JPS61248584A - Semiconductor laser - Google Patents

Semiconductor laser

Info

Publication number
JPS61248584A
JPS61248584A JP9134785A JP9134785A JPS61248584A JP S61248584 A JPS61248584 A JP S61248584A JP 9134785 A JP9134785 A JP 9134785A JP 9134785 A JP9134785 A JP 9134785A JP S61248584 A JPS61248584 A JP S61248584A
Authority
JP
Japan
Prior art keywords
layer
type
crystal
semiconductor
groove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9134785A
Other languages
Japanese (ja)
Inventor
Takao Furuse
古瀬 孝雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP9134785A priority Critical patent/JPS61248584A/en
Publication of JPS61248584A publication Critical patent/JPS61248584A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/40Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/4025Array arrangements, e.g. constituted by discrete laser diodes or laser bar
    • H01S5/4031Edge-emitting structures

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To arrange many semiconductor lasers, which can be independently driven, on the same semiconductor substrate, by forming grooves in a current block layer on an active layer, and forming isolating grooves reaching the current block layer from the surface of a crystal. CONSTITUTION:On an n-type GaAs substrate 1, an n-type Al0.4Ga0.6As layer 2, an n-type Al0.11Ga0.89As layer 3 that is to become an active layer, a p-type Al0.4Ga0.6As layer 4 and an n-type GaAs layer 5 that is to become a current block layer are sequentially formed. Thereafter, a groove 9' is formed from the surface of a crystal to the layer 4. Then, a p-type AlGaAs layer 6 and a p-type GaAs layer 7 are sequentially formed on the entire surface of the crystal. Thereafter, a p-type ohmic electrode 8, an isolating groove 9 reaching the layer 5 from the crystal surface and an n-type ohmic electrode 10 are formed. Thus, semiconductor lasers A and B can be driven electrically independently. Since the bottom of the groove 9 is positioned on the upper surface of the layer 5 and sufficiently separated from the layer 3, occurrence of transversal irregular streaks on the layer 5, when the crystal is cleaved, can be avoided.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、光ディスク等の光情報処理の光源として用い
られる半導体レーデに関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor radar used as a light source for optical information processing of optical discs and the like.

〔従来の技術〕[Conventional technology]

半導体レーデは光通信や光ディスク等の光情報処理用光
源として利用され始めておシ、各極構造の半導体レーデ
が提案されている。特に、半導体基板上にそれぞれが独
立部動可能な複数個の半導体レーデを構成したレーデは
、光ディスク等への情報の書き込み、読み出しの同時処
理や、書き込み済みトラックから並列的に信号を読み出
すこと等が期待できるものである。第4図に従来の半導
体レーデの一例を示す。第4図は、n型GaAs基板1
の上に、n型At(L 4G& (L 6A 8層2、
活性層となるn型AzB 、I G、a 11 B ?
AIl f’d 3、p型AL(14G!L 16A 
11層4、n型GaAa層5を順次形成した後、Zn等
のp型不純物拡散領域12、p型オーミック電極8、n
型オーミック電極10、分離溝9を形成し、それぞれを
独立に駆動可能な半導体レーデA、Bとした例を示して
いる。
Semiconductor radars have just begun to be used as light sources for optical communication, optical disks, and other optical information processing, and semiconductor radars with each pole structure have been proposed. In particular, a radar that has a plurality of semiconductor radars on a semiconductor substrate, each of which can operate independently, can perform simultaneous processing of writing and reading information to and from an optical disk, etc., and can read signals in parallel from written tracks. can be expected. FIG. 4 shows an example of a conventional semiconductor radar. FIG. 4 shows an n-type GaAs substrate 1
On top of the n-type At (L 4G & (L 6A 8 layers 2,
n-type AzB, I G, a 11 B to be the active layer?
AIl f'd 3, p-type AL (14G!L 16A
After sequentially forming the 11 layer 4 and the n-type GaAa layer 5, the p-type impurity diffusion region 12 such as Zn, the p-type ohmic electrode 8, and the
An example is shown in which a type ohmic electrode 10 and a separation groove 9 are formed to form semiconductor radars A and B that can be driven independently.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

この例では相互間に流れる電流13を除去するためには
、n型kA工。Gaユ6As層2へ至るまで分離溝9を
深く掘ることが必要となり、このため、共振器面を形成
する結晶の襞間時に、分離溝9の底又は結晶界面等から
共振器面の凹凸をもたらす; −>14等が発光領域と
なるn型At(111G& a139Am層3を横断す
る様に発生し、レーデ発振モードに散乱を与え、ビーム
出射方向が不安定になシ、あるいは発振閾値電流が増加
する等の欠点を回避することができない。
In this example, in order to eliminate the current 13 flowing between them, an n-type kA capacitor is used. It is necessary to dig the separation trench 9 deeply until it reaches the Ga-6As layer 2, and for this reason, the unevenness of the resonator surface is removed from the bottom of the separation trench 9 or the crystal interface between the folds of the crystal that forms the resonator surface. ->14 etc. are generated across the n-type At (111G & a139Am layer 3) which becomes the light emitting region, scattering the Raded oscillation mode, making the beam emission direction unstable, or causing the oscillation threshold current to decrease. It is not possible to avoid disadvantages such as increase in

本発明の目的は、この様な従来型半導体レーデの欠点を
除去し、光ディスク等への情報書き込み、読み出しの同
時処理や複数本のトラック上の記録信号を並列的に読み
出しを可能ならしめ、光情報処理用光源として優れた半
導体レーデを提供することにある。
The purpose of the present invention is to eliminate such drawbacks of conventional semiconductor radars, to enable simultaneous processing of information writing and reading on optical disks, etc., and to read recorded signals on multiple tracks in parallel, thereby making it possible to perform optical An object of the present invention is to provide a semiconductor radar excellent as a light source for information processing.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、半導体基板上に、発光領域となる半導体層を
これよシも禁制帯幅の大きい半導体層ではさんだ結晶積
層体を備え、その結晶積層体に隣接して、ストライプ状
の溝を有しかつ前記半導体基板と同一導電性の半導体層
を少なくとも備え、結晶表面から前記半導体層に至る溝
を設けて、複数の発光領域を構成せしめたことを特徴と
する半導体レーザである。
The present invention includes a crystal laminate on a semiconductor substrate in which a semiconductor layer serving as a light emitting region is sandwiched between semiconductor layers having a larger forbidden band width, and a striped groove is provided adjacent to the crystal laminate. The semiconductor laser is characterized in that it includes at least a semiconductor layer having the same conductivity as the semiconductor substrate, and has grooves extending from the crystal surface to the semiconductor layer to form a plurality of light emitting regions.

〔実施例〕〔Example〕

以下、本発明の一実施例について図面を参照して説明す
る。第1図は本発明の詳細な説明する図、第2図(4)
、(B)は本発明の製造工程を説明する図、第3図は本
発明の他の実施例を説明する図をそれぞれ示す。
An embodiment of the present invention will be described below with reference to the drawings. Figure 1 is a diagram explaining the invention in detail, Figure 2 (4)
, (B) are diagrams for explaining the manufacturing process of the present invention, and FIG. 3 is a diagram for explaining another embodiment of the present invention.

まず、第2図(4)に示す様に第1の結晶成長工程とし
て、n型GaAs基板1上に、約1ミクロン厚のn型A
La 4Ga a 6A 1層2、約0.05〜0.0
8  ミクロン厚の活性層となるn 型AzOL11 
Ga CL B g A 11層3、約0.1ミクロン
厚のp型ALIIL4Gal16A8層4、約0.8ミ
クロン厚のn型GaAs層5を順次形成した後、結晶表
面からp型AZ14G Ik (L bA8層4に至る
まで溝幅約3ミクロン、溝の間隔約50ミクロンの溝9
′を化学エツチング工程により形成する。次に、結晶表
面を清浄K t、た後、第2図(B)に示す様に、第2
の結晶成長工程として溝9′を肩する結晶表面全体を覆
う様に、約1ミクロン厚のp型At[L4c’ 16”
 if 6、約1ミクロン厚のp型GaAs層7を順次
形成する。さらにその後、第1図に示す様に、p型オー
ミック電極8、分離溝9、n型オーミック電極10を形
成して本発明に係る半導体レーザを完成する。なお、こ
の実施例では、間隔約50ミクロンの発光領域を有する
半導体レーデAとBとを構成した例について示している
First, as shown in FIG. 2 (4), as a first crystal growth step, an n-type A of about 1 micron thickness is grown on an n-type GaAs substrate 1.
La 4Ga a 6A 1 layer 2, about 0.05-0.0
n-type AzOL11 that becomes the active layer with a thickness of 8 microns
After sequentially forming Ga CL B g A 11 layer 3, p-type ALIIL4Gal16A8 layer 4 with a thickness of about 0.1 micron, and n-type GaAs layer 5 with a thickness of about 0.8 micron, p-type AZ14G Ik (L bA8 Groove 9 with a groove width of approximately 3 microns and a groove spacing of approximately 50 microns up to layer 4.
' is formed by a chemical etching process. Next, after cleaning the crystal surface, a second
As part of the crystal growth process, p-type At[L4c'16'' with a thickness of about 1 micron is grown so as to cover the entire crystal surface shouldering groove 9'.
If 6, a p-type GaAs layer 7 having a thickness of about 1 micron is sequentially formed. Thereafter, as shown in FIG. 1, a p-type ohmic electrode 8, a separation trench 9, and an n-type ohmic electrode 10 are formed to complete the semiconductor laser according to the present invention. In this embodiment, an example is shown in which semiconductor radars A and B have light emitting regions spaced apart by about 50 microns.

本構造に於ては、p型At、4Gm、6As層4の上に
溝幅約3ミクロンのストライプ状溝を有するn型GaA
s層5を配置することによシ、電流通路はこの溝幅で限
定可能とし、さらに、分離溝9を結晶表面から、このn
型GaAs層5に達するまで形成することで、レーザA
とレーデBとを電気的に独立に駆動可能とし、さらに又
、分離溝9の底は、n型GaAs層5の上面に位置して
おシ活性層3から充分に離れている丸め、従来型半導体
レーデの形成時に問題となっていた結晶勇開時に活性層
5を横断する様な凹凸状のムンの発生を回避することが
できた。
In this structure, an n-type GaA layer having stripe-like grooves with a groove width of approximately 3 microns is formed on the p-type At, 4Gm, and 6As layer 4.
By arranging the s-layer 5, the current path can be limited by this groove width, and furthermore, the separation groove 9 is formed from the crystal surface to this n-
By forming it until it reaches the type GaAs layer 5, the laser A
and radar B can be electrically driven independently, and furthermore, the bottom of the separation trench 9 is a rounded, conventional type which is located on the upper surface of the n-type GaAs layer 5 and is sufficiently far away from the active layer 3. It was possible to avoid the occurrence of irregularities that cross the active layer 5 during crystal opening, which was a problem when forming a semiconductor radar.

これKよシ、半導体レーザA、Bはそれぞれ独立に駆動
可能となシ、半導体レーデAによシ書き込み、その記録
を半導体レーデBによシ読み出すことが可能となった。
Since semiconductor lasers A and B can each be driven independently, it has become possible to write to semiconductor laser A and read the recorded data to semiconductor laser B.

又、半導体レーデA、Bとも、それぞれ異なるトラック
の書き込みあるいは読み出しの並列同時動作も可能とな
)、記録、読み出しのスピードを素子数分だけ高速化す
ることができる。
In addition, both semiconductor radars A and B can perform parallel simultaneous write or read operations on different tracks), and the recording and read speeds can be increased by the number of elements.

さらに、本発明の他の実施例を第3図に示す。Furthermore, another embodiment of the present invention is shown in FIG.

第3図に於て、本実施例では半導体レーデ素子数が3素
子(図示A、B、C)と増加した点が前実施例とは異な
るのみで他は第2図に示したものと同じである。同一構
成部分には同一番号を付して説明を省略する。3素子に
分離することによシ半導体レーザA、B、Cをそれぞれ
独立に駆動すれば、消去、記録、読み出し動作等の並列
動作が可能となシ、光情報処理用光源としてさらに高性
能な優れた半導体レーデを提供することができる。
In FIG. 3, this embodiment differs from the previous embodiment only in that the number of semiconductor radar elements is increased to three (A, B, and C shown in the figure), and the rest is the same as that shown in FIG. 2. It is. Identical components are given the same numbers and their explanations will be omitted. By separating the semiconductor lasers into three elements, and driving the semiconductor lasers A, B, and C independently, parallel operations such as erasing, recording, and reading operations are possible. It is possible to provide an excellent semiconductor radar.

また、上記構造によれば、一つの半導体基板を一回取扱
うことで、半導体レーザA e B e C・・・等の
電気的特性、光学的特性を連続的にそれぞれ独立に調べ
、その後に、分離溝9に位置する切断線11に沿って、
各独立素子をそれぞれに分離し、特性の良否に応じて分
類する等の処理を行う場合にも応用できるものである。
Further, according to the above structure, by handling one semiconductor substrate once, the electrical characteristics and optical characteristics of the semiconductor laser A e B e C, etc. can be examined continuously and independently, and then, Along the cutting line 11 located in the separation groove 9,
It can also be applied to cases where each independent element is separated and classified according to quality of characteristics.

なお本構造に於ては電流ブロック層としてn型GaAa
層を用いているが、AZxGa 1 ++ xA ’層
でも良く、多層積層体でも良いことは言うまでもないこ
とである。
Note that in this structure, n-type GaAa is used as the current blocking layer.
Although a layer is used here, it goes without saying that an AZxGa 1 ++xA' layer or a multilayer laminate may also be used.

〔発明め効果〕[Invention effect]

以上述べた様に、本発明によれば、同一半導体基板上に
独立駆動可能な半導体レーデを多数配置することができ
、光ディスク等への記録、読み出し、消去等の高速化を
図る光源として最適な半導体レーデを構成することがで
きるばかシでなく、一度の取扱いで多数素子を調査、分
類することが可能になシ、大量生産工程にも応用できる
効果を有する。
As described above, according to the present invention, it is possible to arrange a large number of semiconductor radars that can be driven independently on the same semiconductor substrate, and it is suitable as a light source for speeding up recording, reading, erasing, etc. on optical disks, etc. It is not only a simple device that can construct a semiconductor radar, but also allows a large number of devices to be investigated and classified in one operation, and has the advantage of being applicable to mass production processes.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係る半導体レーデの一実施例を示す断
面図、第2図体)、■)は本発明の製造工程を工程順に
示す断面図、第3図は本発明の他の実施例を示す断面図
、第4図は従来の半導体レーデの断面図である。 1:n型GaAs基板、2:n型At、4Gm、6As
層、3:n型1tCL4.Ga CLB tAs層、4
:p型At、100m 、6As層、5:n型GaAm
層、6:p型At、4GaF、6As層、7:p型Ga
As層、8:p型オーミック電極、9:分離溝、10:
n型オーミック電極、11:切断線、12:p型不純物
拡散領域、13:相互間に流れる電流、14:共振器面
の凹凸をもたらすスジ。
Fig. 1 is a cross-sectional view showing one embodiment of the semiconductor radar according to the present invention, Fig. 2) and ■) are cross-sectional views showing the manufacturing process of the present invention in order of process, and Fig. 3 is another embodiment of the present invention. FIG. 4 is a cross-sectional view of a conventional semiconductor radar. 1: n-type GaAs substrate, 2: n-type At, 4Gm, 6As
Layer 3: n-type 1tCL4. Ga CLB tAs layer, 4
:p-type At, 100m, 6As layer, 5:n-type GaAm
Layer, 6: p-type At, 4GaF, 6As layer, 7: p-type Ga
As layer, 8: p-type ohmic electrode, 9: separation groove, 10:
n-type ohmic electrode, 11: cutting line, 12: p-type impurity diffusion region, 13: current flowing between them, 14: streak causing unevenness on the resonator surface.

Claims (1)

【特許請求の範囲】[Claims] (1)半導体基板上に、発光領域となる半導体層をこれ
よりも禁制帯幅の大きい半導体層ではさんだ結晶積層体
を備え、その結晶積層体に隣接してストライプ状の溝を
有し、かつ前記半導体基板と同一導電性の半導体層を少
なくとも備え、結晶表面から前記半導体層に至る溝を設
けて複数の発光領域を構成せしめたことを特徴とする半
導体レーザ。
(1) A crystal laminate is provided on a semiconductor substrate, in which a semiconductor layer serving as a light emitting region is sandwiched between semiconductor layers having a wider forbidden band width, and a striped groove is provided adjacent to the crystal laminate, and A semiconductor laser comprising at least a semiconductor layer having the same conductivity as the semiconductor substrate, and having grooves extending from the crystal surface to the semiconductor layer to form a plurality of light emitting regions.
JP9134785A 1985-04-26 1985-04-26 Semiconductor laser Pending JPS61248584A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9134785A JPS61248584A (en) 1985-04-26 1985-04-26 Semiconductor laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9134785A JPS61248584A (en) 1985-04-26 1985-04-26 Semiconductor laser

Publications (1)

Publication Number Publication Date
JPS61248584A true JPS61248584A (en) 1986-11-05

Family

ID=14023880

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9134785A Pending JPS61248584A (en) 1985-04-26 1985-04-26 Semiconductor laser

Country Status (1)

Country Link
JP (1) JPS61248584A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5061974A (en) * 1988-12-28 1991-10-29 Ricoh Company, Ltd. Semiconductor light-emitting device of array type
EP0556863A2 (en) * 1992-02-20 1993-08-25 Sumitomo Electric Industries, Ltd. Multi-beam semiconductor laser and method for producing the same
JPH05235480A (en) * 1992-02-20 1993-09-10 Sumitomo Electric Ind Ltd Multi-beam semiconductor laser and manufacture thereof
EP0560358A2 (en) * 1992-03-11 1993-09-15 Sumitomo Electric Industries, Limited Semiconductor laser and process for fabricating the same
CN107910748A (en) * 2017-10-30 2018-04-13 深圳瑞波光电子有限公司 Semiconductor laser bar, semiconductor laser single tube and preparation method thereof

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5061974A (en) * 1988-12-28 1991-10-29 Ricoh Company, Ltd. Semiconductor light-emitting device of array type
EP0556863A2 (en) * 1992-02-20 1993-08-25 Sumitomo Electric Industries, Ltd. Multi-beam semiconductor laser and method for producing the same
JPH05235480A (en) * 1992-02-20 1993-09-10 Sumitomo Electric Ind Ltd Multi-beam semiconductor laser and manufacture thereof
EP0556863A3 (en) * 1992-02-20 1994-01-19 Sumitomo Electric Industries
US5359619A (en) * 1992-02-20 1994-10-25 Sumitomo Electric Industries, Ltd. Multi-beam semiconductor laser and method for producing the same
EP0560358A2 (en) * 1992-03-11 1993-09-15 Sumitomo Electric Industries, Limited Semiconductor laser and process for fabricating the same
EP0560358A3 (en) * 1992-03-11 1994-05-18 Sumitomo Electric Industries Semiconductor laser and process for fabricating the same
US5663975A (en) * 1992-03-11 1997-09-02 Sumitomo Electric Industries, Ltd. Multi-beam semiconductor laser with separated contacts characterized by semiconductor mixed crystal and active layer
CN107910748A (en) * 2017-10-30 2018-04-13 深圳瑞波光电子有限公司 Semiconductor laser bar, semiconductor laser single tube and preparation method thereof

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