JPS61214341A - 荷電ビームの集束方法 - Google Patents
荷電ビームの集束方法Info
- Publication number
- JPS61214341A JPS61214341A JP60055051A JP5505185A JPS61214341A JP S61214341 A JPS61214341 A JP S61214341A JP 60055051 A JP60055051 A JP 60055051A JP 5505185 A JP5505185 A JP 5505185A JP S61214341 A JPS61214341 A JP S61214341A
- Authority
- JP
- Japan
- Prior art keywords
- charged beam
- charged
- hole
- shape
- focusing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005684 electric field Effects 0.000 abstract description 8
- 230000000903 blocking effect Effects 0.000 abstract description 6
- 238000000034 method Methods 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 3
- 239000000853 adhesive Substances 0.000 abstract description 2
- 230000001070 adhesive effect Effects 0.000 abstract description 2
- 238000001459 lithography Methods 0.000 abstract 1
- 239000011810 insulating material Substances 0.000 description 16
- 239000012212 insulator Substances 0.000 description 12
- 230000000694 effects Effects 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000002184 metal Substances 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 238000010884 ion-beam technique Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 239000002023 wood Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60055051A JPS61214341A (ja) | 1985-03-19 | 1985-03-19 | 荷電ビームの集束方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60055051A JPS61214341A (ja) | 1985-03-19 | 1985-03-19 | 荷電ビームの集束方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61214341A true JPS61214341A (ja) | 1986-09-24 |
| JPH0361980B2 JPH0361980B2 (cg-RX-API-DMAC7.html) | 1991-09-24 |
Family
ID=12987873
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60055051A Granted JPS61214341A (ja) | 1985-03-19 | 1985-03-19 | 荷電ビームの集束方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61214341A (cg-RX-API-DMAC7.html) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03190044A (ja) * | 1989-12-19 | 1991-08-20 | Ebara Corp | 電子線加速器 |
| JP2007003418A (ja) * | 2005-06-24 | 2007-01-11 | Institute Of Physical & Chemical Research | 荷電粒子ビームの偏向・収束方法および荷電粒子ビームの偏向・収束器具 |
-
1985
- 1985-03-19 JP JP60055051A patent/JPS61214341A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03190044A (ja) * | 1989-12-19 | 1991-08-20 | Ebara Corp | 電子線加速器 |
| JP2007003418A (ja) * | 2005-06-24 | 2007-01-11 | Institute Of Physical & Chemical Research | 荷電粒子ビームの偏向・収束方法および荷電粒子ビームの偏向・収束器具 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0361980B2 (cg-RX-API-DMAC7.html) | 1991-09-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |