JPS61223186A - 炭素薄膜の製造方法 - Google Patents

炭素薄膜の製造方法

Info

Publication number
JPS61223186A
JPS61223186A JP60059275A JP5927585A JPS61223186A JP S61223186 A JPS61223186 A JP S61223186A JP 60059275 A JP60059275 A JP 60059275A JP 5927585 A JP5927585 A JP 5927585A JP S61223186 A JPS61223186 A JP S61223186A
Authority
JP
Japan
Prior art keywords
thin film
carbon thin
carbon
reaction tube
type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60059275A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0510425B2 (cs
Inventor
Yoshikazu Yoshimoto
好本　芳和
Tomonari Suzuki
鈴木　友成
Yoshiyuki Tougaki
良之 東垣
Shigeo Nakajima
中島　重夫
Toshio Inoguchi
猪口　敏夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP60059275A priority Critical patent/JPS61223186A/ja
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to EP86103833A priority patent/EP0201696B1/en
Priority to DE8888113145T priority patent/DE3687529T2/de
Priority to EP88113145A priority patent/EP0305790B1/en
Priority to DE8686103833T priority patent/DE3678030D1/de
Publication of JPS61223186A publication Critical patent/JPS61223186A/ja
Priority to US07/190,353 priority patent/US4946370A/en
Priority to US07/344,961 priority patent/US5049409A/en
Priority to US07/706,006 priority patent/US5273778A/en
Publication of JPH0510425B2 publication Critical patent/JPH0510425B2/ja
Priority to US08/051,441 priority patent/US5404837A/en
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemically Coating (AREA)
  • Chemical Vapour Deposition (AREA)
JP60059275A 1985-03-20 1985-03-22 炭素薄膜の製造方法 Granted JPS61223186A (ja)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP60059275A JPS61223186A (ja) 1985-03-22 1985-03-22 炭素薄膜の製造方法
EP86103833A EP0201696B1 (en) 1985-03-20 1986-03-20 Production of carbon films
DE8888113145T DE3687529T2 (de) 1985-03-20 1986-03-20 Herstellung von graphiteinlagerungsverbindung und gedopte carbonfilme.
EP88113145A EP0305790B1 (en) 1985-03-20 1986-03-20 Production of graphite intercalation compound and doped carbon films
DE8686103833T DE3678030D1 (de) 1985-03-20 1986-03-20 Herstellung von kohlenstoffschichten.
US07/190,353 US4946370A (en) 1985-03-20 1988-05-05 Method for the production of carbon films having an oriented graphite structure
US07/344,961 US5049409A (en) 1985-03-20 1989-04-28 Method for metal or metal compounds inserted between adjacent graphite layers
US07/706,006 US5273778A (en) 1985-03-20 1991-05-28 Method for producing graphite intercalation compound
US08/051,441 US5404837A (en) 1985-03-20 1993-04-22 Method for preparing a graphite intercalation compound having a metal or metal compounds inserted between adjacent graphite layers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60059275A JPS61223186A (ja) 1985-03-22 1985-03-22 炭素薄膜の製造方法

Publications (2)

Publication Number Publication Date
JPS61223186A true JPS61223186A (ja) 1986-10-03
JPH0510425B2 JPH0510425B2 (cs) 1993-02-09

Family

ID=13108665

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60059275A Granted JPS61223186A (ja) 1985-03-20 1985-03-22 炭素薄膜の製造方法

Country Status (1)

Country Link
JP (1) JPS61223186A (cs)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010056560A (ja) * 2007-08-10 2010-03-11 Mitsubishi Electric Corp カーボン膜成膜装置
JP2011187675A (ja) * 2010-03-09 2011-09-22 Mitsubishi Electric Corp 炭化珪素半導体装置の製造方法
JP2013028493A (ja) * 2011-07-28 2013-02-07 Sumitomo Electric Ind Ltd 黒鉛およびその製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5848428A (ja) * 1981-09-17 1983-03-22 Semiconductor Energy Lab Co Ltd 炭素被膜を有する複合体およびその作製方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5848428A (ja) * 1981-09-17 1983-03-22 Semiconductor Energy Lab Co Ltd 炭素被膜を有する複合体およびその作製方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010056560A (ja) * 2007-08-10 2010-03-11 Mitsubishi Electric Corp カーボン膜成膜装置
JP2011187675A (ja) * 2010-03-09 2011-09-22 Mitsubishi Electric Corp 炭化珪素半導体装置の製造方法
JP2013028493A (ja) * 2011-07-28 2013-02-07 Sumitomo Electric Ind Ltd 黒鉛およびその製造方法

Also Published As

Publication number Publication date
JPH0510425B2 (cs) 1993-02-09

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