JPS6120043A - 現像の終点検出方法 - Google Patents
現像の終点検出方法Info
- Publication number
- JPS6120043A JPS6120043A JP14055184A JP14055184A JPS6120043A JP S6120043 A JPS6120043 A JP S6120043A JP 14055184 A JP14055184 A JP 14055184A JP 14055184 A JP14055184 A JP 14055184A JP S6120043 A JPS6120043 A JP S6120043A
- Authority
- JP
- Japan
- Prior art keywords
- development
- end point
- substrate
- electrode
- photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001514 detection method Methods 0.000 title abstract description 6
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 239000007769 metal material Substances 0.000 claims abstract description 11
- 239000000463 material Substances 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims description 27
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 238000012544 monitoring process Methods 0.000 claims description 3
- 238000007654 immersion Methods 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 18
- 229910052782 aluminium Inorganic materials 0.000 abstract description 17
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 16
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 abstract description 11
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract description 6
- 229910052710 silicon Inorganic materials 0.000 abstract description 2
- 239000010703 silicon Substances 0.000 abstract description 2
- 238000007598 dipping method Methods 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 230000002250 progressing effect Effects 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 238000011179 visual inspection Methods 0.000 description 3
- 238000000576 coating method Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 241000257465 Echinoidea Species 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 235000014676 Phragmites communis Nutrition 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 229920001973 fluoroelastomer Polymers 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000010897 surface acoustic wave method Methods 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14055184A JPS6120043A (ja) | 1984-07-09 | 1984-07-09 | 現像の終点検出方法 |
| EP85304867A EP0171195B1 (en) | 1984-07-09 | 1985-07-08 | Method for detecting endpoint of development |
| US06/752,714 US4621037A (en) | 1984-07-09 | 1985-07-08 | Method for detecting endpoint of development |
| DE8585304867T DE3581010D1 (de) | 1984-07-09 | 1985-07-08 | Entwicklung-endpunktnachweisverfahren. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14055184A JPS6120043A (ja) | 1984-07-09 | 1984-07-09 | 現像の終点検出方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6120043A true JPS6120043A (ja) | 1986-01-28 |
| JPH0511304B2 JPH0511304B2 (enrdf_load_stackoverflow) | 1993-02-15 |
Family
ID=15271301
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14055184A Granted JPS6120043A (ja) | 1984-07-09 | 1984-07-09 | 現像の終点検出方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6120043A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61167947A (ja) * | 1985-01-21 | 1986-07-29 | Sigma Gijutsu Kogyo Kk | 現像の終点検出方法 |
| JPS62135838A (ja) * | 1985-08-19 | 1987-06-18 | Toshiba Corp | パタ−ン形成方法及び装置 |
| JPS63193151A (ja) * | 1987-02-06 | 1988-08-10 | Toshiba Corp | 自動現像装置 |
| JPH0264646A (ja) * | 1988-08-31 | 1990-03-05 | Toshiba Corp | レジストパターンの現像方法及びこの方法に使用する現像装置 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5036765A (enrdf_load_stackoverflow) * | 1973-07-06 | 1975-04-07 | ||
| JPS584143A (ja) * | 1981-06-30 | 1983-01-11 | Fujitsu Ltd | ポジ・レジスト膜の現像方法 |
| JPS5842042A (ja) * | 1981-08-28 | 1983-03-11 | ヘキスト・アクチエンゲゼルシヤフト | 露光した感光性複写層の現像法 |
-
1984
- 1984-07-09 JP JP14055184A patent/JPS6120043A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5036765A (enrdf_load_stackoverflow) * | 1973-07-06 | 1975-04-07 | ||
| JPS584143A (ja) * | 1981-06-30 | 1983-01-11 | Fujitsu Ltd | ポジ・レジスト膜の現像方法 |
| JPS5842042A (ja) * | 1981-08-28 | 1983-03-11 | ヘキスト・アクチエンゲゼルシヤフト | 露光した感光性複写層の現像法 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61167947A (ja) * | 1985-01-21 | 1986-07-29 | Sigma Gijutsu Kogyo Kk | 現像の終点検出方法 |
| JPS62135838A (ja) * | 1985-08-19 | 1987-06-18 | Toshiba Corp | パタ−ン形成方法及び装置 |
| JPS63193151A (ja) * | 1987-02-06 | 1988-08-10 | Toshiba Corp | 自動現像装置 |
| JPH0264646A (ja) * | 1988-08-31 | 1990-03-05 | Toshiba Corp | レジストパターンの現像方法及びこの方法に使用する現像装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0511304B2 (enrdf_load_stackoverflow) | 1993-02-15 |
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