JPS61196528U - - Google Patents
Info
- Publication number
- JPS61196528U JPS61196528U JP5716185U JP5716185U JPS61196528U JP S61196528 U JPS61196528 U JP S61196528U JP 5716185 U JP5716185 U JP 5716185U JP 5716185 U JP5716185 U JP 5716185U JP S61196528 U JPS61196528 U JP S61196528U
- Authority
- JP
- Japan
- Prior art keywords
- wafer support
- dry etching
- etching apparatus
- wafer
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims description 2
- 238000001312 dry etching Methods 0.000 claims 4
- 239000000112 cooling gas Substances 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5716185U JPS61196528U (enExample) | 1985-04-17 | 1985-04-17 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5716185U JPS61196528U (enExample) | 1985-04-17 | 1985-04-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61196528U true JPS61196528U (enExample) | 1986-12-08 |
Family
ID=30581431
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5716185U Pending JPS61196528U (enExample) | 1985-04-17 | 1985-04-17 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61196528U (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01225121A (ja) * | 1988-03-04 | 1989-09-08 | Hitachi Ltd | 低温ドライエッチング装置 |
-
1985
- 1985-04-17 JP JP5716185U patent/JPS61196528U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01225121A (ja) * | 1988-03-04 | 1989-09-08 | Hitachi Ltd | 低温ドライエッチング装置 |