JPS61179434A - パタ−ン形成有機膜 - Google Patents

パタ−ン形成有機膜

Info

Publication number
JPS61179434A
JPS61179434A JP59277952A JP27795284A JPS61179434A JP S61179434 A JPS61179434 A JP S61179434A JP 59277952 A JP59277952 A JP 59277952A JP 27795284 A JP27795284 A JP 27795284A JP S61179434 A JPS61179434 A JP S61179434A
Authority
JP
Japan
Prior art keywords
organic film
pattern
transmittance
contrast
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59277952A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0376744B2 (enrdf_load_stackoverflow
Inventor
Masaru Sasako
勝 笹子
Masataka Endo
政孝 遠藤
Kenichi Takeyama
竹山　健一
Noboru Nomura
登 野村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP59277952A priority Critical patent/JPS61179434A/ja
Publication of JPS61179434A publication Critical patent/JPS61179434A/ja
Publication of JPH0376744B2 publication Critical patent/JPH0376744B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP59277952A 1984-12-26 1984-12-26 パタ−ン形成有機膜 Granted JPS61179434A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59277952A JPS61179434A (ja) 1984-12-26 1984-12-26 パタ−ン形成有機膜

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59277952A JPS61179434A (ja) 1984-12-26 1984-12-26 パタ−ン形成有機膜

Publications (2)

Publication Number Publication Date
JPS61179434A true JPS61179434A (ja) 1986-08-12
JPH0376744B2 JPH0376744B2 (enrdf_load_stackoverflow) 1991-12-06

Family

ID=17590557

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59277952A Granted JPS61179434A (ja) 1984-12-26 1984-12-26 パタ−ン形成有機膜

Country Status (1)

Country Link
JP (1) JPS61179434A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62133444A (ja) * 1985-12-04 1987-06-16 Matsushita Electric Ind Co Ltd パタ−ン形成有機材料
JPS6313029A (ja) * 1986-06-27 1988-01-20 テキサス　インスツルメンツ　インコ−ポレイテツド ホトレジスト層のパターニング方法
WO1988009961A1 (en) * 1987-06-10 1988-12-15 Siemens Aktiengesellschaft Arrangement for producing a structure by means of photolithography and manufacturing process thereof
JPH01204044A (ja) * 1988-02-10 1989-08-16 Nec Corp パターン形成方法
US4871487A (en) * 1987-01-16 1989-10-03 The Dow Chemical Company Method of making a polymeric optical waveguide by coextrusion

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62133444A (ja) * 1985-12-04 1987-06-16 Matsushita Electric Ind Co Ltd パタ−ン形成有機材料
JPS6313029A (ja) * 1986-06-27 1988-01-20 テキサス　インスツルメンツ　インコ−ポレイテツド ホトレジスト層のパターニング方法
US4871487A (en) * 1987-01-16 1989-10-03 The Dow Chemical Company Method of making a polymeric optical waveguide by coextrusion
WO1988009961A1 (en) * 1987-06-10 1988-12-15 Siemens Aktiengesellschaft Arrangement for producing a structure by means of photolithography and manufacturing process thereof
JPH01204044A (ja) * 1988-02-10 1989-08-16 Nec Corp パターン形成方法

Also Published As

Publication number Publication date
JPH0376744B2 (enrdf_load_stackoverflow) 1991-12-06

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term