JPS61200851A - 微粒子製造装置 - Google Patents
微粒子製造装置Info
- Publication number
- JPS61200851A JPS61200851A JP60041214A JP4121485A JPS61200851A JP S61200851 A JPS61200851 A JP S61200851A JP 60041214 A JP60041214 A JP 60041214A JP 4121485 A JP4121485 A JP 4121485A JP S61200851 A JPS61200851 A JP S61200851A
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- fine particles
- plasma
- tubular passage
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010419 fine particle Substances 0.000 title claims abstract description 63
- 238000000034 method Methods 0.000 title claims description 18
- 238000006243 chemical reaction Methods 0.000 claims abstract description 15
- 230000015556 catabolic process Effects 0.000 claims abstract description 13
- 239000000463 material Substances 0.000 claims abstract description 5
- 239000002994 raw material Substances 0.000 claims description 91
- 238000004519 manufacturing process Methods 0.000 claims description 15
- 239000007789 gas Substances 0.000 abstract description 61
- 239000002245 particle Substances 0.000 abstract description 18
- 238000010438 heat treatment Methods 0.000 abstract description 4
- 230000005672 electromagnetic field Effects 0.000 abstract description 2
- 230000008033 biological extinction Effects 0.000 abstract 1
- 239000008246 gaseous mixture Substances 0.000 abstract 1
- 230000002045 lasting effect Effects 0.000 abstract 1
- 238000010791 quenching Methods 0.000 abstract 1
- 230000000171 quenching effect Effects 0.000 abstract 1
- 238000001816 cooling Methods 0.000 description 7
- 239000011261 inert gas Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 6
- 230000005284 excitation Effects 0.000 description 6
- 239000000443 aerosol Substances 0.000 description 5
- 238000002207 thermal evaporation Methods 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 230000001066 destructive effect Effects 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229920002545 silicone oil Polymers 0.000 description 3
- ZFXYFBGIUFBOJW-UHFFFAOYSA-N theophylline Chemical compound O=C1N(C)C(=O)N(C)C2=C1NC=N2 ZFXYFBGIUFBOJW-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- 206010037660 Pyrexia Diseases 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- FFBHFFJDDLITSX-UHFFFAOYSA-N benzyl N-[2-hydroxy-4-(3-oxomorpholin-4-yl)phenyl]carbamate Chemical compound OC1=C(NC(=O)OCC2=CC=CC=C2)C=CC(=C1)N1CCOCC1=O FFBHFFJDDLITSX-UHFFFAOYSA-N 0.000 description 1
- -1 borides Chemical class 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 230000005291 magnetic effect Effects 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- GBECUEIQVRDUKB-UHFFFAOYSA-M thallium monochloride Chemical compound [Tl]Cl GBECUEIQVRDUKB-UHFFFAOYSA-M 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/121—Coherent waves, e.g. laser beams
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Optics & Photonics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60041214A JPS61200851A (ja) | 1985-03-04 | 1985-03-04 | 微粒子製造装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60041214A JPS61200851A (ja) | 1985-03-04 | 1985-03-04 | 微粒子製造装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61200851A true JPS61200851A (ja) | 1986-09-05 |
| JPH0226538B2 JPH0226538B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1990-06-11 |
Family
ID=12602150
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60041214A Granted JPS61200851A (ja) | 1985-03-04 | 1985-03-04 | 微粒子製造装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61200851A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6411916A (en) * | 1987-07-06 | 1989-01-17 | Idemitsu Kosan Co | Production of metal fine particles |
| JPH02194110A (ja) * | 1989-01-23 | 1990-07-31 | Rikagaku Kenkyusho | モリブデン微粒子製造方法 |
| JPH04253200A (ja) * | 1991-01-28 | 1992-09-08 | Kansai Electric Power Co Inc:The | プラズマチャンネル発生装置 |
| JP2002529224A (ja) * | 1998-11-09 | 2002-09-10 | ナノグラム・コーポレーション | 反応剤供給装置 |
| US7214349B2 (en) | 1996-12-31 | 2007-05-08 | Applied Materials, Inc. | Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases |
| JP2021508287A (ja) * | 2018-07-23 | 2021-03-04 | エルジー・ケム・リミテッド | ナノ粒子合成装置およびこれを用いたナノ粒子の合成方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60255611A (ja) * | 1984-05-14 | 1985-12-17 | アライド・コーポレーシヨン | 金属ケイ化物粉末から成る超微細粉末の光誘導製造 |
-
1985
- 1985-03-04 JP JP60041214A patent/JPS61200851A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60255611A (ja) * | 1984-05-14 | 1985-12-17 | アライド・コーポレーシヨン | 金属ケイ化物粉末から成る超微細粉末の光誘導製造 |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6411916A (en) * | 1987-07-06 | 1989-01-17 | Idemitsu Kosan Co | Production of metal fine particles |
| JPH02194110A (ja) * | 1989-01-23 | 1990-07-31 | Rikagaku Kenkyusho | モリブデン微粒子製造方法 |
| JPH04253200A (ja) * | 1991-01-28 | 1992-09-08 | Kansai Electric Power Co Inc:The | プラズマチャンネル発生装置 |
| US7214349B2 (en) | 1996-12-31 | 2007-05-08 | Applied Materials, Inc. | Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases |
| US7695700B2 (en) | 1996-12-31 | 2010-04-13 | Applied Materials, Inc. | Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases |
| JP2002529224A (ja) * | 1998-11-09 | 2002-09-10 | ナノグラム・コーポレーション | 反応剤供給装置 |
| JP2021508287A (ja) * | 2018-07-23 | 2021-03-04 | エルジー・ケム・リミテッド | ナノ粒子合成装置およびこれを用いたナノ粒子の合成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0226538B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1990-06-11 |
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