alternatively, use a treatment agent dissolved in a mixed solvent of water. As a treatment method, first, the soda glass is coated with a spinner method, a spraying method, a dipping method, a brush coating method, or the like. Next, dry with alcohol at a suitable temperature in the range of 100-200°C. This condition allows the final treatment film thickness to be controlled.
更に、ソーダガラスの軟化点温度手前の500℃
で2〜3時間焼成を行なう。この焼成により機械
的膜強度は充分なものが得られる。しかしアルコ
キシシリケートだけの処理剤では得られる被膜は
ほとんどシリカ系の被膜であり500℃の焼成では
完全なシリカ系ガラス質の連続層が得られず化学
的耐久性に欠ける。焼成温度はソーダガラスの軟
化点を考慮して500℃以上に上げることは出来な
いため、500℃の焼成でパイレツクスと同等の化
学的耐久性を有する膜形成が出来る様な処理液の
検討が急務となつた。 Furthermore, the temperature is 500℃, which is just before the softening point of soda glass.
Bake for 2 to 3 hours. By this firing, sufficient mechanical film strength can be obtained. However, with a treatment agent containing only alkoxysilicate, the film obtained is almost always a silica-based film, and a complete continuous layer of silica-based glass cannot be obtained by firing at 500°C, resulting in a lack of chemical durability. Since the firing temperature cannot be raised above 500℃ due to the softening point of soda glass, there is an urgent need to consider a processing solution that can form a film with the same chemical durability as Pyrex when fired at 500℃. It became.
そこで前記したアルコキシシリケートのアルコ
ールと酸の処理溶剤に、有機ボロン化合物、有機
アルミニウム化合物、有機鉛化合物、有機チタン
化合物、有機リン化合物、等の有機金属化合物、
或い前記した金属(アルミニウム,鉛,チタン,
亜鉛)やカルシウム,リン,バリウム,カリウ
ム,ナトリウム等の塩酸塩,硝酸塩,硫酸塩等の
無機酸塩、または上記物質のキ酸、酢酸、等の有
機酸塩を適当な割合で単独に、或いは数種の物質
を、0.1〜30%の範囲で調整する。この溶剤をス
ピンナー法吹付法,浸せき法,刷毛塗り法などで
塗布して、100〜300℃の範囲で10〜60分間の適当
な範囲で乾燥する。更に400℃〜500℃の範囲で2
〜3時間焼成する。得られた被膜は化学的耐久性
を著しく増大することが出来た。 Therefore, in the treatment solvent of alcohol and acid for the alkoxysilicate described above, organic metal compounds such as organic boron compounds, organic aluminum compounds, organic lead compounds, organic titanium compounds, organic phosphorus compounds, etc.
Or the metals mentioned above (aluminum, lead, titanium,
Zinc), inorganic acid salts such as hydrochlorides, nitrates, and sulfates of calcium, phosphorus, barium, potassium, and sodium, or organic acid salts of the above substances such as phosphoric acid and acetic acid, alone or in appropriate proportions. Several substances are adjusted in the range of 0.1-30%. This solvent is applied by a spinner spraying method, dipping method, brush coating method, etc., and dried at a temperature of 100 to 300°C for an appropriate period of 10 to 60 minutes. Furthermore, 2 in the range of 400℃~500℃
Bake for ~3 hours. The resulting coating was able to significantly increase its chemical durability.
本発明によれば500Å〜2000Åの膜厚を自由に
コントロールでき、更に種々の化合物を適当な割
合で配合することにより種々のガラス膜を形成す
ることが出来、また化学的耐久性についてはパイ
レツクスと同等或いはそれ以上の効果が得られ
た。また膜形成操作は簡単でかつ経済的に被着で
き、今後本発明は表面保護膜、表面安定化膜とし
ても同様に適用できるものである。上記薄膜が
500Å末満であると前記アルカリ金属溶出を防止
できず2000Åを越えるとクラツクが入りやすくな
る。 According to the present invention, the film thickness can be freely controlled from 500 Å to 2000 Å, and various types of glass films can be formed by blending various compounds in appropriate proportions, and chemical durability is comparable to that of Pyrex. The same or better effect was obtained. Further, the film forming operation is simple and can be applied economically, and the present invention can be similarly applied as a surface protective film or a surface stabilizing film in the future. The above thin film
If it is less than 500 Å, the alkali metal elution cannot be prevented, and if it exceeds 2000 Å, cracks are likely to occur.
次に本発明を実施例により説明する。 Next, the present invention will be explained by examples.
実施例 1
テトラメトキシシラン:トリメトキシホロン:
トリメトキシアルミニウム:酢酸ナトリウム、酢
酸鉛=68.4%:19.5%:4.5%:3.8%:3.8%の割
合で調整し、この混合溶剤をメチルアルコール酢
酸で約10%程度に希釈しSio2膜形成剤とする。こ
の溶剤にソーダガラスを浸漬させ、スピンナーで
振り切り均一な塗膜を得る。その後150℃の恒温
槽にてアルコール乾燥する、約30分位の充分な乾
燥を行い、更に500℃にて2時間の焼成を行な
う。Example 1 Tetramethoxysilane: Trimethoxyphorone:
Adjust the ratio of trimethoxyaluminum: sodium acetate, lead acetate = 68.4%: 19.5%: 4.5%: 3.8%: 3.8%, dilute this mixed solvent with methyl alcohol acetic acid to about 10% and use Sio 2 film forming agent. shall be. Soda glass is immersed in this solvent and spun off with a spinner to obtain a uniform coating. After that, dry thoroughly with alcohol in a constant temperature bath at 150°C for about 30 minutes, and then bake at 500°C for 2 hours.
形成された被膜はSio2にそれぞれの金属酸化物
が均一に分布し化学的耐久性はほぼパイレツクス
ガラスと同程度、またはそれ以上の効果が得られ
た。第2図は本処理を施したパネルガラスで構成
した液晶表示パネルの断面図を示す。 In the formed film, each metal oxide was uniformly distributed in Sio 2 , and the chemical durability was almost the same as, or even better than, Pyrex glass. FIG. 2 shows a cross-sectional view of a liquid crystal display panel constructed from panel glass subjected to this treatment.
1…パネルガラス、2…透明電極、3…液晶、
4…スペーサー、5…表面処理膜。 1... Panel glass, 2... Transparent electrode, 3... Liquid crystal,
4...Spacer, 5...Surface treatment film.
以上のように本発明によれば、ソーダガラスの
様に化学的耐久性の弱いガラスをきわめて簡単な
操作で、かつ経済的に表面処理でき、今後経済的
な、ガラス表面処理方法として液晶表示パネル以
外にも巾広く適用されていくものである。 As described above, according to the present invention, glass with weak chemical durability such as soda glass can be surface-treated with extremely simple operations and economically, and in the future it will be possible to use an economical glass surface treatment method for liquid crystal display panels. It will be applied to a wide range of other areas as well.
第1図は従来の液晶パネルを示す。第2図は本
発明による液晶パネルを示す。
FIG. 1 shows a conventional liquid crystal panel. FIG. 2 shows a liquid crystal panel according to the invention.
Claims (1)
よりコントロールして表示する、或いは、電流効
果によりコントロールして表示する液晶表示パネ
ルのセルを構成するパネルガラスを、溶剤に、有
機シリコン系化合物を主成分とし、ホウ素,アル
ミニウム,ナトリウム,バリウム,マグネシウ
ム,フツ素,鉛,チタン,亜鉛,カリウムの有機
化合物、或いは上記物質の塩酸塩、硝酸塩、硫酸
塩等の無機酸塩、或いは上記物質のギ酸塩、酢酸
塩等の有機酸塩を単独に、或いは上記物質の数種
を添加した処理液で塗布してからパネルガラス軟
化点未満の温度で焼成し、500〜2000Åの薄膜を
形成する液晶パネルの製造方法。1 The panel glass constituting the cell of a liquid crystal display panel that uses liquid crystal molecules as light pulp to display images controlled by an electric field effect or controlled by an electric current effect, is prepared by using an organic silicon compound as a main component in a solvent. , boron, aluminum, sodium, barium, magnesium, fluorine, lead, titanium, zinc, potassium, or inorganic acid salts of the above substances such as hydrochloride, nitrate, sulfate, or formate of the above substances, acetic acid. A method for manufacturing a liquid crystal panel in which a thin film of 500 to 2000 Å is formed by coating an organic acid salt such as a salt alone or with a treatment solution containing several of the above substances and then firing at a temperature below the softening point of the panel glass. .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8023577A JPS5414255A (en) | 1977-07-04 | 1977-07-04 | Liquid crystal display panel |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8023577A JPS5414255A (en) | 1977-07-04 | 1977-07-04 | Liquid crystal display panel |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP29059788A Division JPH0214A (en) | 1988-11-17 | 1988-11-17 | Liquid crystal display device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5414255A JPS5414255A (en) | 1979-02-02 |
JPS6125133B2 true JPS6125133B2 (en) | 1986-06-14 |
Family
ID=13712671
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8023577A Granted JPS5414255A (en) | 1977-07-04 | 1977-07-04 | Liquid crystal display panel |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5414255A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59189320A (en) * | 1983-04-13 | 1984-10-26 | Nippon Taisanbin Kogyo Kk | Electrode plate for liquid crystal display body |
DE3916183A1 (en) * | 1989-05-18 | 1990-11-22 | Mahler Dienstleistung | DOOR FOR OPENING AND CLOSING AN OPENING OF A CONTINUOUS FURNACE |
JP4570228B2 (en) * | 2000-10-11 | 2010-10-27 | 日東電工株式会社 | Glass substrate and liquid crystal display device |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5037451A (en) * | 1973-08-03 | 1975-04-08 | ||
JPS5111596A (en) * | 1974-07-19 | 1976-01-29 | Hitachi Ltd | Ekishohyojibanno seizohoho |
JPS5189517A (en) * | 1975-02-04 | 1976-08-05 | ARUKARIKINZOKUGANJUGARASUSERAMITSUKUNOSOSHOKUHO | |
JPS5231756A (en) * | 1975-06-04 | 1977-03-10 | Hitachi Ltd | Method of manufacturing liquid crystal display element |
JPS5240354A (en) * | 1975-09-26 | 1977-03-29 | Nippon Kogaku Kk <Nikon> | Display unit in which electrooptical fluid is filled |
-
1977
- 1977-07-04 JP JP8023577A patent/JPS5414255A/en active Granted
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5037451A (en) * | 1973-08-03 | 1975-04-08 | ||
JPS5111596A (en) * | 1974-07-19 | 1976-01-29 | Hitachi Ltd | Ekishohyojibanno seizohoho |
JPS5189517A (en) * | 1975-02-04 | 1976-08-05 | ARUKARIKINZOKUGANJUGARASUSERAMITSUKUNOSOSHOKUHO | |
JPS5231756A (en) * | 1975-06-04 | 1977-03-10 | Hitachi Ltd | Method of manufacturing liquid crystal display element |
JPS5240354A (en) * | 1975-09-26 | 1977-03-29 | Nippon Kogaku Kk <Nikon> | Display unit in which electrooptical fluid is filled |
Also Published As
Publication number | Publication date |
---|---|
JPS5414255A (en) | 1979-02-02 |
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