JPS61225831A - 集積回路の非接触全ライン動的テスト装置 - Google Patents

集積回路の非接触全ライン動的テスト装置

Info

Publication number
JPS61225831A
JPS61225831A JP60271733A JP27173385A JPS61225831A JP S61225831 A JPS61225831 A JP S61225831A JP 60271733 A JP60271733 A JP 60271733A JP 27173385 A JP27173385 A JP 27173385A JP S61225831 A JPS61225831 A JP S61225831A
Authority
JP
Japan
Prior art keywords
chip
test
line
tested
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60271733A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0428138B2 (enExample
Inventor
ヨハネス・ジエオルク・ベーハ
ラツセル・ウオーレン・ドレイフアス
ゲイリー・ウエイン・ルブロフ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS61225831A publication Critical patent/JPS61225831A/ja
Publication of JPH0428138B2 publication Critical patent/JPH0428138B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/302—Contactless testing
    • G01R31/308—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Electromagnetism (AREA)
  • Toxicology (AREA)
  • General Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
JP60271733A 1985-03-29 1985-12-04 集積回路の非接触全ライン動的テスト装置 Granted JPS61225831A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US717407 1985-03-29
US06/717,407 US4670710A (en) 1985-03-29 1985-03-29 Noncontact full-line dynamic AC tester for integrated circuits

Publications (2)

Publication Number Publication Date
JPS61225831A true JPS61225831A (ja) 1986-10-07
JPH0428138B2 JPH0428138B2 (enExample) 1992-05-13

Family

ID=24881902

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60271733A Granted JPS61225831A (ja) 1985-03-29 1985-12-04 集積回路の非接触全ライン動的テスト装置

Country Status (5)

Country Link
US (1) US4670710A (enExample)
EP (1) EP0205760B1 (enExample)
JP (1) JPS61225831A (enExample)
CA (1) CA1232975A (enExample)
DE (1) DE3667547D1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4837506A (en) * 1986-10-02 1989-06-06 Ultraprobe, Inc. Apparatus including a focused UV light source for non-contact measuremenht and alteration of electrical properties of conductors
DE3685331D1 (de) * 1986-10-23 1992-06-17 Ibm Verfahren zur pruefung von platinen fuer integrierte schaltungen mittels eines lasers im vakuum.
JPH0644012B2 (ja) * 1986-12-23 1994-06-08 浜松ホトニクス株式会社 電気信号観測装置
US4823368A (en) * 1987-06-30 1989-04-18 Rikagaku Kenkyujyo Open counter for low energy electron detection with suppressed background noise
DE19742055C2 (de) * 1997-09-24 2000-02-24 Ita Ingb Testaufgaben Gmbh Vorrichtung zum Testen von Schaltungsplatinen
US6452412B1 (en) 1999-03-04 2002-09-17 Advanced Micro Devices, Inc. Drop-in test structure and methodology for characterizing an integrated circuit process flow and topography
US6297644B1 (en) * 1999-03-04 2001-10-02 Advanced Micro Devices, Inc. Multipurpose defect test structure with switchable voltage contrast capability and method of use
US7611726B2 (en) 2004-07-15 2009-11-03 L'oréal Shine-enhancing film formers
US20060103396A1 (en) * 2004-10-28 2006-05-18 Tan Michael R T Method and apparatus for non-contact testing of microcircuits
FR2916051A1 (fr) * 2007-05-07 2008-11-14 Beamind Soc Par Actions Simpli Procede et dispositif d'alignement d'un systeme de test avec un element electrique a tester

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS522573A (en) * 1975-06-24 1977-01-10 Toshiba Corp Surface potential measuring device
JPS59166357U (ja) * 1983-04-22 1984-11-07 日本電子株式会社 走査電子顕微鏡

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2659264A (en) * 1950-04-27 1953-11-17 Eastman Kodak Co Method of determining the velocity and acceleration characteristics of moving objects
US2663215A (en) * 1950-04-27 1953-12-22 Eastman Kodak Co Method and apparatus for determining the velocity and acceleration characterisitics of moving objects
NL247858A (enExample) * 1959-01-30
US2951961A (en) * 1959-05-28 1960-09-06 Bell Telephone Labor Inc Electron beam deflection system
DE2813947C2 (de) * 1978-03-31 1986-09-04 Siemens AG, 1000 Berlin und 8000 München Verfahren zur berührungslosen Messung des Potentialverlaufs in einem elektronischen Bauelement und Anordnung zur Durchführung des Verfahrens
US4301409A (en) * 1978-06-06 1981-11-17 California Institute Of Technology Solar cell anomaly detection method and apparatus
DE3422395A1 (de) * 1983-06-16 1985-01-17 Hitachi, Ltd., Tokio/Tokyo Verfahren und vorrichtung zum ermitteln von verdrahtungsmustern

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS522573A (en) * 1975-06-24 1977-01-10 Toshiba Corp Surface potential measuring device
JPS59166357U (ja) * 1983-04-22 1984-11-07 日本電子株式会社 走査電子顕微鏡

Also Published As

Publication number Publication date
EP0205760B1 (en) 1989-12-13
EP0205760A1 (en) 1986-12-30
US4670710A (en) 1987-06-02
CA1232975A (en) 1988-02-16
DE3667547D1 (de) 1990-01-18
JPH0428138B2 (enExample) 1992-05-13

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