JPS62176946A - Inorganic plate having antistatic property and low reflectivity - Google Patents
Inorganic plate having antistatic property and low reflectivityInfo
- Publication number
- JPS62176946A JPS62176946A JP1594986A JP1594986A JPS62176946A JP S62176946 A JPS62176946 A JP S62176946A JP 1594986 A JP1594986 A JP 1594986A JP 1594986 A JP1594986 A JP 1594986A JP S62176946 A JPS62176946 A JP S62176946A
- Authority
- JP
- Japan
- Prior art keywords
- inorg
- solution
- substrate
- glass
- inorganic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000002310 reflectometry Methods 0.000 title claims description 10
- 239000000758 substrate Substances 0.000 claims abstract description 23
- 239000011248 coating agent Substances 0.000 claims description 12
- 238000000576 coating method Methods 0.000 claims description 12
- 239000005368 silicate glass Substances 0.000 abstract description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052910 alkali metal silicate Inorganic materials 0.000 abstract description 2
- 239000005355 lead glass Substances 0.000 abstract description 2
- 239000005307 potash-lime glass Substances 0.000 abstract description 2
- 239000005361 soda-lime glass Substances 0.000 abstract description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 15
- 239000010408 film Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 13
- 229910052751 metal Inorganic materials 0.000 description 12
- 239000002184 metal Substances 0.000 description 12
- 238000006460 hydrolysis reaction Methods 0.000 description 11
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 230000007062 hydrolysis Effects 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 239000002585 base Substances 0.000 description 7
- 230000005611 electricity Effects 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 230000003068 static effect Effects 0.000 description 7
- 239000002253 acid Substances 0.000 description 6
- 238000010304 firing Methods 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 4
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 4
- 238000001879 gelation Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 3
- -1 diisoamyloxyethoxyantimony Chemical compound 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 150000002472 indium compounds Chemical class 0.000 description 3
- 150000007529 inorganic bases Chemical class 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 150000003606 tin compounds Chemical class 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- 230000001476 alcoholic effect Effects 0.000 description 2
- PKKGKUDPKRTKLJ-UHFFFAOYSA-L dichloro(dimethyl)stannane Chemical compound C[Sn](C)(Cl)Cl PKKGKUDPKRTKLJ-UHFFFAOYSA-L 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 150000002902 organometallic compounds Chemical class 0.000 description 2
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- YXTDAZMTQFUZHK-ZVGUSBNCSA-L (2r,3r)-2,3-dihydroxybutanedioate;tin(2+) Chemical compound [Sn+2].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O YXTDAZMTQFUZHK-ZVGUSBNCSA-L 0.000 description 1
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- NGCDGPPKVSZGRR-UHFFFAOYSA-J 1,4,6,9-tetraoxa-5-stannaspiro[4.4]nonane-2,3,7,8-tetrone Chemical compound [Sn+4].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O NGCDGPPKVSZGRR-UHFFFAOYSA-J 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 235000008100 Ginkgo biloba Nutrition 0.000 description 1
- 244000194101 Ginkgo biloba Species 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 239000005385 borate glass Substances 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- ZJXZSIYSNXKHEA-UHFFFAOYSA-N ethyl dihydrogen phosphate Chemical compound CCOP(O)(O)=O ZJXZSIYSNXKHEA-UHFFFAOYSA-N 0.000 description 1
- 239000005383 fluoride glass Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- SKWCWFYBFZIXHE-UHFFFAOYSA-K indium acetylacetonate Chemical compound CC(=O)C=C(C)O[In](OC(C)=CC(C)=O)OC(C)=CC(C)=O SKWCWFYBFZIXHE-UHFFFAOYSA-K 0.000 description 1
- PSCMQHVBLHHWTO-UHFFFAOYSA-K indium(iii) chloride Chemical compound Cl[In](Cl)Cl PSCMQHVBLHHWTO-UHFFFAOYSA-K 0.000 description 1
- 210000000936 intestine Anatomy 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- MLSKXPOBNQFGHW-UHFFFAOYSA-N methoxy(dioxido)borane Chemical compound COB([O-])[O-] MLSKXPOBNQFGHW-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000005365 phosphate glass Substances 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- ZYPJJPHRTZPKKY-UHFFFAOYSA-M silver;octanoate Chemical compound [Ag+].CCCCCCCC([O-])=O ZYPJJPHRTZPKKY-UHFFFAOYSA-M 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229940007163 stannous tartrate Drugs 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- LGQXXHMEBUOXRP-UHFFFAOYSA-N tributyl borate Chemical compound CCCCOB(OCCCC)OCCCC LGQXXHMEBUOXRP-UHFFFAOYSA-N 0.000 description 1
- OBROYCQXICMORW-UHFFFAOYSA-N tripropoxyalumane Chemical compound [Al+3].CCC[O-].CCC[O-].CCC[O-] OBROYCQXICMORW-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
- Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
- Elimination Of Static Electricity (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、帯電防止性および低反射性を有する無機板に
関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an inorganic plate having antistatic properties and low reflectivity.
[発明の技術的背景ならびにその問題点]近年、ブラウ
ン管をディスプレイ用に使用する機器類が多種多様に開
発されてきた。[Technical background of the invention and its problems] In recent years, a wide variety of devices that use cathode ray tubes for displays have been developed.
それはコンピューターやOA機器から始まって、パソコ
ン、ワープロあるいはホームオートメーションへと一般
家庭にも広く用いられるようになりつつある。It started with computers and office automation equipment, and is now becoming widely used in ordinary households, including personal computers, word processors, and home automation.
テレビのブラウン管は離れて眺めるものであるが、ディ
スプレイ用ブラウン管は近接し、時にはタッチペンでそ
の表面に接触することがあり、ブラウン管の表面が静電
気を帯びる現象、即ち帯電現象が問題となってきている
。A TV's cathode ray tube is viewed from a distance, but display cathode ray tubes are placed close to each other, and the surface is sometimes touched with a touch pen.The phenomenon in which the surface of the cathode ray tube is charged with static electricity, or electrification, has become a problem. .
というのは、たとえばブラウン管の表面が帯電すると、
帯電した面は埃を吸着して表示を見にくくし、さらにタ
ッチペンで触れると放電によって埃が飛んで目に入るこ
とがあったり、またブラウン管表面に無意識に接触した
場合にショックを受けることがしばしば生じており、そ
の防止が望まれていた。This is because, for example, when the surface of a cathode ray tube is charged,
The charged surface attracts dust, making the display difficult to read, and if you touch it with a stylus, the discharge may cause dust to fly into your eyes, and if you accidentally come into contact with the surface of the cathode ray tube, you may receive a shock. Therefore, it was desired to prevent this.
また、スイッチの大切に応じて生ずるプラスイオンが人
体に有害であるとの説もあり、帯電防止を図ることがそ
のイオンの発生を防止するのにも有効であることは明ら
かである。Additionally, there is a theory that positive ions generated by the use of switches are harmful to the human body, and it is clear that preventing static electricity is effective in preventing the generation of such ions.
一般に基板への帯電を防止するには、基板に静電気が蓄
積しないように基板の導電性を高めて。Generally, to prevent static electricity from building up on a board, increase the conductivity of the board to prevent static electricity from accumulating on the board.
静電気を徐々に逃がすようにすることが必要である。
その手段としては、基板表面を多孔質状態と
して水分を含有させる方法や、あるいは基板表面に透明
導電性薄膜を形成する方法などが考えられるが、前者は
環境に支配され易いので使用し難い。It is necessary to gradually release static electricity.
Possible means for this include a method of making the substrate surface porous to contain moisture, or a method of forming a transparent conductive thin film on the substrate surface, but the former method is difficult to use because it is easily controlled by the environment.
一方、基板表面に形成される導電性薄膜としては、古く
からS n O2、In2O3,CdO、Au、などが
用いられ、最近はL a B 6、タングステンブロン
ズ等も用いられているが、5n02. In2O3など
が最も実用的である。 この導電性薄膜の形
成方法としては、 CVO法や高周波スノタッタリン
グ法などが知られているが、これらの方法により透明に
薄く被膜を形成しても、得られる導電性被膜の表面比抵
抗は102Ω・ell程度である。On the other hand, as the conductive thin film formed on the surface of the substrate, S n O2, In2O3, CdO, Au, etc. have been used for a long time, and recently, L a B 6, tungsten bronze, etc. have also been used, but 5n02. In2O3 etc. are the most practical. Known methods for forming this conductive thin film include the CVO method and the high-frequency snottttering method, but even if these methods form a thin, transparent film, the surface specific resistance of the resulting conductive film is low. It is about 102Ω·ell.
ところで、ディスプレイ用ブラウン管に用いられる透明
無機板では、その表面比抵抗が1010Ω・Cm以上で
は静電気による帯電を防止することは全くできず、一方
、この表面比抵抗が106Ω・cm以下では導電性が高
まりすぎてディスプレイ用ブラウン管としてはタッチペ
ンの使用に支障を生ずることがわかった。By the way, in transparent inorganic plates used in cathode ray tubes for displays, if the surface resistivity is 1010 Ω・cm or more, it is completely impossible to prevent charging due to static electricity, whereas if this surface resistivity is 10 6 Ω・cm or less, the conductivity is poor. It was found that the height was too high and caused problems in the use of a touch pen as a display cathode ray tube.
したがって、従来法により透明基板上に透明導電性を形
成したのでは、ディスプレイ用ブラウン管としては用い
ることができない。Therefore, if a transparent conductive layer is formed on a transparent substrate using the conventional method, it cannot be used as a cathode ray tube for display purposes.
ディスプレイ用ブラウン管では、帯電防止のためには基
板表面の比抵抗がlO〜1010Ω・c11程度である
ことが最も望ましいことが本発明者らによって見出され
た。The present inventors have found that for display cathode ray tubes, it is most desirable for the specific resistance of the substrate surface to be approximately 10 to 1010 Ω·c11 in order to prevent static electricity.
したがって、導電性薄膜をディスプレイ用ブラウン管の
帯電防止用とするには、102Ω・cmの比抵抗を高め
るような被膜形成法の開発が必要であった。Therefore, in order to use a conductive thin film for antistatic use in cathode ray tubes for displays, it was necessary to develop a film forming method that would increase the resistivity to 102 Ω·cm.
一方、ブラウン管表面で外部からの光線が反射すると画
像が見にくくなるので、その反射を低減することが望ま
れる。On the other hand, if external light rays are reflected on the surface of the cathode ray tube, the image becomes difficult to see, so it is desirable to reduce this reflection.
このような目的のためには、従来はフッ酸などの腐食性
薬液を無機板に作用させ、その表面に多数の微細な凹凸
を形成させることが行われてきたが、フッ酸など、腐食
性薬液を用いることは、その取扱上、あるいは公害等の
面で好ましくなかった。Conventionally, for this purpose, a corrosive chemical solution such as hydrofluoric acid was applied to an inorganic plate to form many fine irregularities on its surface. The use of chemical solutions is not desirable in terms of handling or pollution.
[発明の目的]
本発明は、上記のような従来技術に伴なう問題点を解決
しようとするものであって、帯電を防止することができ
、しかも表面での反射が低減されたディスプレイ用ブラ
ウン管として用いるのに特に適した無機板を提供するこ
とを目的としている。[Object of the Invention] The present invention aims to solve the problems associated with the prior art as described above, and provides a display device that can prevent charging and reduce reflection on the surface. The object is to provide an inorganic plate particularly suitable for use as a cathode ray tube.
[発明の概要]
本発明に係る無機板は帯電防止性および低反射性を有し
ており、無機基板の表面上に、高さ0.1〜2.0ル鵬
の微細な多数の隆起を有し、しかもその表面の比抵抗が
10 −108Ω・cmである透明無機被膜が設けられ
ていることを特徴としている。[Summary of the Invention] The inorganic board according to the present invention has antistatic properties and low reflectivity, and has many fine ridges with a height of 0.1 to 2.0 μm on the surface of the inorganic board. It is characterized by being provided with a transparent inorganic coating having a surface resistivity of 10 -10 8 Ω·cm.
[発明の詳細な説明]
本発明に係る無機板は、無機基板と、この表面上に設け
られた透明無機被膜とからなっており、透明無機被膜は
高さ0.1〜2.0 JLtsの微細な多数の隆起を有
し、しかもその表面の比抵抗が106〜108Ω・CS
であるこを特徴としており、優れた帯電防止性および低
反射性を有している。[Detailed Description of the Invention] The inorganic plate according to the present invention consists of an inorganic substrate and a transparent inorganic coating provided on the surface of the inorganic substrate, and the transparent inorganic coating has a height of 0.1 to 2.0 JLts. It has many fine ridges, and its surface has a specific resistance of 106 to 108 Ω・CS
It is characterized by having excellent antistatic properties and low reflectivity.
本発明で用いられる無機基材としては、ケイ酸ガラス(
石英ガラス)、ケイ酸アルカリガラス。The inorganic base material used in the present invention is silicate glass (
quartz glass), alkali silicate glass.
ソーダ石灰ガラス、カリ石灰ガラス、鉛ガラス、バリウ
ムガラス、ホウケイ酸ガラスなどケイ酸塩ガラスが主と
して用いられるが、これらに限定されるものではなく、
たとえばリン酸塩ガラス、ホウ酸塩ガラス、硫酸塩ガラ
ス、硝酸塩ガラス、炭醜塩ガラス、塩化物ガラス、フッ
化物ガラスなどのガラスも用いられうる。Silicate glasses such as soda lime glass, potash lime glass, lead glass, barium glass, and borosilicate glass are mainly used, but are not limited to these.
For example, glasses such as phosphate glass, borate glass, sulfate glass, nitrate glass, carbonate glass, chloride glass, fluoride glass, etc. may also be used.
その他熱的に安定な基材であれば本発明における基材と
して用いられうる。Any other thermally stable base material can be used as the base material in the present invention.
なお、本発明に係る無機板をディスプレイ用ブラウン管
として用いる場合には、無機基板として透明無機基板を
用いることが好ましい。Note that when the inorganic plate according to the present invention is used as a cathode ray tube for display, it is preferable to use a transparent inorganic substrate as the inorganic substrate.
このような無機基板上に透明無機被膜を形成するには、
この無機基板表面に高さ0.1〜2.OILmの微細な
多数の隆起を形成して1表面反射性を低減させるのに主
として寄与するエチルシリケートなどの金属アルコラー
ドを主成分とする溶液Aと、前記無機基板表面に導電性
を付与するスズ化合物あるいはインジウム化合物を含む
溶液Bとを併用すればよい、 溶液Aは
有機ケイ素を主成分とするが、この溶液Aとしては、エ
チルシリケート[5i(C2H50)4]などの金属ア
ルコラードをアルコール溶剤に溶解させてなる金属アル
コラードのアルコール溶液が主として用いられる。
また、得られる被膜の熱膨張係数あるいは
焼成温度をWR節するために、ブチルボラート[B(C
,H,0)3] 、 メチルボラート 【B(OC1
43)3]、ナトリウムエチラート[NaOC2H5]
、ナトリウムメチラート[Na OCH3] 、リチウ
ムエチラー) [Li0CH1、アルミニウムプロポキ
シド[AI(QC3H7)31.リン酸トリエチルエチ
ラー) [PO(QC2)15)3]などのアルコール
溶液を、エチルシリケートアルコール溶液に添加しても
よい。To form a transparent inorganic film on such an inorganic substrate,
The surface of this inorganic substrate has a height of 0.1 to 2. A solution A containing a metal alcoholade as a main component, such as ethyl silicate, which mainly contributes to forming a large number of fine ridges of OILm and reducing surface reflectivity, and a tin compound, which imparts conductivity to the surface of the inorganic substrate. Alternatively, it may be used in combination with solution B containing an indium compound. Solution A has organosilicon as its main component, but this solution A consists of dissolving a metal alcoholade such as ethyl silicate [5i(C2H50)4] in an alcohol solvent. An alcoholic solution of a metal alcoholade made of alcoholic acid is mainly used.
In addition, in order to adjust the thermal expansion coefficient or firing temperature of the resulting film, butylborate [B(C
,H,0)3], methylborate [B(OC1
43)3], sodium ethylate [NaOC2H5]
, sodium methylate [Na OCH3], lithium ethyl) [Li0CH1, aluminum propoxide [AI(QC3H7)31. An alcohol solution such as triethyl ethyl phosphate [PO(QC2)15)3] may be added to the ethyl silicate alcohol solution.
また被膜形成用溶液の粘度を調節する目的で、たとえば
メタノール、エタノール、プロパツ−ル、ブタノールな
どのアルコールを、前述の7ルコール溶液と併用する。Further, for the purpose of adjusting the viscosity of the film-forming solution, an alcohol such as methanol, ethanol, propane, butanol, etc. is used in combination with the above-mentioned 7-alcohol solution.
用いるアルコールの種類によって、金属アルコラードの
加水分解速度が左右される。The type of alcohol used influences the rate of hydrolysis of the metal alcoholade.
たとえばメタノールまたはエタノールを用いた場合には
、プロパツールあるいはブタノールを用いた場合よりも
、金属アルコラードの加水分解速度は大きくなる。
このため、金属アルコラードの加水分解速度を
考慮して、用いるべきアルコールを選択することが好ま
しい。For example, when using methanol or ethanol, the rate of hydrolysis of the metal alcoholade is greater than when using propatool or butanol.
Therefore, it is preferable to select the alcohol to be used in consideration of the hydrolysis rate of the metal alcoholade.
加水分解7A節剤としては、塩酸、硝酸などの無機酸あ
るいは酢酸などの有機酸を用いることができるが、これ
らのうち、特に塩酸が好ましい。As the hydrolysis 7A moderating agent, inorganic acids such as hydrochloric acid and nitric acid, or organic acids such as acetic acid can be used, and among these, hydrochloric acid is particularly preferred.
この加水分解調節剤は、たとえば12Nの塩酸の場合、
溶液A l00gに対して、0.5〜2.o腸gの量
、すなわち酸度がlO〜20pp−となる範囲で、添加
することが好ましい、 酸を加水分解調節剤
として用いる場合に、酸の添加量が少なすぎると、金属
アルコラードの加水分解速度が遅すぎるため好ましくな
く、また酸の添加量が多すぎると、金属アルコラードの
加水分解速度が早すぎ、ゲル化が進行しすぎて溶液Aの
粘度が大きくなり、塗布しにくくなるため好ましくない
。For example, in the case of 12N hydrochloric acid, the hydrolysis regulator is
0.5 to 2.0 g per 100 g of solution A. It is preferable to add the acid in an amount such that the acidity is 10 to 20 pp-. When using an acid as a hydrolysis regulator, if the amount of acid added is too small, the hydrolysis rate of the metal alcoholade will be reduced. is undesirable because it is too slow, and if the amount of acid added is too large, the hydrolysis rate of the metal alcoholade is too fast, gelation progresses too much, and the viscosity of solution A increases, making it difficult to coat, which is undesirable.
上記のような成分を含んでなる溶液Aは、空気中に存在
する水分すなわち湿分により加水分解を受けて、ゲル化
する。Solution A containing the above-mentioned components is hydrolyzed by moisture present in the air and turns into a gel.
したがってこの加水分解は、湿度が高いほどまた温度が
高いほど進行しやすく、さらに溶液Aを攪拌することに
よって進行しやすくなる。Therefore, this hydrolysis progresses more easily as the humidity becomes higher and the temperature becomes higher, and furthermore, when the solution A is stirred, it progresses more easily.
上記の条件を考慮しながら具体的には、室温15〜25
℃、相対湿度30〜60%の条件下で、溶液Aに毎分2
00〜800回転程度の攪拌を午えながら。Specifically, while considering the above conditions, the room temperature is 15 to 25
℃, relative humidity 30-60%, solution A at 2 min.
While stirring at about 00 to 800 rpm.
金属アルコラードの加水分解反応を徐々に時間をかけて
進行させることが好ましい。It is preferable to allow the hydrolysis reaction of the metal alcoholade to proceed gradually over time.
このようにして溶液Aに攪拌を与えながら、金属アルコ
ラードの加水分解反応を進行させると、前記溶液のゲル
化が起こるとともに、攪拌によってゲル相が破壊され、
微細なゲル相とゲル相とが混然とした状態となる。
この状態において、ゲル化が不足してゲル相
の含有量が少ないと、後に無m基材上に形成される微細
な隆起が少なく、かつその高さも低くなり好ましくない
。In this way, when the hydrolysis reaction of the metal alcoholade is allowed to proceed while stirring the solution A, gelation of the solution occurs, and the gel phase is destroyed by the stirring.
The fine gel phase and the gel phase become mixed.
In this state, if gelation is insufficient and the content of the gel phase is low, the number of fine protuberances that will be formed later on the non-molecular base material will be small and the height thereof will be low, which is not preferable.
これに対して、ゲル化が進行しすぎると、溶液Aの粘度
が過度に増大し、塗布作業が困難となるため好ましくな
い。On the other hand, if gelation progresses too much, the viscosity of solution A will increase excessively, making coating work difficult, which is not preferable.
次に上述のようにして得られた溶液Aを、無機基材上に
塗布して被膜を形成すると、無機基板上に高さ0.1〜
2.01Lmの微細な多数の隆起が形成され、表面反射
性が低減される。Next, when the solution A obtained as described above is applied onto an inorganic substrate to form a film, a film with a height of 0.1 to
A large number of fine ridges of 2.01 Lm are formed to reduce surface reflectivity.
一方、前記無機基板表面に導電性を付与するための溶液
Bは、前述のようにスズ化合物あるいはインジウム化合
物を含んでいる。On the other hand, the solution B for imparting conductivity to the surface of the inorganic substrate contains a tin compound or an indium compound as described above.
これらのスズ化合物ある6zはインジウム化合物として
は、 2塩化ジメチル錫[(C13)29nCI21
、カプリル酸銀[(07H15COO)25nl 、ジ
イソアミロキシエトキシアンチモンICHO・(C5H
1lO)2Sb]。These tin compounds, 6z, are indium compounds such as dimethyltin dichloride [(C13)29nCI21
, silver caprylate [(07H15COO)25nl, diisoamyloxyethoxyantimony ICHO・(C5H
1lO)2Sb].
アセチルアセトネートインジウム[CH3(COCI(
2)2・In]などが好ましく用いられ、また錯酸第−
錫【Sn(CM Coo) ] 、蓚酸第二錫[Sn
((:00) 2] 、酒石酸第一錫[SnCH(OH
) (COO)21なども用いられる。Acetylacetonate indium [CH3(COCI(
2) 2.In] etc. are preferably used, and complex acids such as
Tin [Sn (CM Coo)], tin oxalate [Sn
((:00) 2], stannous tartrate [SnCH(OH
) (COO)21 etc. are also used.
これらの有機金属化合物は弔独で用いる場合よりも、異
種金属を少量混合することにより、抵抗値等を安定化す
ることができることが知られておリ、主剤を錫とした場
合には、ごく微量のアンチモンあるいはインジウムを添
加して用いることが好ましい。It is known that the resistance value, etc. of these organometallic compounds can be stabilized by mixing small amounts of different metals, rather than when used alone. It is preferable to add a small amount of antimony or indium.
この添加量は0.1〜5.0%の範囲であり、その場合
には無機の塩化錫(S n C+ 4 )や塩化インジ
ウム(InCIa)を用いる場合もある。The amount added is in the range of 0.1 to 5.0%, and in that case, inorganic tin chloride (S n C+ 4 ) or indium chloride (InCIa) may be used.
これらの有機金属化合物をメタノール、エタノール、プ
ロパツール、ブタノール、アセチルアセトン等の溶媒に
溶解させることにより、溶液Bを調整することができる
。Solution B can be prepared by dissolving these organometallic compounds in a solvent such as methanol, ethanol, propatool, butanol, acetylacetone, or the like.
このような溶液Aと溶液Bとを別々に無機基板上に塗布
することによって、本発明に係る表面反射性が低減され
しかも帯電防止性に優れた透明無機被膜を形成すること
もできるし、また溶液Aと溶液Bとを混合して用いるこ
とによって上記の透明無機被膜を形成することもできる
。By separately applying such solution A and solution B onto an inorganic substrate, it is possible to form a transparent inorganic coating having reduced surface reflectivity and excellent antistatic properties according to the present invention. The above-mentioned transparent inorganic coating can also be formed by using a mixture of solution A and solution B.
溶液Aと溶液Bとを混合するに際して、溶液Bを多量に
用いれば得られる透明無機被膜の導電性が高められる。When mixing Solution A and Solution B, if a large amount of Solution B is used, the conductivity of the resulting transparent inorganic coating will be increased.
上記のような溶液Aおよび溶液Bの塗布に際しては、液
体を固体表面に塗布するいずれのタイプの塗布法も採用
しうるが、浸漬法、流下法、スプレー法、超音波霧化法
などが採用できる・次に441された被膜を加熱して、
被膜の乾燥および焼成を行なう。When applying solution A and solution B as described above, any type of application method that applies a liquid to a solid surface can be adopted, but immersion method, falling method, spray method, ultrasonic atomization method, etc. can be adopted.・Next, the 441 coated film is heated,
The coating is dried and fired.
乾燥工程ならびに焼成工程は、一連の工程として行なっ
てもよく、また別々の工程として行なってもよい。The drying step and the firing step may be performed as a series of steps or may be performed as separate steps.
被膜の乾燥工程としては、好ましくは 100〜130
℃で10〜50分間程度、塗布被膜を加熱すればよく、
また焼成工程としては、250〜400°C1好ましく
は350〜390℃で10〜20分間程度、塗布被膜を
加熱すればよい。In the drying step of the film, preferably 100 to 130
It is sufficient to heat the applied film for about 10 to 50 minutes at °C,
In the firing step, the coated film may be heated at 250 to 400°C, preferably 350 to 390°C, for about 10 to 20 minutes.
乾燥工程における加熱温度の制御はあまり重要ではない
が、焼成工程における加熱温度の制御は重要である。Although controlling the heating temperature in the drying process is not very important, controlling the heating temperature in the firing process is important.
焼成温度が、250℃未満であると、塗布被膜の有機金
属の分解酸化が不充分となり、被膜が基材から剥離しや
すくなるためあまり好ましくない。If the firing temperature is less than 250°C, the decomposition and oxidation of the organic metal in the applied film will be insufficient, and the film will easily peel off from the base material, which is not very preferable.
このようにして、無4I!基村上に、高さ0.1〜2゜
OIL層の微細な多数の隆起を有し、しかもその表面の
比抵抗が10 〜108CIIである帯電防止性および
低反射性の透明無機被膜が形成される。In this way, no 4I! A transparent inorganic coating with antistatic properties and low reflectivity is formed on the base layer, having many fine ridges of 0.1 to 2 degrees in height and a surface resistivity of 10 to 108 CII. Ru.
なお、本発明に係る無機板においては、透明無機被膜は
0.1〜2.0 JL鵬の高さで径が 1−107L腸
程度の隆起を有しているが、この隆起はアメーバ状の不
定形であるため、広い範囲で変化している。In the inorganic plate according to the present invention, the transparent inorganic coating has a protuberance with a height of 0.1 to 2.0 JL and a diameter of about 1 to 107 L intestine, but this protuberance has an amoeboid shape. Because it is amorphous, it varies over a wide range.
また、本明細書において無機板とは、必ずしも板状のも
のばかりを意味するのではなく、屈曲した形状を有して
いてもよく、場合によっては板目体が1つの曲面形状を
なした物品を形成していてもよい。Furthermore, in this specification, an inorganic plate does not necessarily mean a plate-like one, but may have a bent shape, and in some cases, an article in which the plate grains have a single curved shape. may be formed.
[実施例]
以下本発明を実施例により説明するが、本発明はこれ、
ら実施例に限定されるものではない。[Example] The present invention will be explained below with reference to Examples.
However, the invention is not limited to the examples.
下記の組成を有する6吋カラーブラウン管用フェースプ
レートを透明無機基材として用いた。A face plate for a 6-inch color cathode ray tube having the following composition was used as a transparent inorganic base material.
S、0:83%
蔦2
AIO:2%
RO:19%
R20:16%
(RQは、CaG 、 SrQ 、 BaO、PbOな
どのアルカリ土類金属酸化物であり、R20はに20
、 Na20, Li20などのアルカリ金属酸化物で
ある.)
この基材は、上記に加えて,微量のNiO 、 CO3
0aCr O などの着色用金属酸化物を含有してお
り。S, 0:83% Tsuta2 AIO: 2% RO: 19% R20: 16% (RQ is an alkaline earth metal oxide such as CaG, SrQ, BaO, PbO, etc., and R20 is
, Na20, Li20 and other alkali metal oxides. ) In addition to the above, this base material also contains trace amounts of NiO and CO3.
Contains coloring metal oxides such as 0aCrO.
この基材はカラーブラウン管用ガラス板として入手可能
である。This base material is available as a glass plate for color cathode ray tubes.
この基材の熱膨張率は911X 10””/ ”Cであ
り,軟化点は890℃、徐冷点は500℃である。The coefficient of thermal expansion of this base material is 911×10''/''C, the softening point is 890°C, and the annealing point is 500°C.
一方、下記組成を有する溶液Aを以下のようにして調整
した。On the other hand, solution A having the following composition was prepared as follows.
エチルシリケート 5重量%
エタノール 35重量%
イソプロパツール 20重量%
ブタノール 40ffl量%得られた溶液l
ongに12Nの塩酸0.911gを添力uして,溶液
Aを調製した。Ethyl silicate 5% by weight Ethanol 35% by weight Isopropanol 20% by weight Butanol 40ffl Volume % Obtained solution l
Solution A was prepared by adding 0.911 g of 12N hydrochloric acid to the solution A.
次に、無機基板表面に主として導電性をイ・1享する下
記の組成を有する溶液Bを調製した。Next, a solution B having the following composition was prepared which mainly imparts conductivity to the surface of the inorganic substrate.
アセチルアセトネートインジウム8重・量%二塩化ジメ
チルスズ 2重量%アセチルアセトン
70重量%ブタノール
20重量%上記のようにして調製された溶液Aを、上
記の無機基村上にスプレィ法で霧化し、得られた霧状物
のうち1粒度の大なるものを除去して4回噴霧塗布した
。 次いで溶液Aと溶液Bとをほぼ等量ずつ
混合して得られた溶液を同様にして1回噴霧塗布した。Indium acetylacetonate 8% by weight dimethyltin dichloride 2% by weight acetylacetone
70% by weight butanol
20% by weight of solution A prepared as above was atomized onto the above inorganic base Murakami using a spray method, one large particle of the resulting atomized material was removed, and the solution was sprayed four times. . Next, a solution obtained by mixing approximately equal amounts of solution A and solution B was sprayed once in the same manner.
得られた塗膜を 110℃±lO℃で約30分間乾燥し
た後、370℃±20℃で約10分間焼成を行なった。The resulting coating film was dried at 110°C±10°C for about 30 minutes, and then baked at 370°C±20°C for about 10 minutes.
このようにして得られた無機板は、その表面に高さ0.
1〜2.0終層の微細な多数の隆起を有し、しかもその
表面の比抵抗は108Ω・C腸であった。The inorganic plate thus obtained has a height of 0.0 mm on its surface.
It had many fine ridges with a terminal layer of 1 to 2.0, and the specific resistance of its surface was 108 Ω·C.
なお、焼成後に得られる無機板の表面比抵抗がlO8Ω
・cmより小さければ溶液Bの混合割合を減じ、また1
08Ω・C鵬より大きければ溶液Bの混合″ 割合を増
加することにより、表面の比抵抗値を調節することがで
きる。Note that the surface specific resistance of the inorganic plate obtained after firing is lO8Ω.
・If it is smaller than cm, reduce the mixing ratio of solution B, and
If the resistivity is larger than 0.8Ω·C, the surface resistivity value can be adjusted by increasing the mixing ratio of solution B.
また無機板の製造工程時には、常時表面の比抵抗を測定
しながら行ない、この測定値に基いて溶液Aと溶液Bと
の混合割合を調節することが好ましい。Further, it is preferable to constantly measure the specific resistance of the surface during the manufacturing process of the inorganic plate, and adjust the mixing ratio of solution A and solution B based on this measured value.
[発明の効果]
本発明に係る無機板は、無機基板の表面上に、高さ0.
1〜2.0ル鵬で径が 1〜l0JL層程度の微細な多
数の隆起を有し、しかもその表面の比抵抗が106〜1
08Ω・C■であるため、優れた帯電防止性および低反
射性を有しており、ディスプレイ用の機器としてのみで
なく、ウィンドーあるいは人形ケース、時計用カバーガ
ラスなど広く応用しうる。[Effects of the Invention] The inorganic plate according to the present invention has a height of 0.5 mm on the surface of the inorganic substrate.
It has a large number of fine ridges with a diameter of 1 to 10 JL layer, and the specific resistance of the surface is 106 to 1.
08Ω・C■, it has excellent antistatic properties and low reflectivity, and can be widely applied not only to display devices but also to windows, doll cases, watch cover glasses, etc.
Claims (1)
微細な多数の隆起を有し、かつその表面の比抵抗が10
^6〜10^1^0Ω・cmである透明無機被膜が設け
られていることを特徴とする帯電防止性および低反射性
を有する無機板。(1) The surface of the inorganic substrate has many fine ridges with a height of 0.1 to 2.0 μm, and the specific resistance of the surface is 10
An inorganic plate having antistatic properties and low reflectivity, characterized by being provided with a transparent inorganic coating having a resistance of ^6 to 10^1^0 Ω·cm.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1594986A JPS62176946A (en) | 1986-01-29 | 1986-01-29 | Inorganic plate having antistatic property and low reflectivity |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1594986A JPS62176946A (en) | 1986-01-29 | 1986-01-29 | Inorganic plate having antistatic property and low reflectivity |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62176946A true JPS62176946A (en) | 1987-08-03 |
Family
ID=11903008
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1594986A Pending JPS62176946A (en) | 1986-01-29 | 1986-01-29 | Inorganic plate having antistatic property and low reflectivity |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62176946A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63133049U (en) * | 1987-02-20 | 1988-08-31 | ||
JPS6444742A (en) * | 1987-08-13 | 1989-02-17 | Toray Industries | Transparent molding having surface film |
JP2610155B2 (en) * | 1987-10-24 | 1997-05-14 | 伊藤光学工業株式会社 | Anti-reflection treatment liquid, anti-reflection treatment method, and anti-reflection treatment optical component for optical parts |
USRE37183E1 (en) | 1987-12-10 | 2001-05-22 | Hitachi, Ltd. | Image display panel having antistatic film with transparent and electroconductive properties and process for processing same |
-
1986
- 1986-01-29 JP JP1594986A patent/JPS62176946A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63133049U (en) * | 1987-02-20 | 1988-08-31 | ||
JPH0517795Y2 (en) * | 1987-02-20 | 1993-05-12 | ||
JPS6444742A (en) * | 1987-08-13 | 1989-02-17 | Toray Industries | Transparent molding having surface film |
JPH0798380B2 (en) * | 1987-08-13 | 1995-10-25 | 東レ株式会社 | Transparent molded product with surface coating |
JP2610155B2 (en) * | 1987-10-24 | 1997-05-14 | 伊藤光学工業株式会社 | Anti-reflection treatment liquid, anti-reflection treatment method, and anti-reflection treatment optical component for optical parts |
USRE37183E1 (en) | 1987-12-10 | 2001-05-22 | Hitachi, Ltd. | Image display panel having antistatic film with transparent and electroconductive properties and process for processing same |
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