JPS6122344A - マスクパタ−ンの転写方法 - Google Patents

マスクパタ−ンの転写方法

Info

Publication number
JPS6122344A
JPS6122344A JP60118839A JP11883985A JPS6122344A JP S6122344 A JPS6122344 A JP S6122344A JP 60118839 A JP60118839 A JP 60118839A JP 11883985 A JP11883985 A JP 11883985A JP S6122344 A JPS6122344 A JP S6122344A
Authority
JP
Japan
Prior art keywords
mask
exposed
wafer
rays
mask pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60118839A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6140983B2 (enrdf_load_stackoverflow
Inventor
Seiichi Iwamatsu
誠一 岩松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP60118839A priority Critical patent/JPS6122344A/ja
Publication of JPS6122344A publication Critical patent/JPS6122344A/ja
Publication of JPS6140983B2 publication Critical patent/JPS6140983B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/703—Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60118839A 1985-06-03 1985-06-03 マスクパタ−ンの転写方法 Granted JPS6122344A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60118839A JPS6122344A (ja) 1985-06-03 1985-06-03 マスクパタ−ンの転写方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60118839A JPS6122344A (ja) 1985-06-03 1985-06-03 マスクパタ−ンの転写方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP14116078A Division JPS5568623A (en) 1978-11-17 1978-11-17 Transferring device for mask pattern

Publications (2)

Publication Number Publication Date
JPS6122344A true JPS6122344A (ja) 1986-01-30
JPS6140983B2 JPS6140983B2 (enrdf_load_stackoverflow) 1986-09-12

Family

ID=14746428

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60118839A Granted JPS6122344A (ja) 1985-06-03 1985-06-03 マスクパタ−ンの転写方法

Country Status (1)

Country Link
JP (1) JPS6122344A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116819887A (zh) * 2023-08-31 2023-09-29 光科芯图(北京)科技有限公司 掩模图形转移组件及曝光设备

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116819887A (zh) * 2023-08-31 2023-09-29 光科芯图(北京)科技有限公司 掩模图形转移组件及曝光设备
CN116819887B (zh) * 2023-08-31 2023-11-17 光科芯图(北京)科技有限公司 掩模图形转移组件及曝光设备

Also Published As

Publication number Publication date
JPS6140983B2 (enrdf_load_stackoverflow) 1986-09-12

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