JPS6120043A - 現像の終点検出方法 - Google Patents

現像の終点検出方法

Info

Publication number
JPS6120043A
JPS6120043A JP59140551A JP14055184A JPS6120043A JP S6120043 A JPS6120043 A JP S6120043A JP 59140551 A JP59140551 A JP 59140551A JP 14055184 A JP14055184 A JP 14055184A JP S6120043 A JPS6120043 A JP S6120043A
Authority
JP
Japan
Prior art keywords
development
end point
substrate
electrode
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59140551A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0511304B2 (enExample
Inventor
Kaoru Kanda
神田　薫
Kunihiko Kanda
神田　邦彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SIGMA GIJUTSU KOGYO KK
Original Assignee
SIGMA GIJUTSU KOGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SIGMA GIJUTSU KOGYO KK filed Critical SIGMA GIJUTSU KOGYO KK
Priority to JP59140551A priority Critical patent/JPS6120043A/ja
Priority to DE8585304867T priority patent/DE3581010D1/de
Priority to US06/752,714 priority patent/US4621037A/en
Priority to EP85304867A priority patent/EP0171195B1/en
Publication of JPS6120043A publication Critical patent/JPS6120043A/ja
Publication of JPH0511304B2 publication Critical patent/JPH0511304B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59140551A 1984-07-09 1984-07-09 現像の終点検出方法 Granted JPS6120043A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP59140551A JPS6120043A (ja) 1984-07-09 1984-07-09 現像の終点検出方法
DE8585304867T DE3581010D1 (de) 1984-07-09 1985-07-08 Entwicklung-endpunktnachweisverfahren.
US06/752,714 US4621037A (en) 1984-07-09 1985-07-08 Method for detecting endpoint of development
EP85304867A EP0171195B1 (en) 1984-07-09 1985-07-08 Method for detecting endpoint of development

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59140551A JPS6120043A (ja) 1984-07-09 1984-07-09 現像の終点検出方法

Publications (2)

Publication Number Publication Date
JPS6120043A true JPS6120043A (ja) 1986-01-28
JPH0511304B2 JPH0511304B2 (enExample) 1993-02-15

Family

ID=15271301

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59140551A Granted JPS6120043A (ja) 1984-07-09 1984-07-09 現像の終点検出方法

Country Status (1)

Country Link
JP (1) JPS6120043A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61167947A (ja) * 1985-01-21 1986-07-29 Sigma Gijutsu Kogyo Kk 現像の終点検出方法
JPS62135838A (ja) * 1985-08-19 1987-06-18 Toshiba Corp パタ−ン形成方法及び装置
JPS63193151A (ja) * 1987-02-06 1988-08-10 Toshiba Corp 自動現像装置
JPH0264646A (ja) * 1988-08-31 1990-03-05 Toshiba Corp レジストパターンの現像方法及びこの方法に使用する現像装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5036765A (enExample) * 1973-07-06 1975-04-07
JPS584143A (ja) * 1981-06-30 1983-01-11 Fujitsu Ltd ポジ・レジスト膜の現像方法
JPS5842042A (ja) * 1981-08-28 1983-03-11 ヘキスト・アクチエンゲゼルシヤフト 露光した感光性複写層の現像法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5036765A (enExample) * 1973-07-06 1975-04-07
JPS584143A (ja) * 1981-06-30 1983-01-11 Fujitsu Ltd ポジ・レジスト膜の現像方法
JPS5842042A (ja) * 1981-08-28 1983-03-11 ヘキスト・アクチエンゲゼルシヤフト 露光した感光性複写層の現像法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61167947A (ja) * 1985-01-21 1986-07-29 Sigma Gijutsu Kogyo Kk 現像の終点検出方法
JPS62135838A (ja) * 1985-08-19 1987-06-18 Toshiba Corp パタ−ン形成方法及び装置
JPS63193151A (ja) * 1987-02-06 1988-08-10 Toshiba Corp 自動現像装置
JPH0264646A (ja) * 1988-08-31 1990-03-05 Toshiba Corp レジストパターンの現像方法及びこの方法に使用する現像装置

Also Published As

Publication number Publication date
JPH0511304B2 (enExample) 1993-02-15

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