JPS61179434A - パタ−ン形成有機膜 - Google Patents
パタ−ン形成有機膜Info
- Publication number
- JPS61179434A JPS61179434A JP59277952A JP27795284A JPS61179434A JP S61179434 A JPS61179434 A JP S61179434A JP 59277952 A JP59277952 A JP 59277952A JP 27795284 A JP27795284 A JP 27795284A JP S61179434 A JPS61179434 A JP S61179434A
- Authority
- JP
- Japan
- Prior art keywords
- film
- resist
- pattern
- transmittance
- org
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000002834 transmittance Methods 0.000 claims abstract description 19
- 238000004061 bleaching Methods 0.000 claims abstract description 11
- 150000004676 glycans Chemical class 0.000 claims abstract description 7
- 229920003986 novolac Polymers 0.000 claims abstract description 7
- 229920001282 polysaccharide Polymers 0.000 claims abstract description 7
- 239000005017 polysaccharide Substances 0.000 claims abstract description 7
- 108090000623 proteins and genes Proteins 0.000 claims abstract description 5
- 102000004169 proteins and genes Human genes 0.000 claims abstract description 5
- 229920005989 resin Polymers 0.000 claims abstract description 5
- 239000011347 resin Substances 0.000 claims abstract description 5
- 150000001875 compounds Chemical class 0.000 claims abstract description 4
- 229920002451 polyvinyl alcohol Polymers 0.000 claims abstract description 3
- 229920000036 polyvinylpyrrolidone Polymers 0.000 claims abstract description 3
- 239000001267 polyvinylpyrrolidone Substances 0.000 claims abstract description 3
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 claims abstract description 3
- 229920003169 water-soluble polymer Polymers 0.000 claims description 7
- 230000000694 effects Effects 0.000 claims description 5
- 239000007864 aqueous solution Substances 0.000 claims description 4
- 238000005562 fading Methods 0.000 claims description 3
- -1 quinonediazide compound Chemical class 0.000 claims description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 7
- 239000004373 Pullulan Substances 0.000 abstract description 4
- 229920001218 Pullulan Polymers 0.000 abstract description 4
- 239000011248 coating agent Substances 0.000 abstract description 4
- 238000000576 coating method Methods 0.000 abstract description 4
- 235000019423 pullulan Nutrition 0.000 abstract description 4
- 238000000034 method Methods 0.000 description 18
- 239000000243 solution Substances 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 6
- 229920005601 base polymer Polymers 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000012512 characterization method Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 101100506034 Fibrobacter succinogenes (strain ATCC 19169 / S85) cel-3 gene Proteins 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 241000384512 Trachichthyidae Species 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- AJDUTMFFZHIJEM-UHFFFAOYSA-N n-(9,10-dioxoanthracen-1-yl)-4-[4-[[4-[4-[(9,10-dioxoanthracen-1-yl)carbamoyl]phenyl]phenyl]diazenyl]phenyl]benzamide Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2NC(=O)C(C=C1)=CC=C1C(C=C1)=CC=C1N=NC(C=C1)=CC=C1C(C=C1)=CC=C1C(=O)NC1=CC=CC2=C1C(=O)C1=CC=CC=C1C2=O AJDUTMFFZHIJEM-UHFFFAOYSA-N 0.000 description 1
- QVEIBLDXZNGPHR-UHFFFAOYSA-N naphthalene-1,4-dione;diazide Chemical compound [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1=CC=C2C(=O)C=CC(=O)C2=C1 QVEIBLDXZNGPHR-UHFFFAOYSA-N 0.000 description 1
- YPKJPFXVPWGYJL-UHFFFAOYSA-N naphthalene-1,4-dione;sulfuryl dichloride;diazide Chemical compound [N-]=[N+]=[N-].[N-]=[N+]=[N-].ClS(Cl)(=O)=O.C1=CC=C2C(=O)C=CC(=O)C2=C1 YPKJPFXVPWGYJL-UHFFFAOYSA-N 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000001043 yellow dye Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59277952A JPS61179434A (ja) | 1984-12-26 | 1984-12-26 | パタ−ン形成有機膜 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59277952A JPS61179434A (ja) | 1984-12-26 | 1984-12-26 | パタ−ン形成有機膜 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61179434A true JPS61179434A (ja) | 1986-08-12 |
| JPH0376744B2 JPH0376744B2 (enrdf_load_stackoverflow) | 1991-12-06 |
Family
ID=17590557
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59277952A Granted JPS61179434A (ja) | 1984-12-26 | 1984-12-26 | パタ−ン形成有機膜 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61179434A (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62133444A (ja) * | 1985-12-04 | 1987-06-16 | Matsushita Electric Ind Co Ltd | パタ−ン形成有機材料 |
| JPS6313029A (ja) * | 1986-06-27 | 1988-01-20 | テキサス インスツルメンツ インコ−ポレイテツド | ホトレジスト層のパターニング方法 |
| WO1988009961A1 (en) * | 1987-06-10 | 1988-12-15 | Siemens Aktiengesellschaft | Arrangement for producing a structure by means of photolithography and manufacturing process thereof |
| JPH01204044A (ja) * | 1988-02-10 | 1989-08-16 | Nec Corp | パターン形成方法 |
| US4871487A (en) * | 1987-01-16 | 1989-10-03 | The Dow Chemical Company | Method of making a polymeric optical waveguide by coextrusion |
-
1984
- 1984-12-26 JP JP59277952A patent/JPS61179434A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62133444A (ja) * | 1985-12-04 | 1987-06-16 | Matsushita Electric Ind Co Ltd | パタ−ン形成有機材料 |
| JPS6313029A (ja) * | 1986-06-27 | 1988-01-20 | テキサス インスツルメンツ インコ−ポレイテツド | ホトレジスト層のパターニング方法 |
| US4871487A (en) * | 1987-01-16 | 1989-10-03 | The Dow Chemical Company | Method of making a polymeric optical waveguide by coextrusion |
| WO1988009961A1 (en) * | 1987-06-10 | 1988-12-15 | Siemens Aktiengesellschaft | Arrangement for producing a structure by means of photolithography and manufacturing process thereof |
| JPH01204044A (ja) * | 1988-02-10 | 1989-08-16 | Nec Corp | パターン形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0376744B2 (enrdf_load_stackoverflow) | 1991-12-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4745042A (en) | Water-soluble photopolymer and method of forming pattern by use of the same | |
| US5688617A (en) | Phase shift layer-containing photomask, and its production and correction | |
| JP3440122B2 (ja) | 反射防止膜およびこれを使用した半導体装置の製造方法 | |
| JP3727335B2 (ja) | フォトレジスト用底部反射防止塗料における金属イオンの低減 | |
| JPH05501164A (ja) | パターンの形成方法及び転写方法 | |
| JP2003077826A (ja) | 面内寸法差の均一性改善方法 | |
| US20020182514A1 (en) | Organic bottom antireflective coating for high performance mask making using optical imaging | |
| US5554489A (en) | Method of forming a fine resist pattern using an alkaline film covered photoresist | |
| KR100581450B1 (ko) | 심자외선포토리소그래피프로세스 | |
| JPS63501744A (ja) | 基体上のフォトレジスト画像層を熱安定させる方法 | |
| JPS61179434A (ja) | パタ−ン形成有機膜 | |
| JPS60223121A (ja) | パタ−ン形成方法 | |
| US5648199A (en) | Method of forming a resist pattern utilizing an acid water-soluble material overlayer on the resist film | |
| KR101080008B1 (ko) | 하드마스크용 원판 및 이를 이용한 하드마스크 제조방법 | |
| US7851139B2 (en) | Pattern forming method | |
| JPH10301268A (ja) | 反射防止膜材料 | |
| TWI314245B (en) | Phase shifting mask capable of reducing the optical proximity effect and method for preparing a semiconductor device using the same | |
| JP4834941B2 (ja) | カラーフィルタおよびその製造方法 | |
| JP2001318472A5 (enrdf_load_stackoverflow) | ||
| JPH0727216B2 (ja) | パタ−ン形成方法 | |
| JPS61179535A (ja) | パターン形成方法 | |
| KR102615655B1 (ko) | 포지티브 포토레지스트 조성물 및 이를 사용한 포토리소그라피 방법 | |
| JPS61116838A (ja) | レジストパタ−ン形成方法 | |
| JPH0385544A (ja) | レジストパターン形成方法 | |
| JPS62226148A (ja) | パタ−ン形成方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |